Radiation effects on the optical properties of Se85−x Te15Sb x thin films

The optical absorption of the as-deposited and γ-irradiated (doses of 3, 10, 12, 15 Mrad) thermally evaporated Se_85?x Te₁₅Sb _x (x=0, 6, 9) films was measured. The refractive index n and the extinction coefficient k of the films were calculated using an analytical method developed by Zheng et al. The Urbach relation was used in the fundamental edge region to calculate the width of the band tail states. The behavior of the composition with high concentration of antimony (x=9) was attributed to the produced Se–Sb bonds and an excess of Te–Te bonds, which break the chain structure of the Se–Te system and generate defects in the film. The related optical parameters were also calculated and discussed.     

Electrical and optical properties of a-SexTe100–x thin films

The dc electrical conductivity of as deposited thin films of a-Se_xTe_100?x (x=3, 6, 9 and 12) is measured as a function of temperature range from 298 to 383 K. It is observed that the dc conductivity increases exponentially with the increase in temperature in this glassy system. The value of activation energy calculated from the slope of ln σ_dc vs. 1000/T plot, is found to decrease on incorporation of dopant (Se) content in the Te system. On the basis of pre-exponetial factor (σ₀), it is suggested that the conduction is due to thermally assisted tunneling of the carriers in the localized states near the band edges. The optical absorption measurements show an indirect optical band gap in this system and it decreases on increasing Se concentration. The optical constants (extinction coefficient (k) and refractive index (n)) do change significantly with the photon energy and also with the dopant Se concentration. The decrease in optical band gap may be due to the decrease in activation energy in the present system. It is also found that the real and imaginary parts of dielectric constants show a significant change with the photon energy as well as with the dopant concentration. With large absorption coefficients and compositional dependence of optical band gap and optical constants (n and k), these materials may be suitable for optical disk applications.     

Some optical properties of Ge–S amorphous thin films

Amorphous Ge_xS_1−x films (x=0.27, 0.32, 0.36 and 0.4) were prepared by thermal evaporation. The values of the refractive index, the optical gap and the parameters of the Wemple–DiDomenico single oscillator model were determined. Using Miller's generalized rule the values of the third-order non-linear susceptibility were also estimated. Thermally induced bleaching was observed for films studied. Photobleaching was observed for sulfur rich and nearly stoichiometric films (x=0.27, 0.32) while for a germanium rich film (x=0.4) no response to the illumination was observed. The differences in photobleaching are attributed to the role of p-lone pair states and to an overall network rigidity of the films.     

Physical and optical properties of amorphous Ge x As20S80– x thin films

We report the effect of replacement of sulfur by germanium on the optical constants and some other physical parameters of chalcogenide Ge _x As₂₀S_{80– x} (where x?=?0, 5, 10, 15 and 20 at%) thin films. Increasing germanium content affected the average heat of atomization, average coordination number, number of constraints and the cohesive energy. Films with thicknesses 800–820?nm of Ge _x As₂₀S_{80– x} were prepared by thermal evaporation of bulk samples. Transmission spectra, T(λ), of the films at normal incidence were obtained in the region from 400 to 2500?nm. A straightforward analysis proposed by Swanepoel [J. Phys. E Sci. Instrum. 16 (1983) p 1214], based on the use of maxima and minima of the interference fringes, has been applied to derive the real and imaginary parts of the complex index of refraction and also the film thickness. Optical absorption measurements showed that the fundamental absorption edge is a function of composition. Optical absorption is due to allowed non-direct transition and the energy gap decreases while the refractive index increases with increasing germanium content. The chemical-bond approach has been applied to obtain the excess of S–S homopolar bonds and the cohesive energy of the Ge _x As₂₀S_{80– x} system.     

Determination of the thickness and optical constants of amorphous Ge–Se–Bi thin films

The effect of varying bismuth concentration on the optical constants of amorphous Ge₂₀Se_{80? x} Bi _x (where x = 0, 3, 6, 9 and 12 at%) thin films prepared by thermal evaporation has been investigated. The transmission spectra T(λ) of the films at normal incidence were obtained in the spectral region from 400 to 2500 nm. An analysis proposed by Swanepoel [J. Phys. E: Sci. Instrum. 16 (1983) p.1214], based on the use of the maxima and minima of the interference fringes, was applied to derive the real and imaginary parts of the complex index of refraction and also the film thickness. Increasing bismuth content was found to affect the refractive index and extinction coefficient of the Ge₂₀Se_{80? x} Bi _x films. Optical absorption measurements show that the fundamental absorption edge is a function of composition. With increasing bismuth content, the refractive index increases while the optical band gap decreases.     

