磁控溅射工艺参数对涤纶机织物基纳米金属薄膜抗静电性能的影响

在室温条件下采用磁控溅射技术在涤纶机织物表面沉积金属薄膜,利用扫描电镜(SEM)和原子力显微镜(AFM)观察纳米金属薄膜的表面形貌,通过分别改变磁控溅射工艺参数溅射时间、溅射功率和气体压强,研究其对试样抗静电性能的影响。实验结果表明,溅射时间和溅射功率对镀金属薄膜试样的抗静电性能均影响较大,而气体压强影响相对较小。溅射时间40min、溅射功率120W、气体压强1.6Pa工艺条件下,镀Cu膜试样的抗静电性能最好;溅射时间40min、溅射功率120W、气体压强1Pa或1.6Pa工艺条件下,镀Ag膜试样的抗静电性能最好,而且镀Ag比镀Cu薄膜试样的抗静电性能更优异。     

生长参数对Si1-xGex:C合金薄膜中元素分布的影响

用化学气相淀积方法在Si(100)衬底上外延生长Ge组分渐变的Si1-xGexC合金薄膜.本文通过能量色散谱仪乔(EDS)和扫描电子显微镜(SEM)对合金薄膜的元素深度分布和表面形貌进行了表征,分析研究了外延层的生长温度、生长时间对Si1-xGexC合金薄膜性质的影响.结果表明,Si1-xGexC外延层生长温度和生长时间一定范围内的增加加强了岛与岛之间的合并,促进了衬底Si原子向表面扩散、表面Ge原子向衬底扩散,且生长温度比生长时间对Si、Ge原子互扩散的影响大.     

CdZnTe晶体欧姆接触电极的制备工艺研究

高阻CdZnTe晶体是X射线及γ射线探测最优秀的材料.制备CdZnTe探测器最关键的技术之一就是在CdZnTe表面制备出欧姆接触薄膜电极.关于在CdZnTe晶体表面制备接触电极用导电薄膜,大都是采用蒸发镀膜技术,膜层与CdZnTe晶体结合不很牢固.本论文主要开展了在CdZnTe晶体上欧姆接触电极的选材和制备工艺的研究.理论分析了金属与CdZnTe半导体的接触关系,根据影响因素选择Cu/Ag合金作为电极薄膜材料.利用射频磁控溅射法成功地在CdZnTe晶体上制备出Cu/Ag膜.研究发现Cu/Ag合金膜的电阻率随溅射功率的增大而增大、衬底温度的升高而降低.从理论上对这一规律进行了解释.     

ZrO2（YSZ）衬底和YBa2Cu3O7—δ超导膜的相互作用

研究了不同晶向的 ZrO_2(YSZ)与 YBa_2Cu_3O_(?)超导膜的相互作用。结果表明:衬底 ZrO_2的晶向对YBa_2Cu_3O_(7-δ)晶粒取向有明显影响,在<100>ZrO_2上制备的超导膜,超导晶粒 c 轴平行于衬底表面,出现择优取向;在 Y-Ba-Cu-O/ZrO_2上铜晶粒的析出是由于超导膜与 ZrO_2界面反应引起的;用俄歇能谱(AES)和背散射技术(RBS)都观察到了 Ba、Cu 原子向衬底的内扩散;同时,实验证实了在 ZrO_2衬底上热蒸发(?)薄层 Ag 对衬底反应有强压制作用,并在 YBa_2Cu_3O_(7-δ)/Ag/ZrO_2样品中观察到了超导晶粒 c 轴在垂直于衬底方向出现择优取向。     

生长参数对Si_(1-x)Ge_x∶C合金薄膜中元素分布的影响

用化学气相淀积方法在Si(100)衬底上外延生长Ge组分渐变的Si1-xGex∶C合金薄膜。本文通过能量色散谱仪(EDS)和扫描电子显微镜(SEM)对合金薄膜的元素深度分布和表面形貌进行了表征,分析研究了外延层的生长温度、生长时间对Si1-xGex∶C合金薄膜性质的影响。结果表明,Si1-xGex∶C外延层生长温度和生长时间一定范围内的增加加强了岛与岛之间的合并,促进了衬底Si原子向表面扩散、表面Ge原子向衬底扩散,且生长温度比生长时间对Si、Ge原子互扩散的影响大。     

