Numerical study of strained InGaAs quantum well lasers emitting at 2.33 μm using the eight-band model

We investigate the band structure of a compressively strained In(Ga)As/In 0.53 Ga 0.47 As quantum well (QW) on an InP substrate using the eight-band k · p theory.Aiming at the emission wavelength around 2.33 μm,we discuss the influences of temperature,strain and well width on the band structure and on the emission wavelength of the QW.The wavelength increases with the increase of temperature,strain and well width.Furthermore,we design an InAs /In 0.53 Ga 0.47 As QW with a well width of 4.1 nm emitting at 2.33 μm by optimizing the strain and the well width.     

InAs nanostructures on InP (001) substrate with the insertion of a superthin AlAs layer

An AlAs layer of two or three monolayers was inserted beneath the strained InAs layer in the fabrication of InAs nanostructure on the In_0.53Ga_0.47As and In_0.52Al_0.48As buffer layer lattice-matched to InP(001) substrate using molecular beam epitaxy. The effects of AlAs insertion on the InAs nanostructures were investigated and discussed.      

InP-based InGaAs/InAlGaAs digital alloy quantum well laser structure at 2 μm

The structural and optical characteristics of InP-based compressively strained InGaAs quantum wells have been significantly improved by using gas source molecular beam epitaxy grown InAs/In 0.53 Ga 0.47 As digital alloy triangular well layers and tensile In 0.53 Ga 0.47 As/InAlGaAs digital alloy barrier layers.The x-ray diffraction and transmission electron microscope characterisations indicate that the digital alloy structures present favourable lattice quality.Photoluminescence (PL) and electroluminescence (EL) measurements show that the use of digital alloy barriers offers better optical characteristics than that of conventional random alloy barriers.A significantly improved PL signal of around 2.1 μm at 300 K and an EL signal of around 1.95 μm at 100 K have been obtained.     

Particular nanowire superlattice as a spin filter

A nanowire superlattice of InAs and GaAs layers with In_0.47Ga_0.53As as the impure layers is proposed. The oft-neglected k³ Dresselhaus spin-orbit coupling causes the spin polarization of the electron but often can produce a limited spin polarization. In this nanowire superlattice, Dresselhaus term produce complete spin filtering by optimizing the distance between the In_0.47Ga_0.53As layers and the Indium (In) in the impure layers. The proposed structure is an optimized nanowire superlattice that can efficiently filter any component of electron spins according to its energy. In fact, this nanowire superlattice is an energy dependent spin filter structure.     

Raman studies of InAs/In0.53Ga0.47As single quantum wells grown on InP substrate by M.B.E.

We analyzed using the Raman technique a series of single quantum wells of InAs/In _0.53Ga_0.47As at different thicknesses of InAs layer grown on a (100) InP substrate by MBE. These high lattice mismatch systems are particularly interesting for potential applications in the mid-IR wavelength range. The well thickness was between 6 and 12 monolayers. The In _0.53 Ga_0.47As grown on an InAs layer is subject to a tensile biaxial strain and the InAs to a compressive one. In the Raman spectra we observed an intense narrow line corresponding to the LO phonon of the InAs layer between a GaAs-like LO mode and a smaller InAs-like LO phonon typical of In_0.53Ga_0.47As. With the increase of the well thickness the experimental energy shift of the LO phonon of the InAs layer decreases, indicating a smaller strain, whereas the GaAs-like LO phonon of the alloy remains constant and the intensity ratio of these two modes becames smaller. The dominant and sharp features of the InAs LO and GaAs-like LO characterize the good quality of our structures. With the increase of the InAs layer thickness we also observed the appearance and the intensity rise of a weak peak around the frequency of the InAs TO mode. This peak could be associated with the TO mode that is forbidden in our scattering geometry. We believe that this is indicative of a slight deterioration of the structural perfection of the sample with the increase of the well thickness. To our knowledge, this is the first study of vibrational properties of InAs/In _0.53 Ga_0.47As single quantum wells grown on InP substrates.     

Electron g-factor in a gated InAs-inserted-channel In0.53Ga0.47As/In0.52Al0.48As heterostructure

We report on electron g-factor in an InAs-inserted In_0.53Ga_0.47As/In_0.52Al_0.48As heterostructure. The gate voltage dependence of g-factor is obtained from the coincidence method. The obtained g-factor values are surprisingly smaller than the g-factor value of bulk InAs, and it is close to the bare g-factor value of In_0.53Ga_0.47As. The large change in g-factor is observed by applying the gate voltage. The obtained gate voltage dependence is not simply explained by the energy dependence of g-factor.     

