Non-equilibrium plasma production by pulsed laser ablation of gold

A gold target has been irradiated with a Q-switched Nd:Yag laser having 1064\,\hbox{nm} wavelength, 9\,\hbox{ns} pulse width, 900\,\hbox{mJ} maximum pulse energy and a maximum power density of the order of 10^{10}\,\hbox{W}/\hbox{cm}^2 . The laser-target interaction produces a strong gold etching with a production of a plasma in front of the target. The plasma contains neutrals and ions having high charge state. Time-of-flight measurements are presented for the analysis of the ion production and ion velocity. A cylindrical electrostatic deflection ion analyzer permits to measure the yield of the emitted ions, their charge state and their ion energy distribution. Measurements indicate that the ion charge state reaches 6^+ and 10^+ at a laser fluence of 100\,\rm{J/cm}^2 and 160\,\rm{J/cm}^2 , respectively. The maximum ion energy reaches about 2\,\hbox{keV} and 8\,\hbox{keV} at these low and at high laser fluence, respectively. Experimental ion energy distributions are given as a function of the ion charge state. Obtained results indicate that electrical fields, produced in the plume, along the normal to the plane of the target surface, exist in the unstable plasma. The electrical fields induce ion acceleration away from the target with a final velocity dependent on the ion charge state. The ion velocity distributions follow a "shifted Maxwellian distribution", which the authors have corrected for the Coulomb interactions occurring inside the plasma.     

Plasma-immersion ion implantation of the interior surface of asmall cylindrical bore using an auxiliary electrode for finite rise-timevoltage pulses

Plasma-immersion ion implantation (PIII) can be used to process the interior surfaces of odd-shape specimens such as a cylindrical bore. The temporal evolution of the plasma sheath in a small cylindrical bore in the presence of a grounded coaxial auxiliary electrode is derived for voltage pulses of different rise times by solving Poisson's equation and the equations of ion continuity, and motion numerically using the appropriate boundary conditions. It is found that the maximum ion impact energy and the average impact energy are improved for finite rise-time voltage pulses, and shorter rise times yield better results. Our results allow the selection of a suitable auxiliary electrode radius to improve the average impact energy for a given rise time     

Tungsten ions produced by infrared pulsed laser irradiation

Energetic ions have been obtained irradiating a tungsten target with a Q-switched Nd:Yag laser, 1064?nm wavelength, 9?ns pulse width, 900?mJ maximum pulse energy and power density of the order of 10¹⁰?W/cm². The laser-target interaction induces a strong metal etching with production of plasma in front of the target. The plasma contains neutrals and ions with high charge state. Time-of-flight measurements are presented for qualitative analysis of the ion production. A cylindrical electrostatic ion analyzer permits measuring of the yield of emitted ions, the charge state of detected ions and the ion energy distribution. Measurements indicate that, at a laser fluence of the order of 100?J/cm², the charge state may reach 9+ and the ion energy reaches about 5?keV. The ion energy distribution is given as a function of the charge state. Experimental results indicate that an electrical field is developed along the normal to the plane of the target surface, which accelerates the ions up to high velocity. The ion velocity distributions follow a “shifted Maxwellian distribution”, which the author has corrected for the Coulomb interactions occurring inside the plasma.     

半圆形容器等离子体源离子注入过程中离子动力学的两维PIC计算机模拟

利用两维particle-in-cell方法研究了半圆形容器表面等离子体源离子注入过程中鞘层的时空演化规律. 详尽考察了鞘层内随时间变化的电势分布和离子密度分布规律,离子在鞘层中的运动轨迹和运动状态,得到了半圆容器内、外表面和边缘平面上各点离子注入剂量分布规律,获得了工件表面各点注入离子的入射角分布规律. 研究结果揭示了半圆容器边缘附近鞘层中离子聚焦现象,以及离子聚焦现象导致工件表面注入剂量分布和注入角度分布存在很大不均匀的基本物理规律. 关键词： 等离子体源离子注入 鞘层 两维particle-in-cell方法 离子运动轨迹     

