多层膜线列阵的巨磁电阻和层间耦合

研究了Fe/［NiFe/Cu］₃₀多层膜线列阵的室温磁电阻和磁滞特性，列阵的线密度为250和500线/mm，采用激光全息光刻和离子束刻蚀技术制成.线列阵样品的磁性与刻线加工前的连续膜有明显区别.最大巨磁电阻率有增也有减，最大增量为3.32%.外场平行线轴的矫顽力有的增加有的不变.这除了因为原始连续膜层间耦合态有差异之外，还与由线列阵加工引入的单轴各向异性和其它变化相关. 关键词：     

基于拖曳倾斜线列阵的海底反射损失提取方法

在浅海环境中,海底声学参数对水下声场的精确预报十分重要.现有的海底声学参数反演方法大多数是采用固定垂直阵进行的,其缺点是不能实施大面积、高分辨的走航式反演.在已提出的垂直阵海底反射损失反演方法的基础上,研究了基于三种线列阵阵形的海底反射损失提取方法及其特点,提出了基于拖曳倾斜线列阵与三个声源组合的走航式海底参数快速获取方法,并对该方法进行了误差分析.研究结果表明：覆盖同样的掠射角范围,垂直线列阵需与多个距离的声源组合,拖曳水平线列阵只需一个声源组合但需要采用较大的物理孔径,拖曳倾斜线列阵综合了垂直阵和水平 关键词： 水下声场预报 海底声学参数 海底反射损失 拖曳倾斜线列阵     

磁控溅射法制备极紫外6.8~11.0 nm波段Mo/B4C横向梯度多层膜

用直流磁控溅射法结合掩模板控制膜厚的方法在Si衬底上制备了工作于6.8~11.0 nm波段的[Mo/B₄C]₆₀横向梯度多层膜。利用X射线掠入射反射测试以及同步辐射反射率测试对梯度多层膜的结构及性能进行了测试。X射线掠入射反射测试结果表明,多层膜周期厚度沿着长轴方向从4.39 nm逐渐增加到7.82 nm,周期厚度平均梯度为0.054 nm/mm。对横向梯度多层膜沿长轴方向每隔5 mm进行了一次同步辐射反射率测试,结果显示,横向梯度多层膜在45°入射角下的反射率约为10%,反射峰的半高全宽介于0.13 nm到0.31 nm之间。     

HfO2顶层多层介质膜脉宽压缩光栅的离子束刻蚀

多层介质膜光栅是高功率激光系统的关键光学元件. 为了满足国内强激光系统的迫切需求,首先利用考夫曼型离子束刻蚀机开展了HfO₂顶层多层介质膜脉宽压缩光栅的离子束刻蚀实验研究. 采用纯Ar及Ar和CHF₃混合气体作为工作气体进行离子束刻蚀实验,获得了优化的离子源工作参数. 结果表明,与纯Ar离子束刻蚀相比,Ar和CHF₃混合气体离子束刻蚀时的HfO₂/光刻胶的选择比大. HfO₂的离子束刻蚀过程中再沉积效应明显,导致刻蚀光栅占宽比变大. 根据刻蚀速率分布制作的掩模遮挡板可以提高刻蚀速率均匀性,及时清洗离子源和更换灯丝,可保证刻蚀工艺的重复性. 利用上述技术已成功研制出多块最大尺寸为80 mm×150 mm、线密度1480线/mm、平均衍射效率大于95%的HfO₂顶层多层介质膜脉宽压缩光栅. 实验结果与理论设计一致,为大口径多层介质膜脉宽压缩光栅的离子束刻蚀提供了有益参考. 关键词： 光栅 多层介质膜 离子束刻蚀     