阳极氧化铝的原子层淀积封孔研究

制备了多孔阳极氧化铝,利用原子层淀积技术对其封孔,借助场发射扫描电镜(SEM)分析了样品的表面及剖面形貌,对样品进行染色处理,利用酸性点滴试验测试样品抗腐蚀性能。结果表明:阳极氧化处理形成大孔径约为16 nm的多孔膜,多孔膜在循环50次的原子层淀积下能实现表面封孔而内部有空结构;经封孔后的样品抗染色及抗腐蚀能力增强。     

GaN负电子亲和势光电阴极材料的生长研究

采用低压金属有机化学汽化淀积法在蓝宝石(0001)衬底上生长2~5μm厚度的P-AlxGa1-xN/GaN层(0     

在硅片上制备SnO_2敏感膜

本文介绍采用真空蒸镀与低温氧化相结合的工艺,在生长有氧化层的硅片上利用金属Sn制备SnO_2敏感膜。它较化学气相淀积法易于控制,并可充分利用硅平面工艺生产线现有设备,所制备的SnO_2敏感膜经扫描电镜形貌分析,其粒径小于1μm,且对乙醇,甲烷都有一定的敏感性。到目前为止,制备SnO_2敏感膜的方法有:高频溅射,直流溅射,化学气相淀积,高频等离子激活化学气相淀积,真空蒸镀等。这些方法主要是用锡的氧化物和锡盐将SnO_2膜制作在绝缘衬底(Al_2O_3)上。众所周知,采用溅射方法需要昂贵的设备,而化学气相淀积法(CVD)所需工艺参数较多,难于控制,且对环境要求较严,而我们采用的真空蒸镀同低温氧化相结合的方法,工艺参数较少,对环境要求不象CVD那样严格,更主要的是可以利用硅平面工艺生产线现有设备制成厚度均匀,粒径合适,对某些气体和湿度都灵敏的敏感膜。     

稀土金属Tb在GaAs(100)表面的吸附及其界面形成的研究

利用同步辐射光电子能谱技术研究了Tb/GaAs(10 0 )界面的吸附过程和界面形成。通过对价带谱及高分辨率的Ga,As芯能级谱的研究表明 ,在较低的覆盖度下 (<0 2nm) ,Tb与GaAs衬底的反应很弱 ,形成较突变的金属 /半导体界面。当Tb的覆盖度增加时 ,As 3d和Ga 3d的表面发射峰很快消失 ,Tb与衬底发生反应 ,置换出Ga而与As形成化学键。同时Ga原子会向Tb薄膜内扩散并偏析到表面 ,而Tb As化合物只停留在界面附近区域。当Tb淀积到 0 6nm时 ,Tb膜金属化。     

光电子能谱研究表面氧对三种金属-GaAs(110)界面的影响

用紫外光电子能谱(UPS)和x光电子能谱(XPS)研究了十分之几单层(ML)的氧化学吸附在GaAs(110)清洁解理面后,对随后淀积的金属与GaAs所形成的界面的影响。实验表明,表面氧不仅在金属覆盖的初始阶段(少于0.2ML)阻止金属原子或成团金属与衬底的直接作用,而且在金属(包括贵金属银、金和活泼金属铝)覆盖量增加时,延滞了金属与衬底的混杂或直接作用,氧的存在又延迟了三维岛状结构的形成。虽然化学行径与铝不同的银和金在氧化的GaAs表面有不少相似,但从自旋轨道分裂峰出现的差异中,包隐着两种界面的差别。     

Certification Institutions Expected to Update and Transfer Information on Present Standards

Standards are the basis for production enterprises to organize production, ex-factory inspection, trade (delivery) and technical exchanges, product certification, quality arbitration and supervision.……     