脉冲偏压上升沿特性对等离子体浸没离子注入鞘层扩展动力学的影响

等离子体浸没离子注入(PIII)是用于材料表面改性的一种廉价高效、非视线的技术.采用等离子体粒子模型，通过假设电子密度服从Boltzmann分布，求解Poisson方程和Newton方程，跟踪离子在等离子体鞘层中的运动形态及特性并进行统计分析，研究了不同上升速率和形状的6种波形上升沿对鞘层时空演化、离子注入能量和剂量的影响.结果表明，在PIII过程中，脉冲上升沿影响了等离子体鞘层的扩展，且不同波形诱导的鞘层厚度间存在最大差值.电场强度在鞘层的外边缘区域存在陡降区，离子的运动为非匀加速过程.可以通过调整脉冲 关键词： 等离子体浸没离子注入 鞘层 粒子模型 上升沿     

聚合物物理属性对离子注入效应的影响

聚合物导电性能差, 表面电荷积聚所产生的电容效应致使其表面电位衰减, 采用等离子体浸没离子注入对其表面改性是非常困难的. 建立了绝缘材料等离子体浸没离子注入过程的粒子模拟(PIC)模型, 实时跟踪离子在等离子体鞘层中的运动形态及特性并进行统计分析. 并基于PIC模型, 将聚合物表面的二次电子发射系数直接与离子注入即时能量建立关联, 研究了聚合物厚度、介电常数和二次电子发射系数等物理量对鞘层演化、离子注入能量和剂量的影响规律. 研究结果表明: 当聚合物厚度小于200 μ m, 相对介电常数大于7, 二次电子发射系数小于0.5时, 离子注入剂量和高能离子所占的份额与导体离子注入情况相当. 通过对聚合物表面离子注入剂量和高能离子所占份额的研究, 为绝缘材料和半导体材料表面等离子体浸没离子注入的实现提供了理论和实验依据.     

空心圆管端点附近等离子体源离子注入过程中鞘层的时空演化

等离子体源离子注入过程中，鞘层的演化规律直接影响到离子注入到材料中的深度进而影响材料表面的性质和结构，对材料的不同部位这种影响是不同的.利用无碰撞两维流体动力学模型，研究了有限上升时间的电压脉冲作用下，共轴放置附加零电极的半无限空心圆管端点附近等离子体源离子注入过程中，鞘层的时空演化规律.通过计算得到了鞘层内随时间变化的电势分布和离子密度分布，计算了端点附近材料表面处的离子流密度分布和注入剂量分布随时间的变化规律.计算机模拟结果显示了空心圆管内部、外部及端点表面处的离子流密度分布和注入剂量分布存在很大差异.     

有限尺寸方靶等离子体离子注入动力学的三维粒子模拟研究

采用三维粒子模拟模型研究了有限尺寸方靶等离子体浸没离子注入过程中的鞘层动力学行为,得到了鞘层尺寸和方靶表面的注入剂量、注入能量以及注入角度等信息,并与二维无限长方靶注入结果进行了对比.模拟结果表明,与无限长方靶不同,有限尺寸方靶周围鞘层很快扩展为球形,但鞘层厚度明显减小.在模拟的50ω^-1_pi时间尺度内靶表面注入剂量很不均匀,中心区域注入剂量最小,四个边角附近位置注入剂量最大.这种剂量不均匀性是由于鞘层扩展为球形,使得鞘层内离子被聚焦并注入到边角附 关键词： 等离子体浸没离子注入 数值模拟 三维粒子模拟 有限尺寸方靶     

实验室光致电离等离子体中激发过程的研究

光致电离等离子体在宇宙中广泛存在于强辐射场附近. 近年来随着高能量密度实验装置的发展, 在实验室内也能构造出光致电离等离子体. RCF是一个基于The Flexible Atomic Code 数据的针对光致电离等离子体的辐射碰撞模型, 该模型模拟了两个光致电离实验, 其 理论结果中电离态分布和光谱与测量值符合得很好. 在理论模拟中发现, 光致电离等离子体中光致激发和碰撞激发过程对离子态布居和发射光谱都有非常重要的影响. 光致激发过程可以通过将离子激发到双激发态从而间接电离离子; 碰撞激发过程会因为电子将基态离子激发到电离截面小的单激发态而抑制光子对等离子体的电离. 光致激发过程可以加强类锂离子的类氦离子的卫线, 而碰撞激发过程会影响类氦离子谱线的线强之比.     