调幅W(Mo)/Cu纳米多层膜He+离子辐照响应行为

用磁控溅射技术制备不同调幅波长 (L) 的W(Mo)/Cu纳米多层膜,所制膜系在60 keV氦离子 (He⁺) 辐照条件下注入不同剂量: 0, 1×10¹⁷ He⁺/cm², 5×10¹⁷ He⁺/cm². 用X射线衍射仪 (XRD) 和高分辨透射电子显微镜(TEM)表征W(Mo)/Cu纳米多层膜辐照前后微观结构. 研究结果表明: 1) He⁺离子轰击引起温升效应是导致沉积态亚稳相β-W 转变成稳态 α-W相的主因, 而与调幅波长无明确关联; 2) 纳米多层结构中W(Mo) 和Cu膜显现出的辐照耐受性与调幅波长相关, 调幅波长越小, 抗He⁺的辐照性能越强; 3) 在5×10¹⁷ He⁺/cm²注入条件下, 观察到He团簇/泡在纳米结构W(Mo) 和Cu膜中的积聚行为存在明显差异: 在W (Mo) 膜中He团簇/泡的分布与晶粒取向相关, He团簇/泡倾向于沿W (211) 晶面分布; 而Cu膜非晶化且He团簇/泡在其体内呈均匀分布. 关键词： W(Mo)/Cu纳米多层膜 +辐照')" href="#">He⁺辐照 He团簇/泡 相转变     

应力场对多层膜Permalloy/Cu/Co/NiO铁磁共振性质影响的理论研究

采用能量极小原理研究了Permalloy(Py)/Cu/Co/Ni O多层膜结构中层间耦合强度和应力各向异性场对薄膜共振频率的影响,得到共振频率随外磁场强度变化关系式.结果发现外应力场强度和方向对系统共振频率的影响在本文中要强于层间耦合强度和交换各向异性场,外应力场方向对光学模共振频率的影响强于声学模,而外应力场强度对声学模共振频率的影响强于光学模.     

非晶Si/SiO2超晶格的制备及其光谱研究

用磁控溅射方法在玻璃基底上制备了非晶Si/SiO₂超晶格.利用透射电子显微镜 (TEM) 和X射线衍射技术对其结构进行了分析,结果表明,超晶格中Si层大部分区域为非晶相,局域微区呈现有序结构,其厚度由1.8—3.2nm变化,SiO₂层厚度为4.0nm.并采用多种光谱测量技术,如吸收光谱、光致发光光谱和Raman光谱技术,对该结构的光学性质进行了系统研究.结果表明,随纳米Si层厚度的减小,光学吸收边以及光致荧光峰发生明显蓝移,Raman峰发生展宽,即观测到明显的量 关键词：     

GexSi1-x/Si超晶格的X射线小角衍射分析

用分子束外延生长了23周期的Ge_xSi_1-x/Si超晶格,用计算机控制的衍射仪(CuK_a辐射)测量了X射线衍射曲线,共观察到13级超晶格结构的衍射峰。超晶格的周期和Ge平均含量可以根据考虑折射修正的布喇格定律得出。用光学多层膜反射理论分析衍射曲线可以确定超晶格的结构参数,第2级衍射峰与第一级峰的强度比对应于超晶格两种材料的相对厚度变化非常灵敏,通过比较实验和计算的I₂/I₁值,可以确定Si,Ge_xSi_1-x层的厚度以及合金组份x。用光学多层膜反射理谁计算得到的衍射曲线与实验曲线趋于一致。 关键词：     

真空退火对Ni80Fe20/Cu多层膜微结构的影响

用直流磁控溅射法在Si(001)衬底上制备了以Ta为缓冲层、含有15周期的Ni₈₀Fe₂₀（4nm)/Cu(6nm)多层膜.样品分别在150,250,350℃进行了真空退火处理.用低角和高角X射线衍射法研究了多层膜的微结构.结果表明,所有样品均有较好的[111] 取向,而且随退火温度或时间的增加,[111]取向程度变得更高.超晶格周期、平均面间距在退火后略有减小,表明多层膜结构在退火后变得更为致密.多层膜界面粗糙度随退火温度或时间的增加而增大,平均相关长度随退火温度或时间的增加而减小,分析认为这是由于Ni₈₀Fe₂₀/Cu界面存在严重的互扩散所导致的.模拟Ni₈₀Fe₂₀/Cu多层膜高角X射线衍射谱,发现在Ni₈₀Fe₂₀/Cu蜀面有非常厚的混合层存在,而且混合层厚度随退火温度或时间的增加而增大.模拟结果还表明,随退火温度或时间的增加,Ni₈₀Fe₂₀层面间距几乎保持不变,Cu层面间距则随退火温度的增加而略有减小. 关键词：     

