基于0.18μm工艺的超低功耗LDO设计

本文基于自适应偏置电流电路,设计了一款超低功耗的低压差线性稳压器（LDO）,使用动态零点补偿技术使电路稳定,提出了以比较器为核心的基于电容耦合电压峰值检测的过冲电压削减电路,以减小LDO在负载电流向下突变时产生的过冲电压。在使用自适应电流偏置电路以及过冲电压削减电路的情况下,空载状态的LDO静态电流小于590nA。本设计在两级误差放大器的输出端添加二极管连接形式的PMOS作为缓冲级,一方面有利于LDO的稳定,另一方面增强了LDO的瞬态响应特性。另外,本设计采用了0.18μm CMOS工艺,利用Cadence设计平台进行仿真验证,得到了一款输出电压为3.3V、最大负载电流为200mA、负载电流范围内相位裕度均在50°以上、负载电流在1mA与200mA之间以10ns跳变时得到的欠冲电压为160mV、过冲电压136mV的超低功耗LDO。     

基于高压摆率误差放大器和摆率增强电路的无片外电容LDO

基于0.35μm CMOS工艺设计了一款无片外电容低压差线性稳压器(cap-free LDO),通过误差放大器组成的环路控制稳态误差,通过摆率增强电路构成的环路改善瞬态响应。该LDO输出电压为1.72V,压差80mV,最大输出电流50mA。测试结果显示:负载电流(IL)在0.5μs内瞬变50mA时,俯冲电压和过冲电压均为80mV左右,重回稳态的时间均小于1.5μs。     

一种无片外电容LDO的瞬态增强电路设计

利用RC高通电路的思想,针对LDO提出了一种新的瞬态增强电路结构。该电路设计有效地加快了LDO的瞬态响应速度,而且瞬态增强电路工作的过程中,系统的功耗并没有增加。此LDO芯片设计采用SMIC公司的0.18μmCMOS混合信号工艺。仿真结果表明:整个LDO是静态电流为3.2μA;相位裕度保持在90.19°以上;在电源电压为1.8 V,输出电压为1.3 V的情况下,当负载电流在10 ns内由100 mA降到50 mA时,其建立时间由原来的和28μs减少到8μs;而在负载电流为100 mA的条件下,电源电压在10 ns内,由1.8 V跳变到2.3 V时,输出电压的建立时间由47μs降低为15μs。     

一种瞬态增强的无外接电容LDO电路设计

设计了以增强型AB跟随器作为缓冲级的带瞬态增强电路的线性稳压器(LDO)。在保证LDO环路稳定性的同时,将增强型AB跟随器的偏置电流改为动态偏置电流,同时加入瞬态增强电路来改善系统重载到轻载来回跳变时的瞬态性能。仿真结果表明,该稳压器输入电压2.7~5 V,输出电压2.5 V,压差200 m V,电路空载时静态电流18μA,最大负载电流100 m A;在输出电容为100 pF时,负载电流以99×10~(–3)A/μs跳变,输出电压下冲和过冲分别为89 m V和110 m V,均在1.5μs内恢复稳定。     

快速瞬态响应低噪声无片外电容LDO

针对便携式设备快速瞬态响应、低噪声、高电源抑制比等应用需求,提出了一种无片外电容NMOS型低压差线性稳压器(LDO)。该LDO基于浮栅结构,通过具有推挽输出级的放大器辅助控制,减小了电荷泵的噪声耦合;另外,通过取样输出电流控制误差放大器的输出动态范围,极大地提高了电路的瞬态响应能力。电路基于HHGrace 0.35μm BCD工艺设计,仿真结果表明,无外接电容时,负载电流在1μA～400 mA之间跳变,电路的下冲电压为203 mV,过冲电压为101 mV,响应时间小于1.5μs;在10 Hz～100 kHz的频段内,系统输出积分噪声电压为14μV·Hz^-1/2。LDO达到了快速瞬态响应和低噪声的需求。     

车规级LIN总线中55V摆率增强型LDO

针对传统车载芯片中高压型低压差线性稳压器(LDO)的负载电流小、电源抑制比低、瞬态响应差等问题,提出了一种增强型高压LDO,通过一种新型高压预调制电路,提高了高压LDO的电源抑制比;通过一种新型摆率增强电路,改善了高压LDO的瞬态响应。电路基于BCD-120 V CMOS工艺完成建模,仿真结果显示,电压可调范围为5.5～55 V,输出5 V;负载电流为800 mA;低频电源抑制比为96 dB;1μs内负载电流从1 mA跳变到800 mA时,输出端最大上冲电压为26.6 mV,响应时间为8μs;下冲电压为45.4 mV,响应时间为7μs,满足车规级局域互联网(LIN)总线中高压LDO的性能要求。     