Dependence of current-voltage characteristics of pseudomorphic AlAs/In0.53a0.47s/InAs resonant tunneling diodes on quantum well widths

This paper studies the dependence of I-V characteristics on quantum well widths in AlAs/In_0.53Ga_0.47As and AlAs/In_0.53Ga_0.47As/InAs resonant tunneling structures grown on InP substrates. It shows that the peak and the valley current density in the negative differential resistance region are closely related with quantum well width. The measured peak current density, valley current densities and peak-to-valley current ratio of resonant tunneling diodes are continually decreasing with increasing well width.     

Influence of stoichiometry on the luminescent properties of InAs quantum dots grown on a heterostructure

We report photoluminescence (PL) spectra of InP/In_xGa_1-xAs/InAs/InP dot-in-a-well structures grown by MOVPE, with different compositions of the ternary layer. Measurements with atomic force microscopy showed that the largest quantum dot (QD) height is obtained when the InAs QDs are grown on the In_xGa_1-xAs layer with a mismatch of 1000 ppm, and the height decreases as the mismatch departs from this value. PL spectra of the QDs showed an asymmetric band, which involves transitions between dot energy levels and can be deconvoluted into two peaks. The highest energy PL peak of this band was observed for the sample with the QDs grown on top of the lattice-matched In_xGa_1-xAs layer and it shifted to lower energies for strained samples as the degree of mismatch increased. Theoretical calculations of the energy levels of the entire structure were used to interpret the obtained PL spectra and determine the possible detection tunability range.     

Structural and electronic properties of group III Rich In0.53Ga0.47As(001)

The structural and electronic properties of group III rich In_0.53Ga_0.47As(001) have been studied using scanning tunneling microscopy/spectroscopy (STM/STS). At room temperature (300 K), STM images show that the In_0.53Ga_0.47As(001)–(4 × 2) reconstruction is comprised of undimerized In/Ga atoms in the top layer. Quantitative comparison of the In_0.53Ga_0.47As(001)–(4 × 2) and InAs(001)–(4 × 2) shows the reconstructions are almost identical, but In_0.53Ga_0.47As(001)–(4 × 2) has at least a 4× higher surface defect density even on the best samples. At low temperature (77 K), STM images show that the most probable In_0.53Ga_0.47As(001) reconstruction is comprised of one In/Ga dimer and two undimerized In/Ga atoms in the top layer in a double (4 × 2) unit cell. Density functional theory (DFT) simulations at elevated temperature are consistent with the experimentally observed 300 K structure being a thermal superposition of three structures. DFT molecular dynamics (MD) show the row dimer formation and breaking is facilitated by the very large motions of tricoodinated row edge As atoms and z motion of In/Ga row atoms induced changes in As–In/Ga–As bond angles at elevated temperature. STS results show there is a surface dipole or the pinning states near the valence band (VB) for 300 K In_0.53Ga_0.47As(001)–(4 × 2) surface consistent with DFT calculations. DFT calculations of the band-decomposed charge density indicate that the strained unbuckled trough dimers being responsible for the surface pinning.     

Manganese-related luminescence in GaInAs/AlInAs multiple quantum wells grown on InP by molecular beam epitaxy

Two Mn-related luminescence peaks have been observed in a series of nominally undoped Ga_0.47In_0.53As/Al_0.48In_0.52As multiple quantum wells (MQW) grown lattice-matched on InP substrates by molecular beam epitaxy. These two peaks correspond to on-center and on-edge impurity states, respectively. The origin of the Mn impurities is outdiffusion from the Fe-doped semiinsulating InP substrate into the epitaxial layer. The binding energy of Mn acceptors, determined to be 53±3 meV in bulk-like Ga_0.47In_0.53As, increases to 80±5 meV for the on-center Mn state in a 58 Å MQW. The strong well-width dependence of the binding energy is explained in terms of the unique behavior of the Mn impurity in III–V semiconductors. The Mn in Ga_0.47In_0.53As and Ga_0.47In_0.53As/Al_0.48In_0.52As MQWs behaves predominantly as a deep impurity.On leave from: A. F. Ioffe Physicotechnical Institute, Leningrad, USSR     