Two-dimensional particle-in-cell plasma source ion implantation of a prolate spheroid target

A two-dimensional particle-in-cell simulation is used to study the time-dependent evolution of the sheath surrounding a prolate spheroid target during a high voltage pulse in plasma source ion implantation. Our study shows that the potential contour lines pack more closely in the plasma sheath near the vertex of the major axis, i.e. where a thinner sheath is formed, and a non-uniform total ion dose distribution is incident along the surface of the prolate spheroid target due to the focusing of ions by the potential structure. Ion focusing takes place not only at the vertex of the major axis, where dense potential contour lines exist, but also at the vertex of the minor axis, where sparse contour lines exist. This results in two peaks of the received ion dose, locating at the vertices of the major and minor axes of the prolate spheroid target, and an ion dose valley, staying always between the vertices, rather than at the vertex of the minor axis.     

Low-Pressure Barrier Discharge Spectroscopy. Afterglow with Ne $$_{2}^{ + }$$ , Ne+, and Ne2+ Ions

Optics and Spectroscopy - The radiation of decaying plasma formed by electron–ion recombination processes involving three neon ions: the molecular ion Ne $$_{2}^{ + }$$ and the atomic ions...     

Fluid simulation of the pulsed bias effect on inductively coupled nitrogen discharges for low-voltage plasma immersion ion implantation

Planar radio frequency inductively coupled plasmas(ICP) are employed for low-voltage ion implantation processes,with capacitive pulse biasing of the substrate for modulation of the ion energy. In this work, a two-dimensional(2D) selfconsistent fluid model has been employed to investigate the influence of the pulsed bias power on the nitrogen plasmas for various bias voltages and pulse frequencies. The results indicate that the plasma density as well as the inductive power density increase significantly when the bias voltage varies from 0 V to-4000 V, due to the heating of the capacitive field caused by the bias power. The N+fraction increases rapidly to a maximum at the beginning of the power-on time, and then it decreases and reaches the steady state at the end of the glow period. Moreover, it increases with the bias voltage during the power-on time, whereas the N_2~+ fraction exhibits a reverse behavior. When the pulse frequency increases to 25 kHz and40 kHz, the plasma steady state cannot be obtained, and a rapid decrease of the ion density at the substrate surface at the beginning of the glow period is observed.     

高电荷态离子入射Al表面库仑势对靶原子特征谱线强度的影响

用同一动能(150keV)而不同电荷态的⁴⁰Ar^q+(8≤q≤16)离子入射金属Al表面,靶原子受激辐射产生特征光谱线. 实验结果表明：高电荷态离子与金属表面相互作用过程中,经过与靶原子碰撞(Penning碰撞)交换动能和共振电子俘获(resonant capture)释放库仑势能,将携带的能量沉积于靶表面,使靶原子激发. 这种激发不同于光激发,它不仅激发了原子复杂电子组态之间的跃迁,而且跃迁辐射的特征谱线强度增强的趋势与入射粒子的库 关键词： 高电荷态离子 库仑势 特征光谱 光谱强度     

等离子体源离子注入过程中半圆形碗状样品的两维温度分布

等离子体源离子注入过程(PSII)中样品温度是一个非常重要的参量。由于注入到样品上的能量很大，导致样品温度很高，所以在实验中获知样品的温度分布有着很重要的意义。本文利用热传导方程建立了半圆形碗状样品内部温度升高模型，研究样品内温度演化过程。以注入离子束流作为能量输入项，热辐射为能量损失项，并考虑了热辐射过程中样品的形状因子的影响。考察了离子注入过程中样品上所施加负偏压的脉冲宽度和频率对样品温度分布的影响。研究结果显示，脉冲频率达到一定值后，样品温度不再随频率增加而升高。     