一种低功耗、高稳定性的无片外电容线性稳压器

本文研究并设计了输出电压3.3V,最大输出电流为150mA的CMOS无片外电容的低压差线性稳压器(Off-chipcapacitor-free Low-dropout Voltage Regulator,LDO).该LDO采用了NMC(Nested Miller Compensation)频率补偿技术保证了系统的稳定性.另外,采用大电容环路和SRE(Slew Rate Enhancement)电路抑制输出电压的跳变,改善了瞬态响应.电路采用了低功耗设计技术.采用CSMC 0.5μm CMOS混合信号工艺模型仿真表明:整个LDO的静态电流仅为3.8μA;最差情况下的相位裕度约为88.50;在5V工作电压下,当负载电流在1μs内从150mA下降到1mA时,输出电压变化仅为140mV;在负载电流150mA的情况下,当电源电压在5μs内从3.5V跳变至5V时,输出电压变化也仅为140mV.     

一种低功耗无片外电容LDO的设计

基于SMIC 0.18 μm CMOS工艺,设计了一款输入电压为1.8 V、输出电压为1.6 V的低功耗无片外电容低压差线性稳压器(LDO),其静态电流仅为5 μA。该电路采用一种新型摆率增强电路,通过检测输出电压的变化实现对功率管的瞬态调节。片内采用密勒补偿使主次极点分离,整个系统在负载范围内具有良好的稳定性。仿真结果显示,该LDO在负载电流以99 mA/1 μs跳变时,输出电压下冲为59 mV,上冲为60 mV,响应时间约为1.7 μs。     

一种快速瞬态响应的无片外电容型LDO

设计了一种快速瞬态响应的无片外电容型LDO。采用高增益高带宽的超级跨导结构(STC)的误差放大器,利用动态偏置技术与电容耦合技术,极大地增强了摆率。引入额外的快速响应环路,进一步提升了瞬态响应速度。基于0.18 μm CMOS工艺进行设计。结果表明,该LDO的最低供电电压为1 V,漏失电压仅为200 mV,可提供最大100 mA的负载电流,能在最大输出电容为100 pF、最低负载为50 μA的条件下保证电路稳定。负载电流在0.5 μs内由50 μA跳变至100 mA时,LDO输出导致的过冲电压和下冲电压分别为200 mV和306 mV。     

一种1.2V,80mA,5μF快速瞬态响应、高稳定性LDO的设计

基于上华0.5μm工艺,设计了输入电压为1.5V,输出电压为1.2V,最大输出电流为80mA,用于DC/DC里的CMOS低压差线性稳压器(Low-dropout regulator),作为带隙基准输出端的后续模块,以达到滤波和提高参考电压精度的目的。提出了一种补偿网络,可以保证负载电流发生变化时,相位裕量不发生变化;在补偿网络的基础上添加一个感应电容能够快速跟踪极点的变化,从而保证在负载电流跳变瞬间稳定性保持不变,防止了输出电压发生振荡的情形。此外,设计了一种瞬态响应提高电路结构来改善负载瞬态响应。仿真结果表明,在tt corner下该LDO线性稳压器在负载电流为1mA和80mA时的相位裕度均为83°,环路增益为80dB,流片测试结果显示过冲电压和欠冲电压均不超过100mV。     

Resolution Enhancement Technology:Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.     

Cost-effective test solutions for smart card and other integrated flash applications

From its emergence in the late 1980s as a lower cost alternative to early EEPROM technologies, flash memory has evolved to higher densities and speedsand rapidly growing acceptance in mobile applications.In the process, flash memory devices have placed increased test requirements on manufacturers. Today, as flash device test grows in importance in China, manufacturers face growing pressure for reduced cost-oftest, increased throughput and greater return on investment for test equipment. At the same time, the move to integrated flash packages for contactless smart card applications adds a significant further challenge to manufacturers seeking rapid, low-cost test.     

An improved parallel thinning algorithm with two subiterations

The parallel thinning algorithm with two subiterations is improved in this paper. By analyzing the notions of connected components and passes, a conclusion is drawn that the number of passes and the number of eight-connected components are equal. Then the expression of the number of eight-connected components is obtained which replaces the old one in the algorithm. And a reserving condition is proposed by experiments, which alleviates the excess deletion where a diagonal line and a beeline intersect. The experimental results demonstrate that the thinned curve is almost located in the middle of the original curve connectivelv with single pixel width and the processing speed is high.     

Theoretical analysis of the relationship between the Brillouin gain coefficient and the strain in the optical-fiber sensors

The relation between the power of the Brillouin signal and the strain is one of the bases of the distributed fiber sensors of temperature and strain. The coefficient of the Bfillouin gain can be changed by the temperature and the strain that will affect the power of the Brillouin scattering. The relation between the change of the Brillouin gain coefficient and the strain is thought to be linear by many researchers. However, it is not always linear based on the theoretical analysis and numerical simulation. Therefore, errors will be caused if the relation between the change of the Brillouin gain coefficient and the strain is regarded as to be linear approximately for measuring the temperature and the strain. For this reason, the influence of the parameters on the Brillouin gain coefficient is proposed through theoretical analysis and numerical simulation.     