The optical properties of MgxZnl-xO thin films

Mg_xZn_1-xO thin films have been prepared on silicon substrates by radio frequency magnetron sputtering at 60℃. The thin films have hexagonal wurtzite single-phase structure and a preferred orientation with the c-axis perpendicular to the substrates. The refractive indices of Mg_xZn_1-xO films are studied at room temperature by spectroscopic ellipsometry over the wavelength range of 400--760\,nm at the incident angle of 70℃. Both absorption coefficients and optical band gaps of Mg_xZn_1-xO films are determined by the transmittance spectra. While Mg content is increasing, the absorption edges of Mg_xZn_1-xO films shift to higher energies and band gaps linearly increase from 3.24.eV at x=0 to 3.90\,eV at x=0.30. These results provide important information for the design and modelling of ZnO/ Mg_xZn_1-xO heterostructure optoelectronic devices.     

Optical properties of ternary ZnS x Se1−x polycrystalline thin films

Ternary ZnS_xSe_1–x polycrystalline thin films were prepared by evaporation in vacuum of 10^–5 Torr. The molecular fractionx varied in the region ox1. The optical constants (the refractive indexn, the absorption indexk, and the absorption coefficient) were determined in the wavelength range 300–1600nm. A plot representing ₂=f(hv) shows that the ZnS_xSe_1–x polycrystalline thin films of different compositions have two direct transitions corresponding to the energy gapsE andE+. The variation in eitherE orE+ withx indicates that this system belongs to the amalgamation type. Such variation follows a quadratic equation. The bowing parameter was found to be 0.456 eV, roughly equal to the calculated value 0.60 eV using the empirical pseudopotential method based on the virtual-crystal approximation, in which the disorder effect has not been taken into account.     

Nonlinear optical properties of Au/PVP composite thin films

Colloidal Au and poly（vinylpyrrolidone） （PVP） composite thin films are fabricated by spin-coating method. Linear optical absorption measurements of the Au/PVP composite films indicate an absorption peak around 530 nm due to the surface plasmon resonance of gold nanoparticles. Nonlinear optical properties are studied using standard Z-scan technique, and experimental results show large optical nonlinearities of the Au/PVP composite films. A large value of χ^（3）/α up to 0.56× 10-^10esu·cm is obtained, which is comparable to the best values reported in metal/oxlde composite films.     

Photoconductivity in amorphous thin films of Ge22Se78−xBix

Temperature and intensity dependence of photoconductivity is studied in amorphous thin films of Ge₂₂Se_78−x Bi_x with x = 0, 2 and 10. Transient photoconductivity measurements have also been made on the same samples. Our results show that photosensitivity decreases as Bi concentration is increased from x = 0 to x = 2. However, at high concentration of Bi(x = 10), photosensitivity again increases. Transient photoconductivity also show a different behaviour at low and high concentration of Bi. Results have been explained in terms of defect states produced due to Bi incorporation in GeSe system.     

Influence of γ-irradiation on the optical and electrical properties of Se(0.85) Te(0.15) films

Abstract

Se_(0.85) Te_(0.15) films were prepared by thermal evaporation under vacuum on glass substrate. The optical and electrical properties of as deposited and irradiated Se_(0.85) Te_(0.15) films with different γ-doses are reported.

The optical constants (absorption coefficient (α), extinction coefficient (k), refractive index (n) and dielectric constants (?, ?) of unirradiated and irradiated films were calculated. The value of allowed direct optical energy gap of Se_(0.85) Te_(0.15) films increased from 1.47 eV. to 1.72 eV. with increasing the γ-doses to 2.5 Mrad. The irradiated films have lower resistivity than those as deposited films (unirradiated). The activation energy (ΔE) increases from 0.72 eV. to 0.86 eV. with increasing γ-doses to 2.5 Mrad.     