Optimum-Simulation von Ernteprozessen

Zusammenfassung Bei der Gestaltung von Ernteprozessen — beispielsweise des Prozesses Mähdrusch, Körnertransport und -abnahme — als transportverbundene Fließarbeitsverfahren mit mindestens zwei verschiedenen Arbeitsmitteln gibt es einen großen Optimierungsspielraum. Solche Prozesse sind mehrstufige Bedienungsprozesse mit gemischter Anordnung der Bedienungseinrichtungen. Außerdem besitzen sie stark ausgeprägte räumliche Aspekte. Es wird vor allem gezeigt, welche Merkmale solcher Prozesse in Simulationsmodellen abgebildet sein müssen, welche Zielgrößen in Abhängigkeit von welchen Einflußgrößen unter Berücksichtigung welcher Prozeßbedingungen ermittelt werden sollten und wie der Bewertungsprozeß zur Ermittlung der gewünschten Informationen gestaltet werden muß.     

Brainstorming for ISO Strategy 2016-2020

正Responding to ISO’s appeal for survey for the to-be-developed ISO Strategy Plan for 2016-2020,SAC hosted a special workshop over the needs and comments of various fi elds on June 8 in Beijing.The workshop was attended by ISO President-elect and Ansteel General Manager Zhang Xiaogang,SAC Vice-Administrator Yu Xinli,and 30 experts from     

CNAS Passes APLAC's PTP Review

正The review group of Asia Pacific Laboratory Accreditation Cooperation(APLAC)carried out a 4-day peer review of the proficiency testing provider(PTP)for China National Accreditation Service for Conformity Assessment(CNAS)from July 28 to 31,2014.CNAS passed the PTP review with excellent performance.Two senior peer reviewers of APLAC made a comprehensive,rigorous and detailed review of CNAS’s PTP accreditation activities,and made the on-spot inspection of the review groups in Shanghai and Shenzhen respectively.     

新闻(英文)

正China and Greece Sign the Standardization Cooperation Agreement Witnessed by Chinese Premier Li Keqiang and Greek Prime Minister Antonis Samaras,AQSIQ Minister Zhi Shuping and ELOT Chairman and Executive Director Angelos Tolkas signed the SAC-ELOT Standardization Cooperation Agreement.The Agreement is one of the critical cooperation documents signed during Li Keqiang’s visit in Greece,encouraging China and Greece to     

Win-Win Cooperation

正The Chinese Premier Li Keqiang's recent trip to the UK has reinforced the China-UK comprehensive strategic partnership;just as the British Prime Minister David Cameron put it,"the relationship is gaining in strength,depth and understanding"after a bucket of business deals being inked worth more than 30 billion US dollars.From the first agreement signing in 2004 to the new agreement of mutual standards recognition and adoption in     

Systematic Approach for Emerging Industry

正A national directory of standards complexes for strategic emerging sectors was recently developed and released jointly by 12governmental departments,namely,SAC,NDRC,MOST,MIIT,MEP,MOA,AQSIQ,State Forest Administration,State Administration of Science and Technology for National Defense,State Oceanic Administration and National Railway Administration.     

Strictest Pollutants Emission Standards

正Four new national standards on air pollutant emission control offi cially issued by the Ministry of Environment Protection(MEP)together with AQSIQ and SAC has been brought into force from July 1,2014.The Emission standard for air pollutants of coal-burning,oil-burning and gasfi red boilers,which is the strictest emission standard historically,will tackle the stubborn pollution problem of boilers and waste incineration in most of China’s regions.     

Instructions to Authors

New Carbon Materials is a bimonthly journal published with the permission of the Ministry of Science and Technology and of the State News and Publication Agency.The journal is sponsored by the Institute of Coal Chemistry,Chinese Academy of Sciences,and is published by Science Press.Aims and Scope     

Progress on Standards Copyright Protection

正Recently,National Copyright Administration of China(NCAC)has rewarded 215 organizations and 179 individuals for their outstanding efforts on investigating standards copyright infringement and piracy in 2013.Hua Jianhua,the Deputy-Director of National Standards Copyright Protection Workgroup Office won a third prize of the national individual award.In 2012,SAC set up the national standards copyright protection working group,and developed policies to crack down standards infringement and piracy behaviors and to strengthen standards copyright protection.