Ta,Ta/Cu缓冲层对NiFe/Fe Mn双层膜交换偏置场的影响

采用磁控溅射方法制备了分别以Ta和Ta/Cu作为缓冲层的一系列NiFe/FeMn双层膜.实验发现,以Ta为缓冲层的NiFe/FeMn双层膜的交换偏置场比以Ta/Cu为缓冲层的NiFe/FeMn双层膜的交换偏置场大.测量了这两种双层膜的织构、表面粗糙度和表面成分.结果表明,以Ta/Cu为缓冲层时,Cu在NiFe层的上表面偏聚是造成NiFe/FeMn双层膜交换偏置场降低的重要原因. 关键词： NiFe/FeMn 交换偏置场 织构 表面粗糙度     

Ferromagnetic and spin-wave resonance in trilayer exchange-coupled structures NiFe/Cu/NiFe

SWR spectra of exchange-coupled NiFe/Cu/NiFe structures were investigated. We found that the optical satellites of exchange spin-wave modes are characterized not by the standard Kittel dependence but by their own dependence of the resonance field on the mode number: H _r ^opt(n) ∼ n ^5/2.     

Suppression of interlayer segregation in spin-valve NiFe/Cu/NiFe/FeMn multilayers

Experimental results show that Cu atoms can float out to or segregate to the NiFe/FeMn interface for Ta/NiFe/Cu/NiFe/FeMn/Ta spin-valve multilayers, which results in a drop of the exchange-coupling field (H_ex) of NiFe/FeMn in the spin-valve multilayers. However, when a small amount of Bi atoms is deposited between the Cu and the pinned NiFe layers, Cu segregation to the NiFe/FeMn interface can be suppressed. At the same time, H_ex of NiFe/FeMn in the spin-valve multilayers with a Bi interfacial layer can be effectively increased. PACS 75.70.Cn; 82.80.Pv     

Magnetoresistance in epitaxial [NiFe/Cu/Co(/Cu)] films

Epitaxial [NiFe/Cu/Co(/Cu)] films have been grown on Si(100)/Cu substrates using an ultrahigh vacuum evaporation method. Magnetoresistance (MR) and magnetization were measured at room temperature with maximum applied field, 40 kA/m. The (100) oriented [NiFe(3 nm)/Cu(6 nm)/Co(3 nm)/Cu(6 nm)] × 10 multilayers showed a sharply peaked MR curve (when the external field was applied along [011] direction) due to magnetization rotation of free NiFe layers separated from Co layers with thick Cu layers. Furthermore the interposition of a Ag layer in the Cu layer reduced the couplings between ferromagnetic layers and improved the sensitivity of the [NiFe/Cu/Co(/Cu)] film. Si(100)/Cu(5 nm)/[Co(3 nm)/Cu(2.4 nm)/Ag(0.2 nm)/Cu(2.4 nm)/NiFe(3 nm)/Cu(2.4 nm)/Ag(0.2 nm)/Cu(2.4 nm)] × 10 multilayers showed a resistivity change of about 8.2% per kA/m (12 Oe).     

Spin-wave resonance in Co/Pd magnetic multilayers and NiFe/Cu/NiFe three-layered films

The spectrum of standing spin waves has been detected by the ferromagnetic resonance method in NiFe(740 Å)/Cu/NiFe(740 Å) three-layered film structure in the perpendicular configuration for the copper thickness d _Cu ≤ 30 Å. At thicknesses d _Cu > 30 Å, the resonance absorption curve is a superposition of two spinwave resonance spectra from individual ferromagnetic NiFe layers. For Co/Pd multilayer films, united spinwave responance spectra have also been observed at thicknesses of the paramagnetic palladium layer up to d _Pd < 30 Å. The partial exchange stiffness has been calculated for a spin wave propagating across the Pd layer (A _Pd = 0.1 × 10^?6 erg/cm). This value is always positive (up to the critical thickness of the palladium interlayer d _Pd < d _c) or equal to zero (d _Pd > d _c).     

