玻璃基纳米晶化氧化钛薄膜的制取及研究

介绍了磁控溅射法,并在玻璃基上溅射金属钛薄膜.运用阳极氧化法使得到的钛薄膜氧化生成纳米氧化钛薄膜,并测试了其厚度,再经过8 h、180℃的加热处理使其变成晶粒状.通过X衍射仪表明,晶化处理后薄膜具有典型的晶体结构衍射峰尖锐特征,为锐钛矿纳米晶氧化钛薄膜.运用扫描电镜在不同放大倍率下观察了薄膜的表面形貌.分别运用X衍射仪对比分析了薄膜晶化处理前后的图谱状态.用紫外可见光光度计测定了薄膜对入射光的吸收特性,表明:阳极氧化制备的纳米晶化二氧化钛薄膜对近紫外入射光产生强烈的吸收,出现蓝移现象,显示出纳米结构的量子化效应.     

热处理对NdFeB薄膜微结构和磁性能的影响

采用磁控和离子束联合溅射法制备了NdFeB/α-Fe/NdFeB系列纳米复合多层膜,研究了热处理温度对薄膜结构、表面形貌和磁性能的影响.     

高反射率13nmMo／Si多层膜

采用离子束溅射在不同的工艺参数下制备一系列单层Mo膜、Si膜及多层膜,并用原子力显微镜分析单层膜表面粗糙度及两种材料间的界面扩散.当束流电压超过一定数值时,可避免单层膜的柱状生长;在Mo-on-Si和Si-on-Mo界面中,Mo-on-Si界面扩散对反射率的影响更大.采用X射线衍射仪分析多层膜中Mo、Si材料的晶体结构,均为多晶结构,其中Mo为(110)晶向,Si为(400)晶向.根据上述分析优化工艺参数,获得的13nmMo/Si多层膜反射率达到60%.     

高反射率13nmMo/Si多层膜

采用离子束溅射在不同的工艺参数下制备一系列单层Mo膜、Si膜及多层膜,并用原子力显微镜分析单层膜表面粗糙度及两种材料间的界面扩散.当束流电压超过一定数值时,可避免单层膜的柱状生长;在Mo-on-Si和Si-on-Mo界面中,Mo-on-Si界面扩散对反射率的影响更大.采用X射线衍射仪分析多层膜中Mo、Si材料的晶体结构,均为多晶结构,其中Mo为(110)晶向,Si为(400)晶向.根据上述分析优化工艺参数,获得的13nmMo/Si多层膜反射率达到60%.     

离子束增强沉积薄膜的摩擦磨损行为与结构分析

采用离子束增强沉积（IBED）技术在不锈钢1Cr18Ni9Ti衬底表面生长氮化钛薄膜以及氮离子注入,进行了干滑动摩擦磨损试验与组织结构电镜分析,表明增强沉积膜较离子注入具有更高耐磨性能。     

双离子束溅射技术制备带通滤光片

研究了采用双离子束溅射沉积技术、以沉积时间作为膜厚控制手段制备带通滤光片的工艺。简要介绍了离子束溅射系统的基本工作原理和膜厚控制技术,描述了分别在K9玻璃和有色玻璃上制备由多层Ta2O5和SiO2薄膜组成的滤光片以及短波通和长波通的工艺过程,最后测试并分析了由短波通和长波通组成带通滤光片的光学性能。实验结果表明,采用双离子束溅射技术,以沉积时间作为膜厚监控手段能够制备出具有优良光性能并满足应用设计要求的带通滤光片。     

高反射率13nmMo/Si多层膜

采用离子束溅射在不同的工艺参数下制备一系列单层 Mo膜、Si膜及多层膜 ,并用原子力显微镜分析单层膜表面粗糙度及两种材料间的界面扩散。当束流电压超过一定数值时 ,可避免单层膜的柱状生长 ;在 Mo- on- Si和 Si- on- Mo界面中 ,Mo- on- Si界面扩散对反射率的影响更大。采用 X射线衍射仪分析多层膜中 Mo、Si材料的晶体结构 ,均为多晶结构 ,其中 Mo为 ( 1 1 0 )晶向 ,Si为 ( 4 0 0 )晶向。根据上述分析优化工艺参数 ,获得的 1 3nm Mo/Si多层膜反射率达到 60 %。     

离子束溅射工艺中的基片温度及其控制方法

离子束溅射技术以其在制备薄膜中的独特优点,成为获得高性能薄膜材料的重要手段。对于薄膜的制备,基片的温度是一个重要参数。主要从薄膜结构、应力和附着力三个方面总结了基片温度对离子束溅射工艺中薄膜生长的影响,并结合实际情况,介绍了在离子束刻蚀、溅射和磁控溅射镀膜工艺中的一些温度控制方法。在实际操作中,要根据沉淀薄膜的要求和离子束溅射的具体方法及设备,并结合基片本身的结构特点来考虑基片的控温措施及温度范围。     