XPS data for sputter-cleaned In0.53Ga0.47As,GaAs, and InAs surfaces

Core level binding energies and Auger parameters were determined for In, Ga, and As in the three compounds In_0.53Ga_0.47As, GaAs, and InAs. The surfaces were cleaned by 1.5 keV Ar ion bombardment. Under this condition the radiation-induced defects are small. In the case of GaAs the Ga and As3d levels become comparable with available data for chemically cleaned surfaces. The high Ga deficiency of chemically cleaned In_0.53Ga_0.47As surfaces could not be observed. Sputter cleaned surfaces seem to be closer to the bulk composition.     

Experimental confirmation by galvanomagnetic methods of a complex transport model in In0.53Ga0.47As layers deposited by MBE on SI-InP

At low temperatures In_0.53Ga_0.47As samples show an increase of carrier concentration, which can be explained in terms of a two carriers transport model. This type of problem exists since the beginning of the semiconductor era, dating back to monocrystalline germanium.We propose that in all the investigated layers, there are X atoms or charged dislocations in the region of the first monolayers, which are built in during epitaxial growth. The layers were intentionally undoped. They form an impurity band in which low mobility carriers dominate over the localised electron scattering due to the s-d exchange interaction. These carriers do not freeze out at liquid helium temperature and give rise to two transport media for electrons; a conduction band at higher temperatures and an impurity band at lower temperatures. The electron which fall down onto the previously ionised X atoms, then move by thermally activated hopping. We show that the two carriers model for In_0.53Ga_0.47As epitaxial layers are confirmed by the carrier concentration-temperature, carrier concentration-magnetic field, resistivity-magnetic field behaviour, and also by YKA theory also. The differences between the two transport models are so distinctive that observed phenomena may exist. This paper presents experimental results, which constitute comprehensive evidence for the complicated structure of the semiconductor epitaxial layers on the sample of n-type In_0.53Ga_0.47As/InP layer with n=2.2×10¹⁵/cm³.     

Recombination in tensile-strained In0.3Ga0.7As quantum well on InP

Photoluminescence (PL) measurements under different excitation powers were carried out at low temperature on tensile-strained In_0.3Ga_0.7As single wells of 6 nm with InGaAs barriers lattice matched to InP substrate. PL measurements taken at 2 K show a main emission band at 0.762 eV probably originating from a type-II transition. The insertion of an ultrathin InAs layer at In_0.3Ga_0.7As on In_0.53Ga_0.47As interface reveals an additional feature at 0.711 eV as well as an excited-state luminescence emission at high pump powers. The InAs insertion improves heterointerface quality, which was confirmed by an increase in PL intensity.     

Electromodulation spectroscopy of In0.53Ga0.47As/In0.53Ga0.23Al0.24As quantum wells

In_0.53Ga_0.47As/In_0.53Ga_0.23Al_0.24As quantum wells (QWs) of various widths have been grown by molecular beam epitaxy on the InP substrate and investigated by electromodulation spectroscopy, i.e. photoreflectance (PR) and contactless electroreflectance (CER). The optical transitions related to the QW barrier and the QW ground and excited states have been clearly observed in PR and CER spectra. The experimental QW transition energies have been compared with theoretical predictions based on an effective mass formalism model. A good agreement between experimental data and theoretical calculations has been observed when the conduction band offset for the In_0.53Ga_0.47As/In_0.53Ga_0.23Al_0.24As interface equals 60%. In addition, it has been concluded that the conduction band offset for the In_0.53Ga_0.23Al_0.24As/InP interface is close to zero. The obtained results show that InGa(Al)As alloys are very promising materials in the band gap engineering for structures grown on InP substrate.     

Ion-irradiated In0.53Ga0.47As photoconductive antennas for THz generation and detection at 1.55 μm wavelength

We present a detailed study of the photoconductive antennas made from heavy-ion-irradiated In_0.53Ga_0.47As material. The optical and transport properties of ion-irradiated In_0.53Ga_0.47As material are characterized. The terahertz waveforms emitted and detected by ion-irradiated In_0.53Ga_0.47As photoconductive antennas excited by 1.55 μm wavelength femtosecond laser pulses are reported and the effect of the carrier lifetime on the terahertz signal characteristics emitted by such devices is analysed. The performances of ion-irradiated In_0.53Ga_0.47As photoconductive antennas excited by 1.55 μm and also by 0.8 μm wavelength femtosecond laser pulses are compared to those of similar low-temperature-grown GaAs photoconductive antennas. To cite this article: J. Mangeney, P. Crozat, C. R. Physique 9 (2008).     