双层丝阵Z箍缩电流分配实验研究

负载内外层电流分配是决定双层丝阵Z箍缩内爆动力学模式的关键因素. 在"强光一号"装置上, 利用微型磁探针系统定量测量了双层钨丝阵三个重要径向位置点的电流, 获得了其在驱动电流开始上升至驱动电流达到峰值之前20ns这一阶段内的时间演化行为. 实验使用的双层钨丝阵负载高度为20mm、单丝直径为3.8μm、内/外层丝阵直径分别为8mm/16mm. 对比了内/外层丝根数分别为42/21和21/42时电流分配的差异. 结果表明: 驱动电流上升过程中, 内外层丝阵的电流均逐步增大, 外层丝阵电流份额逐渐减小, 而内层丝阵电流份额逐渐增大; 内层丝阵最大电流份额未超过50%; 内/外层丝根数为21/42的负载外层电流较大. 关键词： Z箍缩 双层丝阵 电流分配     

Magnetoresistance and magnetization studies through a Cu interlayer in spin valves of NiFe/Cu/NiFe/FeMn

The influence of the Cu layer thickness on the magnetic and magnetotransport properties has been investigated in Ta/NiFe/Cu/NiFe/FeMn spin valves. The magnetization and magnetoresistance measurements were carried out for magnetic field applied along the easy-axis direction. A phenomenological model, which assumes formation of a planar domain wall at the anti-ferromagnetic side of the interfaces as well as bilinear coupling between the ferromagnetic layers, was used to derive the anisotropy characteristics and orientation of each NiFe layer magnetization. The anisotropy and spin valve magnetoresistance were simulated numerically and compared with the experiment. It was found that the anisotropy magnetoresistance is negligible and that there is a poor agreement for the spin-valve one, which was attributed to the model (valid for ferromagnetic layers in single-domain state only) used for its calculation. It was found that the increase of the Cu layer thickness provokes a decrease of the interdiffusion between the NiFe and FeMn layers, and, as consequence, changes of the uniaxial anisotropy of the pinned NiFe layer, of the exchange interaction between the pinned NiFe layer and the FeMn ones, as well as of the exchange-bias field of the pinned NiFe layer.     

NiFe/Mo多层膜界面的电子显微学研究

用高分辨电子显微学方法研究了Ni₈₀Fe₂₀/Mo磁性多层膜，结果表明：(1)多层膜的结晶状态，随Mo非磁性层厚度而变化.当Mo层厚度为0.7nm时，多层膜基本为非晶；当Mo层厚度大于1.6nm时，Mo层和NiFe层内分别结晶为体心立方和面心立方多晶，层内晶粒尺寸为2—6nm.(2)在Mo层厚度为1.6和2.1nm的多层膜中，NiFe层和Mo层之间存在两种取向关系：(110)_Mo∥(111)_NiFe,［111］_关键词：     

Shape and thickness effects on the magnetization reversal of Py/Cu/Co nanostructures

We present an experimental investigation of the magnetization reversal process in NiFe/Cu(10 nm)/Co circular and elliptical nano-elements with different thickness of the magnetic layers. The results obtained using element sensitive X-ray resonant magnetic scattering (XRMS) were compared with the previous measurements showing that the dipolar interlayer coupling favours the antiparallel alignment of the two magnetization layers at remanance. In the case of circular shape, the increased thickness of the ferromagnetic layers stabilizes the antiparallel alignment of the layers over a wider field range. A similar effect, accompanied by a delay in the onset of the antiparallel alignment, is observed in the case of elliptical nano-elements and applying the external field along the longer axis of the elements, due to the additional shape anisotropy.