Studies on electrical switching behavior and optical band gap of amorphous Ge–Te–Sn thin films

Amorphous thin film Ge₁₅Te_85−x Sn _x (1≤x≤5) and Ge₁₇Te_83−x Sn _x (1≤x≤4) switching devices have been deposited in sandwich geometry using a flash evaporation technique, with aluminum as the top and bottom electrodes. Electrical switching studies indicate that these films exhibit memory type electrical switching behavior. The switching fields for both the series of samples have been found to decrease with increase in Sn concentration, which confirms that the metallicity effect on switching fields/voltages, commonly seen in bulk glassy chalcogenides, is valid in amorphous chalcogenide thin films also. In addition, there is no manifestation of rigidity percolation in the composition dependence of switching fields of Ge₁₅Te_85−x Sn _x and Ge₁₇Te_83−x Sn _x amorphous thin film samples. The observed composition dependence of switching fields of amorphous Ge₁₅Te_85−x Sn _x and Ge₁₇Te_83−x Sn _x thin films has been understood on the basis of Chemically Ordered Network model. The optical band gap for these samples, calculated from the absorption spectra, has been found to exhibit a decreasing trend with increasing Sn concentration, which is consistent with the composition dependence of switching fields.     

Effect of irradiating ion fluence on optical properties of ZnO1−x:Nx thin films

Swift heavy ion (SHI) irradiation is an effective technique to modify the optical properties of the materials. In the present investigation, the effect of 100?MeV?Ag⁷⁺ SHI irradiation fluence on the optical properties of ZnO_1?x:N_x thin films was studied. The post irradiation spectroscopic characterizations such as UV–VIS reflectance spectroscopy, Raman spectroscopy and photoluminescence (PL) spectroscopy analysis were carried out. The studies imply that when the SHI passes through the solid, the higher electronic stopping power of ions can weaken oxygen bonds in ZnO, resulting in the formation of donor defects such as oxygen vacancies and zinc interstitials. The formation of donor defects has been acknowledged through the increase in bandgap with irradiating ion fluence. The blue shift observed from the Raman spectra for the 3?×?10¹³ ions/cm² fluence-irradiated films implies the existence of compressive stress in the films. The PL analysis acknowledges the formation of donor defects upon irradiation. Furthermore, it conveys that the presence of N atoms in ZnO lattice leads to the formation of a less number of defects as compared with undoped ZnO while irradiation.     

Structural,optical and electrical properties of laser irradiated Pb doped Ga–Se chalcogenide thin films

Using the Transverse Electrical Excitation at Atmospheric Pressure (TEA) nitrogen laser, we had irradiated the amorphous thin films of Ga₁₀Se₈₁Pb₉ chalcogenide glass and the results have been discussed in terms of the structural aspects of Ga₁₀Se₈₁Pb₉ glass. The observed changes are associated with the interaction of the incident photon and the lone-pairs electrons which affects the band gap. The X-ray structural characterization revealed the amorphous nature of as prepared films and polycrystalline nature of the laser irradiated films. The optical band gap of these thin films is measured by using the absorption spectra as a function of photon energy in the wavelength region 400–1200 nm. It is found that the optical band gap decreases while the absorption coefficient increases with increasing the irradiation time. The decrease in the optical band gap has been explained on the basis of change in nature of films, from amorphous to polycrystalline state, with the increase in exposure time. The dc conductivities and activation energies of these thin films are measured in temperature range 303–403 K. It has been found that the activation energy in Ga₁₀Se₈₁Pb₉ chalcogenide thin films decreases whereas the dc conductivity increases at each temperature by increasing the irradiation time.     

Annealing induced transformations in structural and optical properties of Ge30Se70−xBix thin films

ABSTRACT

Thin films of Ge₃₀Se_70?xBi_x (x?=?5, 15, 20) were prepared by thermal evaporation method on glass substrates with thickness 800?nm. The films were annealed at 250°C and 320°C for 2?h to study the annealing-induced structural and optical change. The X-ray diffraction characterization revealed the amorphous to crystalline phase transformation with annealing. The indirect optical band gap decreased with annealing which is explained on the basis of phase transformation and density of localized states. The formation of surface dangling bonds around the crystallites during crystallization process reduced the band gap. The Tauc parameter and Urbach energy change show the degree of chemical disorderness in the films. The transmitivity decreased while the absorption coefficient increased with the annealing process. The microstructural study done by Field emission scanning electron microscopy shows the formation of crystallites upon annealing. Atomic force microscopy investigation on these films shows the influence of annealing on surface topography.