聚焦离子束再沉积修正方法的元胞自动机验证

利用聚焦离子束技术加工微结构时,由于溅射过程的再沉积效应,难以获得较为陡直的侧壁,对于高深宽比微结构尤甚。为优化聚焦离子束的加工工艺,提出一种单像素线辅助溅射刻蚀方法,对非陡直侧壁进行局部刻蚀修正,以期改善再沉积现象,提高侧壁陡直度。采用元胞自动机算法,对该方法应用于溅射过程时各参数对刻蚀结果的影响进行了数值模拟,获得了V型截面侧壁的修正效果,指出实际加工中局部刻蚀修正的位置选择存在着侧壁再沉积改善和离子束斑扩展之间的矛盾。聚焦离子束刻蚀实验验证了该方法的有效性,确定了局部刻蚀修正的最佳位置,在刻蚀宽度100 nm的圆环微结构时,沟道侧壁的校正效果较好,获得了深宽比为3∶1的沟槽结构。该方法可为相似微结构再沉积现象削弱提供技术支持。     

纳米晶体钛表面TiO_2薄膜的制备及抗凝血性能

采用直流磁控溅射法分别在纳米晶体钛和粗晶工业纯钛表面制备了TiO_2薄膜,采用X射线衍射仪分析了薄膜的晶型结构,并采用体外动态凝血时间和血小板粘附试验研究了不同薄膜的抗凝血性能。结果表明:纳米晶体钛表面的TiO_2薄膜较工业纯钛表面薄膜的晶粒细小且均匀致密,该薄膜主要为金红石和锐钛矿的混合结构;该钛基材纳米化可显著提高自身及TiO_2薄膜的抗凝血性能。     

Tribological properties of nickel-base nanocrystalline coatings sputter-deposited on austenitic stainless steel

500 nm-thick films are deposited on austenitic stainless steel by neutral (Ar⁺) or reactive (N⁺) ion beam sputtering of Ni or NiTi targets, with (or without) high energy 160 keV-Ar⁺ ion beam assistance. Most of the time the coatings are nanocrystalline and induce a large (excellent in some conditions) increase of the wear resistance. Only Ar⁺ ion beam sputtering of a NiTi target gives an amorphous deposit which does not improve the substrate tribological properties. The hardness and wear resistance of ion beam assisted films are larger than those obtained with non-ion beam assisted coatings. The presence of a hard TiN phase inside a ductile Ni phase, of grains with preferential orientation beneficial to slip, as well as film densification are the main factors which increase the wear resistance. The best results are obtained when the structure is composed of two phases, Ni and TiN. The TiN phase strengthens the already good tribological Ni properties and the Ni ductility induces mechanical accommodation during the friction process.     

离子束辅助真空电弧沉积Zr-Ni-N薄膜的研究

采用多弧离子镀技术在高速钢和单晶硅基体上制备Zr-Ni-N复合薄膜,研究了低能氮离子束对Zr-Ni-N涂层结构、表面形貌和硬度的影响。研究表明:用低能氮离子束辅助真空电弧沉积Zr-Ni-N膜,ZrN结构在(111)晶面出现一定的择优取向,并对Zr-Ni-N膜层有一定的强化作用,膜层表现出较高的显微硬度。     

Thermal stability of Ti and Pt nanowires manufactured by Ga+ focused ion beam

Ti and Pt nanowires have been produced by ultra high‐vacuum molecular beam epitaxy deposition of Ti thin films and focused ion beam (FIB) deposition of Pt thin films, followed by cross‐sectional FIB sputtering to form electron‐transparent nanowires. The thermal stability of the nanowires has been investigated by in situ thermal cycling in a transmission electron microscope. Epitaxial single crystal Ti nanowires on (0001)Al₂O₃ substrates are microstructurally stable up to 550–600 °C, above which limited dislocation motion is activated shortly before the Ti‐wires oxidize. The amorphous FIB‐deposited Pt wires are stable up to 580–650 °C where partial crystallization is observed in vacuum. Faceted nanoparticles grow on the wire surface, growing into free space by surface diffusion and minimizing contact area with the underlying wire. The particles are face‐centred cubic (fcc) Pt with some dissolved Ga. Continued heating results in particle spheroidization, coalescence and growth, retaining the fcc structure.     

