高迁移率聚合物薄膜晶体管

以高掺杂Si单晶片作为栅电极, 热生长SiO₂作为栅介质层, 聚三己基噻吩薄膜作为半导体活性层, Au作为源、漏电极, 并采用十八烷基三氯硅烷（OTS）对栅介质表面改性, 在空气环境下成功地制备出高性能聚合物薄膜晶体管. 结果表明, 通过采用OTS对栅介质层表面修饰大幅度地改善了聚合物薄膜晶体管的电性能, 器件的场效应迁移率高达0.02 cm²/（Vs）, 开关电流比大于10⁵. 关键词： 聚合物薄膜晶体管 聚三己基噻吩 场效应迁移率 表面修饰     

聚3-己基噻吩-b-聚十六烷氧基联烯嵌段聚合物的制备及其场效应性能

以溴代十六烷、丙炔醇为原料通过取代反应、还原重排反应制备了十六烷氧基联烯,然后以氯化(三环己基膦)镍作为催化剂,通过控制加料顺序一锅制备了聚3-己基噻吩-b-聚十六烷氧基联烯的嵌段聚合物。通过核磁共振氢谱和体积排除色谱对产物进行了表征和确证。对聚3-己基噻吩-b-聚十六烷氧基联烯嵌段聚合物的热学性能、光学性能及电学性能进行了研究。差示扫描量热法和热重分析结果表明,嵌段共聚物具有两个玻璃化转变温度及两个热分解温度,说明其具有明显相分离。以嵌段共聚物为半导体活性材料,制备了场效应晶体管器件。使用热退火对器件进行热处理,发现迁移率随退火温度的上升而提高。器件在200℃退火温度下的平均迁移率为7.03×10~(-4)cm~2·V~(-1)·s~(-1),最大迁移率为1.3×10~(-3)cm~2·V~(-1)·s~(-1),阈值电压为5.44 V。     

氧化锌锡薄膜晶体管的研究

在ITO玻璃基底上用射频磁控溅射技术生长氧化锌锡(ZnSnO)沟道有源层、用PECVD生长SiO₂薄膜作为薄膜晶体管的栅绝缘层研制了薄膜晶体管(TFT), 器件的场效应迁移率最高达到μ_n=9.1 cm²/(V ·s),阈值电压-2 V,电流开关比为10⁴. 关键词： 氧化锌锡 薄膜晶体管 场效应迁移率     

基于聚噻吩/聚己内酯共混物的有机薄膜晶体管

选择聚3-己基噻吩(P3HT)/聚己内酯(PCL)双晶共混体系制备了不同配比的共混物有机薄膜晶体管。电学性能研究发现,随着共混物中P3HT含量降低,薄膜晶体管的场效应迁移率、开关电流比和阈值电压等性能缓慢降低。当P3HT质量分数为40%时,共混物薄膜仍具有较好的场效应性能,迁移率为0.008 cm²·V^-1·s^-1,开关电流比为5×10³,阈值电压为45.5 V。原子力显微镜测试结果表明:共混物成膜时发生明显的垂直相分离,在界面处形成连续的半导体层,有利于载流子传输。     

射频磁控溅射低温制备非晶铟镓锌氧薄膜晶体管

利用射频磁控溅射技术室温制备了铟镓锌氧(IGZO)薄膜,采用X射线衍射(XRD)表征薄膜的晶体结构,原子力显微镜(AFM)观察其表面形貌,分光光度计测量其透光率。结果表明:室温制备的IGZO薄膜为非晶态且薄膜表面均匀平整,可见光透射率大于80%。将室温制备的IGZO薄膜作为有源层,在低温(<200℃)条件下成功地制备了铟镓锌氧薄膜晶体管(a-IGZO TFT),获得的a-IGZO-TFT器件的场效应迁移率大于6.0 cm2.V-1.s-1,开关比约为107,阈值电压为1.2 V,亚阈值摆幅(S)约为0.9 V/dec,偏压应力测试a-IGZO TFT阈值电压随时间向右漂移。     