Novel fiber-optical interferometer with miniaturized probe for in-hole measurements

Today, micro-system technology and the development of new MEMS （Micro-Electro-Mechanical Systems） are emerging rapidly. In order for this development to become a success in the long run, measurement systems have to ensure product quality. Most often, MEMS have to be tested by means of functionality or destructive tests. One reason for this is that there are no suitable systems or sensing probes available which can be used for the measurement of quasi inaccessible features like small holes or cavities. We present a measurement system that could be used for these kinds of measurements. The system combines a fiber optical, miniaturized sensing probe with low-coherence interferometry, so that absolute distance measurements with nanometer accuracy are possible.     

Study of waveguide coupling efficiency in hybrid silicon lasers

This paper presents a new method to increase the waveguide coupling efficiency in hybrid silicon lasers. We find that the propagation constant of the InGaAsP emitting layer can be equal to that of the Si resonant layer through improving the design size of the InP waveguide. The coupling power achieves 42% of the total power in the hybrid lasers when the thickness of the bonding layer is 100 nm. Our result is very close to 50% of the total power reported by Intel when the thickness of the thin bonding layer is less than 5 nm. Therefore, our invariable coupling power technique is simpler than Intel＇s.     

Curved crystal spectrometer for the measurement of X-ray lines from laser-produced plasmas

In order to diagnose the laser-produced plasmas, a focusing curved crystal spectrometer has been developed for measuring the X-ray lines radiated from a laser-produced plasmas. The design is based on the fact that the ray emitted from a source located at one focus of an ellipse will converge on the other focus by the reflection of the elliptical surface. The focal length and the eccentricity of the ellipse are 1350 mm and 0.9586, respectively. The spectrometer can be used to measure the X- ray lines in the wavelength range of 0.2-0.37 nm, and a LiF crystal （200） （2d = 0.4027 nm） is used as dispersive element covering Bragg angle from 30° to 67.5°. The spectrometer was tested on Shengnang- Ⅱ which can deliver laser energy of 60-80 J/pulse and the laser wavelength is 0.35 μm. Photographs of spectra including the 1 s2p ^1P1-1s^2 ^1S0 resonance line（w）, the 1s2p ^3P2-1s^2 1S0 magnetic quadrupole line（x）, the 1s2p ^3P1-1 s^2 ^1S0 intercombination lines（y）, the 1 s2p ^3S~1-1 s^2 ^1S0 forbidden line（z） in helium-like Ti Ⅹ Ⅺ and the 1 s2s2p ^2P3/2-1 s622s ^2S1/2 line（q） in lithium-like Ti Ⅹ Ⅹhave been recorded with a X-ray CCD camera. The experimental result shows that the wavelength resolution（λ/△ 2） is above 1000 and the elliptical crystal spectrometer is suitable for X-ray spectroscopy.     

Preparation and Characterization of TaN ALD Precursors

High purity organic-tantalum precursors for thin film ALD TaN were synthesized and characterized.Vapor pressure and thermal stability of these precursors were studied.From the vapor pressure analysis,it was found that TBTEMT has a higher vapor pressure than any other published liquid TaN precursor,including TBTDET,TAITMATA,and IPTDET.Thermal stability of the alkyl groups on the precursors was investigated using a 1H NMR technique.The results indicated that the tertbutylimino group is the most stable group on TBTDET and TBTEMT as compared to the dialkylamido groups.Thermal stability of TaN precursors decreased in the following order:TBTDET ＞ PDMAT ＞ TBTEMT.In conclusion,precursor vapor pressure and thermal stability were tuned by making slight variations in the ligand sphere around the metal center.     

Electronic Structure of Semiconductor Nanocrystals

This paper reviews our recent development of the use of the large-scale pseudopotential method to calculate the electronic structure of semiconductor nanocrystals, such as quantum dots and wires, which often contain tens of thousands of atoms. The calculated size-dependent exciton energies and absorption spectra of quantum dots and wires are in good agreement with experiments. We show that the electronic structure of a nanocrystal can be tuned not only by its size,but also by its shape. Finally,we show that defect properties in quantum dots can be significantly different from those in bulk semiconductors.     

A rigorous proof of MIMO channel capacity’s increase with antenna number

It is well known that adding more antennas at the transmitter or at the receiver may offer larger channel capacity in the multiple-input multiple-output（MIMO） communication systems. In this letter, a simple proof is presented for the fact that the channel capacity increases with an increase in the number of receiving antennas. The proof is based on the famous capacity formula of Foschini and Gans with matrix theory.