共查询到18条相似文献,搜索用时 62 毫秒
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本文介绍一种全自动、智能化计算机控制系统在真空离子镀膜机设备中的应用,可实现对真空离子镀膜机设备中各设备(泵阀机组、真空计、多路气路系统、电弧电源系统、偏压电源系统、溅射电源系统等)的全自动控制,实现对各种工件镀膜过程的装炉、自动抽气、镀膜、充气以及卸载工件等过程。 相似文献
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LHD——800型多弧离子镀膜机是在真空环境中,采用蒸发源新技术,使钛等金属材料蒸发并电离,同时通入氮气,使它在等离子体环境中游离为正离子,然后靠电场力将这些离子加速并沉积在工件表面,化合为氧化钛硬质薄瑛。也可在较大型刀具,工模具表面离子氮化,离子茂膜(TIN)和离子渗镀—渗氮后再涂复一层氮化钛,对耐磨、耐腐蚀起到超硬膜的作用,以改善刀、模具性能,提高使用寿命。一、试验用设备试验用设备LHD—800型多弧离子镀膜机,性能如下。 相似文献
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研究了一种基于DSP控制的斩控式交流调压电源.分析了其控制原理,设计了以TMS320F2812型DSP为核心的控制电路.介绍了电源的拓扑结构,主回路工作原理,硬件控制系统与控制软件的设计.该电源具有电压调节范围宽、功率因数高、谐波容易滤除等优点.实验结果验证了设计的正确性和有效性. 相似文献
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高温真空钽材退火炉是用来生产难熔金属钽的工业化批量生产专业设备。钽材退火是一道精细的冶金工艺,要求真空度、温度、时间三者之间精确配合,从而达到出炉产品的化学成分和物理性能指标满足要求。因此,就需要精确的自动控制系统对其进行几乎分毫不差的控制。该文研究设计了一种以MCGS触摸屏组态软件为核心,通过该软件内部程序控制温控表输出和PLC等硬件执行器的开关,从而达到工艺控制的自动化系统。根据现场使用情况分析,在应用了该套系统后,提高了使用厂家的生产效率和产品稳定性,保证了产品的成品率。 相似文献
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An improved vacuum evaporator is described for coating frozen-hydrated biological samples with beryllium for X-ray microanalysis. The evaporator permits repeated coatings without bringing the main chamber to atmospheric pressure and ambient temperature. The use of a glass sleeve in the evaporation chamber facilitates cleaning. 相似文献
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Jarir K. Chaar Daniel Teichroew Richard A. Volz 《International Journal of Flexible Manufacturing Systems》1993,5(2):95-128
Computer-Integrated Manufacturing (CIM) systems may be classified as real-time systems. Hence, the applicability of methodologies that are developed for specifying, designing, implementing, testing, and evolving real-time software is investigated in this article.The paper highlights the activities of the software development process. Among these activities, a great emphasis is placed on automating the software requirements specification activity, and a set of formal models and languages for specifying these requirements is presented. Moreover, a synopsis of the real-time software methodologies that have been implemented by the academic and industrial communities is presented together with a critique of the strengths and weaknesses of these methodologies.The possible use of the real-time methodologies in developing the control software of efficient and dependable manufacturing systems is explored. In these systems, efficiency is achieved by increasing the level of concurrency of the operations of a plan, and by scheduling the execution of these operations with the intent of maximizing the utilization of the devices of their systems. On the other hand, dependability requires monitoring the operations of these systems. This monitoring activity facilitates the detection of faults that may occur when executing the scheduled operations of a plan, recovering from these faults, and, whenever feasible, resuming the original schedule of the system.The paper concludes that the set of surveyed methodologies may be used to develop the real-time control software of efficient and dependable manufacturing systems. However, an integrated approach to planning, scheduling, and monitoring the operations of these systems will significantly enhance their utility, and no such approach is supported by any of these methodologies. 相似文献
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提出一种新型机电一体化的带紧急制动功能的真空助力器,除具有传统真空助力器的功能外,在行驶中发现突发事件时真空助力器会提供更快的制动。通过缩短制动距离来保证驾乘人员及行人的人身安全、避免财产损失。 相似文献
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针对射频辉光放电过程中射频电源与直流偏压电源的叠加问题,通过分析阻抗匹配网络和高频屏蔽网络的工作原理,利用阻抗匹配网络将射频电源的高频能量最大效率的输出到真空室,利用高频屏蔽网络将射频电源的高频能量进行屏蔽的同时将直流偏压电源的低频能量最大效率的输出到真空室.对射频辉光放电过程中射频电源、直流偏压电源以及真空室模型进行了系统的电路仿真,实现了射频电源与直流偏压电源的叠加,利用自制的射频电源与直流偏压电源系统进行了真空镀膜实验,证实了双电源系统的可行性.研究结果表明,利用阻抗匹配网络和高频屏蔽网络能够很好地将射频电源与直流偏压电源进行叠加,由双电源系统产生的带有负偏压的高频能量能够对真空镀膜工艺产生影响,有助于探索新的镀膜工艺. 相似文献
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K. Fladischer D. Litwin J. Galas A.E. Weeks D.A. MacLaren R. Lammegger H. Sormann W.E. Ernst B. Holst 《Precision Engineering》2008,32(3):182-185
The requirements for high precision metrology devices have increased rapidly in recent years. Furthermore, the applications are spreading to many new branches of science and technology. Hence new demands are appearing which are related not only to classical parameters such as precision and speed but also to other factors including the environment in which the measurements must be performed. In this paper we present a new device for measuring complex surface profiles of samples held under high vacuum conditions. The surface profile is obtained by scanning an optical sensor, held in air, across a standard view-port. The sensor has a lateral resolution of 25 m and a perpendicular distance resolution of 0.12 m over a range of 3 mm. The maximum scanning area is a circle, 30 mm in diameter. The device was developed to characterize silicon wafers for use as mirrors for atom optical applications. The mirrors are formed by bending the silicon under an applied electric field, which requires high vacuum conditions to prevent arc discharge. In the last part of the paper we discuss how simulations can be used to determine the required sampling grid spacing for obtaining the surface profile shape with a given accuracy. 相似文献