有机薄膜晶体管中接触效应的研究

研究了接触效应对有机薄膜晶体管性能的影响.首先在n型重掺杂Si片上制备了以M_OO₃修饰的Al电极为源漏电极的Pentacene基OTFTs(organic thin film transistors),器件场效应迁移率μ_ef达到0.42 cm²/V ·s,阈值电压V_T为-9.16 V,开关比4.7×10³.通过中间探针法,对器件电势分布做了定性判断 关键词： 有机薄膜晶体管 场效应迁移率 接触效应 电荷漂移     

最小二乘拟合计算有机薄膜晶体管迁移率的研究

本文通过制备了一个基于并五笨为有源层的顶栅底接触OTFT器件获取电流电压实验数据,并运用电流电压特性曲线理论拟合计算方法计算其场效应迁移率.研究发现,采用不同的拟合方法得到的场效应迁移率值有较大的差异.若选取转移特性曲线线性区距中心1/2范围内测试点进行最小二乘拟合计算出的场效应迁移率能减少采用其他拟合方法的固有不准确性,而且与其他方法得到的场效应迁移率最接近. 关键词： 最小二乘拟合 场效应迁移率 有机薄膜晶体管     

Effect of Dopant Properties on the Microstructures and Electrical Characteristics of Poly（3-Hexylthiophene） Thin Films

Effects of dopant properties on microstructures and the electrical characteristics of poly （3-hexylthiophene） （P3HT） films are studied by doping 0.1 wt% 2,3,5,6-tetrafluoro-7,7,8,8-tetracyanoquinodimethane （F4？TCNQ）, 6,6-phenyl-C61butyric acid methyl ester （PCBM） and N,N＇？Diphenyl-N,N＇-（m-tolyl）-benzidine （TPD） into P3HT, respectively. The introductions of various dopants in small quantities increase the field-effect mobility and the I on/Ioff ratio of P3HT thin-film transistors. However, each of dopants shows various effects on the crystalline order and the molecular orientation of P3HT films and the performance of P3HT thin-film transistors. These can be attributed to the various size, shape and energy-level properties of the dopants.     

室温下溅射法制备高迁移率氧化锌薄膜晶体管

为降低氧化锌薄膜晶体管(ZnO TFT)的工作电压,提高迁移率,采用磁控溅射法在氧化铟锡(ITO)导电玻璃基底上室温下依次沉积NbLaO栅介质层和ZnO半导体有源层,制备出ZnO TFT,对器件的电特性进行了表征。该ZnO TFT呈现出优异的器件性能:当栅电压为5 V、漏源电压为10 V时,器件的饱和漏电流高达2.2 m A;有效场效应饱和迁移率高达107 cm~2/(V·s),是目前所报道的室温下溅射法制备ZnO TFT的最高值,亚阈值摆幅为0.28 V/decade,开关电流比大于107。利用原子力显微镜(AFM)对NbLaO和ZnO薄膜的表面形貌进行了分析,分析了器件的低频噪声特性,对器件呈现高迁移率、低亚阈值摆幅以及迟滞现象的机理进行了讨论。     

低栅极电压控制下带有phenyltrimethoxysilane单分子自组装层的有机薄膜晶体管场效应特性研究

制作了底栅极顶接触有机薄膜晶体管器件,60 nm的pentacene被用作有源层,120 nm热生长的SiO₂作为栅极绝缘层.通过采用不同自组装修饰材料对器件的有源层与栅极绝缘层之间的界面进行修饰,如octadecyltrichlorosilane （OTS）,phenyltrimethoxysilane （PhTMS）,来比较界面修饰层对器件性能的影响.同时对带有PhTMS修饰层的OTFTs器件低栅极电压调制下的场效应行为及其载流子的传输机理进行研究.结果得到,当|V 关键词： 有机薄膜晶体管 自组装单分子层 场效应迁移率 低栅极调制电压     