Strain accumulation in InAs/In<Subscript><Emphasis Type="Italic">x</Emphasis></Subscript>Ga<Subscript>1−<Emphasis Type="Italic">x</Emphasis></Subscript>As quantum dots

The effect of strain accumulation in the InAs/In _x Ga_1−x As quantum dots (QDs) system was studied in this work. We found strain in the In _x Ga_1−x As layer with accumulation in the QD layer. This effect resulted in a dramatic reduction of growth-mode transition thickness of the QD layer. For InAs/In_0.25Ga_0.75As QDs, critical thickness is measured to be as low as 1.08 ML. The experimental results in this work highlight the importance of strain accumulation in the design and fabrication of QD-based devices with metamorphic buffer layer involved.     

Photoluminescence of InGaAs/GaAs strained-layer quantum well structures under high pressure

Abstract

Measurements of the photoluminescence (PL) of strained In_0.2Ga_0.8As/GaAs and In_0.15Ga_0.85As/GaAs quantum well structures together with the PL from bulk GaAs, in a diamond anvil cell show that the pressure coefficient of the ground confined state in the wells depends upon well width (L_Z). In the thinnest wells, the coefficient is closer to that of the bulk GaAs (10.7 meV/kbar), as expected. However, in the widest wells the coefficients tend to values (9.5meV/kbar for the 15% alloy and 9.1meV/kbar for the 20% alloy) that are significantly lower than the pressure coefficient of unstrained In_0.53Ga_0.47As (10.9meV/kbar). It is found that the low pressure coefficients can not be explained by the change in uniaxial stress with pressure due to a difference in bulk moduli between the barrier and well.     

InAs/AlAs quantum dots with InGaAs insertion layer: dependence of the indium composition and the thickness

We have systematically studied the effect of an In_xGa_1−xAs insertion layer (IL) on the optical and structural properties of InAs quantum dot (QD) structures. A high density of 9.6×10¹⁰ cm⁻² of InAs QDs with an In_0.3Ga_0.7As IL has been achieved on a GaAs (1 0 0) substrate by metal organic chemical vapor deposition. A photoluminescence line width of 25 meV from these QDs has been obtained. We attribute the high density and high uniformity of these QDs to the use of the IL. Our results show that the InGaAs IL is useful for obtaining high-quality InAs QD structures for devices with a 1.3 μm operation.     

The emission wavelength tuning of InAs/InP quantum dots with thin GaAs, InGaAs, InP capping layers by MOCVD

InAs quantum dots (QDs) were grown on InP substrates by metalorganic chemical vapor deposition. The width and height of the dots were 50 and 5.8 nm, respectively on the average and an areal density of 3.0×10¹⁰ cm⁻² was observed by atomic force microscopy before the capping process. The influences of GaAs, In_0.53Ga_0.47As, and InP capping layers (5–10 ML thickness) on the InAs/InP QDs were studied. Insertion of a thin GaAs capping layer on the QDs led to a blue shift of up to 146 meV of the photoluminescence (PL) peak and an InGaAs capping layer on the QDs led to a red shift of 64 meV relative to the case when a conventional InP capping layer was used. We were able to tune the emission wavelength of the InAs QDs from 1.43 to 1.89 μm by using the GaAs and InGaAs capping layers. In addition, the full-width at half-maximum of the PL peak decreased from 79 to 26 meV by inserting a 7.5 ML GaAs layer. It is believed that this technique is useful in tailoring the optical properties of the InAs QDs at mid-infrared regime.     

Type-I and type-II Wannier-Stark effect in InGaAs/InGaAs superlattices

The formation of minibands is demonstrated in photocurrent experiments on shallow In_0.53Ga_0.47As/In_0.40Ga_0.60 As superlattices grown by low-pressure metal-organic vapor-phase epitaxy. Field-dependent variations of the spectral shape are attributed to Wanner-Stark localization. Both type-I transitions between electrons and heavy holes and type-II transitions involving light holes confined in the In_0.40Ga_0.60 As layers are observed and distinguished by their characteristic field dependence.