负偏压对DLC薄膜结构和摩擦学性能的影响

采用离子束溅射沉积镀膜法制备了DLC薄膜,研究了偏压对薄膜性能的影响。通过原子力显微镜(AFM)和拉曼光谱对DLC薄膜的表面形貌以及内部结构进行了分析表征。并用UTM-2摩擦磨损仪对其摩擦学性能进行了测试。结果表明,利用离子束溅射沉积制备的DLC薄膜具有良好的减摩抗磨性能。随着偏压的增加薄膜的摩擦因数先减小后增加,在-150 V偏压时,薄膜的摩擦学性能最好。     

离子束辅助磁控溅射沉积铬-铜-氮薄膜的结构与性能

应用低能离子束辅助磁控溅射（IBAMS）沉积铬-铜-氮薄膜,研究了铜含量和轰击能量对薄膜结构、硬度和断裂韧度的影响。结果表明：在相同的轰击能量（400eV）下,铜含量对薄膜结构和硬度的影响不明显,但是铜的加入有利于提高薄膜的断裂韧度;离子辅助轰击能量从400eV增加到800eV时薄膜的结构发生了显著变化,断裂韧度和硬度均大幅度提高。     

Microstructure and Wear Properties Analysis of TiAlN Film Deposited on Cam Profile Using Ion Sputtering

In this study ion beam sputtering deposition was used as a new surface formation technology for strengthening cam surface during the manufacturing process of indexing cam mechanism. Phase exchanging deformation can be avoided in this manufacturing process. Compared to surface quenching processes, the shape accuracy and dimension accuracy can be improved using this method. The microstructure and properties of TiAlN composite film deposited on the profile surface of a cam (made of AISI 1045 steel) by ion beam sputtering deposition were discussed. The microstructural characterizations were analyzed by X-ray diffraction (XRD) and scanning electron microscopy (SEM). It is shown that the fundamental Bragg peak of {111} in TiAlN coatings increased with a bias voltage reduction. The grain size is about 1 μm. The friction coefficient was tested by a rotating wear tester at different loads and speeds. The minimum friction coefficient can be achieved at 0.187.     

基于离子束溅射Ta2O5薄膜的紫外吸收膜技术

为获得高性能紫外激光薄膜元件,急需研制紫外高反射吸收薄膜,实现吸收损耗的精确测量。本文采用离子束溅射技术,通过调控氧气流量实现了具有不同吸收的Ta_2O_5薄膜的制备。以Ta_2O_5薄膜作为高折射率材料,设计了355nm的紫外高反射吸收薄膜。采用离子束溅射沉积技术,在熔融石英基底上制备了355nm的吸收薄膜,对于A=5%的紫外吸收光谱,在355nm的透射率、反射率和吸收率分别为0.1%,95.0%和4.9%;对于A=12%的紫外吸收光谱,在355nm的透射率、反射率和吸收率分别为0.1%,87.4%和12.5%。实验结果表明,采用离子束溅射沉积技术,可以实现不同吸收率的355nm高反射吸收薄膜的制备,对于基于光热偏转测量技术的紫外光学薄膜弱吸收测量仪的定标具有重要的意义。     

Direct observation of a Ti/Cu interface with atomic displacement under electron irradiation

A Ti film was deposited onto a Cu substrate by means of a radio frequency magnetron sputtering method. Cross-sectional thin foils for TEM observation were prepared using a focused ion beam. Electron irradiation was carried out using a high-resolution high-voltage electron microscope operated at 1.25 MV . The Cu/Ti interface of the foils was irradiated at 623 K. In-situ observation images during electron irradiation were recorded by a CCD camera with a digital video cassette. The (020)_Cu plane on the Cu/Ti interface preferentially moved towards the Ti film with irradiation. Composition analysis of the diffused region showed that its composition corresponded to Ti₃Cu₂.     

荷能离子束沉积的氧化物薄膜光学性质

报道在不加热的基底上,由双离子束溅射或离子辅助的电子束蒸发技术制造的ＺｒＯ２ 和ＴｉＯ２ 单层薄膜的光学性质,并提供了工艺参数和离子束设备的详情。这两种荷能离子束工艺已被用于光学多层膜,如减反射膜和短波通滤光片的制备。     

Structural modification and tribological behavior improvement of solid lubricating WSe x coatings during pulsed laser deposition in buffer He-Gas

Thin film, solid lubricating WSe _x coatings were deposited at room temperature on a steel substrate with a titanium underlayer by pulsed laser deposition (PLD). Two modes of PLD were investigated, i.e., the PLD under vacuum conditions and the PLD in a buffer gas (helium) at a pressure of 2–10 Pa. Gas was used to slow down the laser-induced atomic flux and to modify thus the conditions of the coatings growth. At a pressure ～8 Pa, gas reduced the effectiveness of Se preferential sputtering by atomic flux, which resulted in the formation of coatings with a stoichiometric composition (x ≈ 2). The structure of the coatings was characterized by a greater degree of the perfect organization of atoms in the nanophase laminar packaging and reduced internal stresses. Studies by the ball-on-disk tests in humid air showed that the modification of the structure and the chemical composition of the coatings had a significant effect on their tribological behavior. Vacuum-deposited coatings fractured relatively quickly due to the cracking and delamination from the substrate surface along the sliding track. When the coatings deposited in helium were tested, wear by layer-by-layer removal was dominant, so the adhesive fracture was only observed in the local parts of the track. The simulation of the laser vapor deposition in the vacuum and in the buffer gas was performed. Likely factors that improve the tribological properties of the coating during deposition in the buffer gas were disclosed.