Effects of concentration and annealing on the performance of regioregular poly（3-hexylthiophene） field-effect transistors

This paper investigates the effects of concentration on the crystalline structure, the morphology, and the charge carrier mobility of regioregular poly(3-hexylthiophene) (RR-P3HT) field-effect transistors (FETs). The RR-P3HT FETs with RR-P3HT as an active layer with different concentrations of RR-P3HT solution from 0.5~wt% to 2~wt% are prepared. The results indicate that the performance of RR-P3HT FETs improves drastically with the increase of RR-P3HT weight percentages in chloroform solution due to the formation of more microcrystalline lamellae and bigger nanoscale islands. It finds that the field-effect mobility of RR-P3HT FET with 2~wt% can reach 5.78× 10^-3~cm²/Vs which is higher by a factor of 13 than that with 0.5~wt%. Further, an appropriate thermal annealing is adopted to improve the performance of RR-P3HT FETs. The field-effect mobility of RR-P3HT FETs increases drastically to 0.09~cm²/Vs by thermal annealing at 150~℃, and the value of on/off current ratio can reach 10^4.     

Vacuum relaxation and annealing-induced enhancement of mobility of regioregular poly（3-hexylthiophene） field-effect transistors

In order to enhance the performance of regioregular poly(3-hexylthiophene) (RR-P3HT) field-effect transistors (FETs), RR-P3HT FETs are prepared by the spin-coating method followed by vacuum placement and annealing. This paper reports that the crystal structure, the molecule interconnection, the surface morphology, and the charge carrier mobility of RR-P3HT films are affected by vacuum relaxation and annealing. The results reveal that the field-effect mobility of RR-P3HT FETs can reach 4.17×10^ - 2~m²/(V.s) by vacuum relaxation at room temperature due to an enhanced local self-organization. Furthermore, it reports that an appropriate annealing temperature can facilitate the crystal structure, the orientation and the interconnection of polymer molecules. These results show that the field-effect mobility of device annealed at 150~℃ for 10 minutes in vacuum at atmosphere and followed by placement for 20 hours in vacuum at room temperature is enhanced dramatically to 9.00×10^ - 2 ~cm²/(V.s).     

非溶剂掺杂完善自组织机理提升高度区域规则的(3-己基噻吩)有机场效应晶体管器件性能的研究

为了保证在低温加工及溶液制备的情况下,能够提升高度区域规则的聚(3-己基噻吩) (RR-P3HT)有机场效应晶体管(OFET)的器件性能,本文研究了室温下乙醇及乙腈非溶剂的掺杂,及其对高分子自组织机理与导致的RR-P3HT OFET电学性能的影响.实验发现,适量进行乙醇及乙腈非溶剂的掺杂,将促进RR-P3HT薄膜形成更多期望的微晶粒薄片结构,完善高分子自组织机理,导致RR-P3HT OFET电学性能的提升.实验表明,在RR-P3HT溶液中进行5 %乙腈添加后,其器件场效应迁移率的值由原来的4.04×10< 关键词： 高度区域规则的聚(3-己基噻吩)有机场效应晶体管 非溶剂掺杂 自组织机理 场效应迁移率     

High-photosensitivity polymer thin-film transistors based on poly（3-hexylthiophene）

Polymer thin-film transistors(PTFTs) based on poly(3-hexylthiophene) are fabricated by the spin-coating process,and their photo-sensing characteristics are investigated under steady-state visible-light illumination.The photosensitivity of the device is strongly modulated by gate voltage under various illuminations.When the device is in the subthreshold operating mode,a significant increase in its drain current is observed with a maximum photosensitivity of 1.7×10 3 at an illumination intensity of 1200 lx,and even with a relatively high photosensitivity of 611 at a low illumination intensity of 100 lx.However,when the device is in the on-state operating mode,the photosensitivity is very low:only 1.88 at an illumination intensity of 1200 lx for a gate voltage of-20 V and a drain voltage of -20 V.The results indicate that the devices could be used as photo-detectors or sensors in the range of visible light.The modulation mechanism of the photosensitivity in the PTFT is discussed in detail.     