Formation of excited states of atoms and ions in laser plasma from CuInS2

Emission spectra and the energy distribution of the excited-state population density of atoms and ions in erosion laser plasma from CuInS₂ with various crystal-structure orderings are analyzed. It is shown that increased ordering of the target crystal structure causes the excited-state energies of indium atoms generated in the laser erosion plume to increase and that sulfur atoms always emit only in transitions from highly excited states. The ratio of relative ion concentrations in the laser plasma plume is Cu⁺/In⁺/S⁺ = 0.3/0.08/2, which corresponds neither to the atomic ratio of Cu/In/S (1/1/2) in the target nor to the ratio of ionization energies. The results are explained by recombination processes for ions and by the atomization specifics of the CuInS₂ target exposed to long-wavelength radiation. The atomization consists essentially of dissociative processes expressed by CuInS₂ → CuInS + S and CuInS₂ → Cu + InS + S. The electron temperature of polycrystal (single-crystal) plasma at a distance of 1 mm from the target is 0.3 eV (0.4 eV) for atoms and 1.3 eV (2.7 eV) for ions and varies negligibly for plasma up to a distance of 7 mm from the target. __________ Translated from Zhurnal Prikladnoi Spektroskopii, Vol. 75, No. 2, pp. 217–223, March–April, 2008.     

Nonresonance Compton scattering of an X-ray photon by a Ni-like atomic ion

The absolute values and the shape of the double differential cross section for nonresonance Compton scattering of an X-ray photon by an atomic ion with d symmetry in the core are studied theoretically beyond the impulse approximation for the example of the Ni-like atomic ions Zn²⁺, Kr⁸⁺, and Mo¹⁴⁺. It is established that, as the nuclear charge of an ion increases, (a) in all the scattering channels, the leading harmonics of transition to states of the continuous spectrum are concentrated and (b) the integral intensities of nonresonance Compton scattering are increasingly redistributed to the energy region of resonance Lands-berg-Mandelstam-Raman scattering between the threshold of termination of the Compton profile and the line of elastic (Thomson and Rayleigh) scattering. The calculated results are predictive in character.     

Laser-generated ns plasma pulses characterized using SiC Schottky diode

The nonequilibrium plasma generated by nanosecond laser pulse is characterized using a SiC detector connected in time-of-flight configuration to measure the radiations emitted from the plasma. Different metallic targets were irradiated by the pulsed laser at an intensity of 10¹⁰ W/cm² and 200 mJ pulse energy. The SiC allows detecting ultraviolet radiations and soft X-rays, electrons, and ions. The obtained plasma has a temperature of the order of tens to hundreds eV depending on the atomic number of the irradiated target and ion accelerations of the order of 100 eV per charge state.     

Collimated multi-MeV ion beams from high-intensity laser interactions with underdense plasma

A beam of multi-MeV helium ions has been observed from the interaction of a short-pulse high-intensity laser pulse with underdense helium plasma. The ion beam was found to have a maximum energy for He2+ of (40(+3)(-8)) MeV and was directional along the laser propagation path, with the highest energy ions being collimated to a cone of less than 10 degrees. 2D particle-in-cell simulations show that the ions are accelerated by a sheath electric field that is produced at the back of the gas target. This electric field is generated by transfer of laser energy to a hot electron beam, which exits the target generating large space-charge fields normal to its boundary.     

A numerical model for lithium plasma process in a hybrid microwave ion source

Lithium ions are widely used in many scientific fields; in order to get these ions, it is necessary to study lithium plasma process thoroughly. Recently, a hybrid ⁷Li³⁺ ion source has been designed and tested at Peking University (PKU). To understand the lithium plasma behaviour inside the plasma chamber and to provide some guidelines for ion source optimization to generate ⁷Li³⁺, a numerical model based on the plasma equilibrium equations is developed in this work, which is helpful not only for our ion source, but also for understanding the physical process of lithium plasma from ECR ion sources with different frequencies. This model can describe the density and fraction of lithium ions in various system parameters. The dependences of the Li⁺, Li²⁺, and Li³⁺ ion density and fraction on electron temperature, gas pressure, microwave power, surface ionizer, and the magnetic field are investigated systematically.     

Transfer ionization in isocharge sequence ion and Ne collisions

The dependence of the ratio R1 for transfer ionization to single capture for Cq+, Nq+, Oq+, Neq+ ions on Ne target upon the electronic structure of the projectile is studied. For Aq+-Ne collisions the ratio R1 decreases as the atomic number Z of the projectile increases for q=4,5,6,7 sequences which provides strong evidence for the increase of the binding energy of the target valence electron after single electron capture. The increase in binding energy depends both upon the atomic number of the projectile and the target atom.