Charge transport in monolayer poly（3-hexylthiophene） thin-film transistors

It is found that ultrathin poly（3-hexylthiophene） （P3HT） film with a 2.5 nm-thick layer exhibits a higher mobility of 5.0× 10-2 cm2/V-s than its bulk counterpart. The crystalline structure of the as-fabricated ultrathin P3HT layer is verified by atomic force microscopy as well as grazing incidence X-ray diffraction. Transient measurements of the as-fabricated transistors reveal the influence of the interface traps on charge transport. These results are explained by the trap energy level distribution at the interface manipulated by layers of polymer film.     

Magnetic properties of poly(3-hexylthiophene)

A room temperature ferromagnetic phase is observed in samples of poly(3-hexylthiophene) partially doped with ClO₄⁻. The magnetic behavior presents a strong dependence on the sample preparation conditions, in particular, a dependence with the final potential of the sample after reduction. The origin of the ferromagnetism is proposed to be associated with interactions between spin 1/2 polarons formed in the polymeric chain upon doping. The dependence of saturation and spontaneous magnetization as the function of the final potential after reduction shows a way to control the magnetic properties of this polymer.     

高分子有机场效应晶体管中半导体薄膜结晶行为及微观结构变化的研究

为了探索高分子有机场效应晶体管(OFET)中高分子自组织机理与电荷传输的关联性,采用同步辐射掠入射X射线衍射技术研究了高分子OFET中以高度区域规则的聚(3-己基噻吩)(RR-P3HT)为代表的半导体层的结晶行为及微观结构组织变化,及其引起的高分子半导体电荷传输机理.研究发现,采用自组装单分子层(SAMs)技术进行界面修饰,可以完善绝缘层与RR-P3HT半导体层之间的界面效果.SAMs的形成改善了界面,可以有效地控制上层RR-P3HT半导体层的结晶性及微观结构,使较多的噻吩环面垂直于衬底、得到π-π堆积方向平行于衬底的二维微晶粒薄片结构,这种微观结构有效地形成了二维共轭电荷传输通道,完善了在RR-P3HT工作层生长过程中的自组织机理;并且对于RR-P3HT半导体工作层来说,慢速生长过程比快速生长过程更有利于有效的二维共轭微晶粒薄片生长,更能完善RR-P3HT工作层生长过程中的自组织机理. 关键词： 高度区域规则的聚(3-己基噻吩)有机场效应晶体管 同步辐射掠入射X射线衍射 自组织机理 微观结构     

基于氧化铟锡的无结低电压薄膜晶体管

在室温下制备了基于氧化铟锡(ITO)的底栅结构无结薄膜晶体管. 源漏电极和沟道层都是同样的ITO薄膜材料,没有形成传统的源极结和漏极结, 因而极大的简化了制备流程,降低了工艺成本.使用具有大电容的双电荷层SiO₂作为栅介质, 发现当ITO沟道层的厚度降到约20 nm时, 器件的栅极电压可以很好的调控源漏电流. 这些无结薄膜晶体管具有良好的器件性能: 低工作电压(1.5 V), 小亚阈值摆幅(0.13 V/dec)、 高迁移率(21.56 cm²/V·s)和大开关电流比(1.3× 10⁶). 这些器件即使直接在大气环境中放置4个月, 器件性能也没有明显恶化:亚阈值摆幅保持为0.13 V/dec,迁移率略微下降至18.99 cm²/V·s,开关电流比依然大于10⁶.这种工作电压低、工艺简单、 性能稳定的无结低电压薄膜晶体管非常有希望应用于低能耗便携式电子产品以及新型传感器领域.