计算机网络开放式实验教学管理模式研究

随着创新理念的深化,创新思想逐渐普及到了教学模式当中,开放式实验教学是教学模式的一种创新。开放式实验教学可以在提高学生实践能力的基础上,提高学生的创新能力。在国内外已经成为一种很普遍的教学模式。结合计算机网络实验课程在传统实验教学方面存在的不足,文章提出了开放式实验教学的优势,并介绍了计算机网络课程开放式实验教学管理的内容和方式,对其推进作用进行了积极的探索。     

加强开放式实验教学提高学生的综合素质

本文阐述了怎样加强开放式实验教学，培养学生的基本技能、创新思维能力，提高学生的综合素质。     

基于学生个性的研究型大学实验室模式研究

本课题针对传统实验教学内容单一,学生能力培养受限以及沿用计划性教学模式,学生只能被动记性学习等问题,着眼学生可开发的学习研究能力,提出一种基于学生个性的开放式实验教学模式,有针对性地研究探索在研究型大学实验室教学环节中,如何科学培养学生独立和协同进行科学研究和创新的能力,并使学生由被动学习转变为主动学习。通过实验教学在时间、空间、设备等方面的全面开放以及学生个体差异,在保证完成实践基本要求的基础上,采用不同层次的实验教学,给学生足够的自主选择空间,以充分发挥每个学生的主观能动性、想象力和创造力。     

以综合能力培养为抓手,构建电气类开放实验教学平台

开放实验教学平台的建设是高等学校实践教学工作的需要。文章介绍了电气类开放实验教学平台的建设与实践,结合实际提出了平台的建设理念与建设模式,并就平台基本结构、平台主要建设内容、平台特色与创新点、平台的教学与研究功能、开放式实验教学效果、平台建成的意义等方面进行了较为详细的阐述。     

DSP课程实验内容设计及实施

本文针对电气控制类专业的DSP课程实验教学目标,提出DSP课程实验可由验证性实验、综合性实验和应用性实验项目组成,详细叙述了各实验项目的实验目的及基本内容。我院自制的应用性实验项目平台,创办学生创新实验室及学生互助等实验实施措施,可以实施开放式实验教学,有效提高DSP实验教学效果。     

电类基础实验课项目设计型教学方法初探究

以培养学生的创新意识、强化工程实践能力为目标,河南科技大学电气工程学院在实验教学中以项目设计为主导,扩大课程的可选择性,利用现代教育手段打破空间和时间的限制,开展开放式实验教学,初步形成了项目设计型实验教学新模式.     

开放式教学在"电工学"教学中的应用

为了适应信息时代的发展和培养创新人才的需要,对传统的以封闭教学为特点的改革势在必行.开放式教学充分认识学生的主体地位,把学习的主动权交给学生.根据"电工学"课程的特点,在教学过程中充分应用开放式教学能起到很好的教学效果.本文从开放教学理念、开放教材观、开放教学过程、开放教学方式、开放教学评价五个方面,阐述了如何将开放式教学应用于"电工学"教学之中.     

浅谈职业教育教学模式创新

职业教育是一种注重操作技能培训的教育,在教学中只有进行开放式实验,开展理论实践"一体化"教学,才能充分培养学生的操作技能和创新才能。以《电工学》的教学为例,只有注重培养学生学习的主动性,结合教学内容,采用设置探究课题、开放式实验教学的方法,开展理论实践"一体化"教学,多种教学方法灵活采用,赛训结合,才能充分培养学生的创新意识和创造才能。     

扩散吸收式制冷装置的原理及在实验教学中的应用

文章介绍了扩散吸收式制冷装置的研制背景、组成、工作原理及应用情况。在实验教学中设计出开放式实验装置,不仅加强学生对扩散吸收式制冷系统的基本原理的理解,而且培养了他们的动手能力,更有利于他们创新思维意识和综合工程实践能力的提高。     

实验室开放管理模式的改革与创新

高等院校实验教学的根本任务是培养具有工程实践和创新能力的素质型人才,实验室开放是实验教学的重要环节之一,是高校促进学生综合能力的提高、培养人才的有效途径。从实验室开放的必要性出发,介绍目前各高校开放实验室管理的现状,并结合学校进行"自主化个性实验"的实验室开放管理的情况和做法,提出实验室开放管理模式改革与创新的措施。     

Development of the readout system for waveguide multilayer optical card

Waveguide multilayer optical card （WMOC） is a novel storage device of three-dimensional optical information. An advanced readout system fitting for the WMOC is introduced in this paper. The hardware mainly consists of the light source for reading, WMOC, motorized stages addressing unit, microscope imaging unit, CCD detecting unit and PC controlling ＆ processing unit. The movement of the precision motorized stage is controlled by the computer through Visual Basic （VB） language in software. A control panel is also designed to get the layer address and the page address through which the position of the motorized stages can be changed. The WMOC readout system is easy to manage and the readout result is directly displayed on computer monitor.     

Nanoimprint Lithography -A Next Generation High Volume Lithography Technique

IntroductionNanoimprint Lithography is a well-acknowl-edged low cost, high resolution, large area pattern-ing process. It includes the most promising methods,high-pressure hot embossing lithography (HEL) [2],UV-cured imprinting (UV-NIL) [3] and micro contactprinting (m-CP, MCP) [4]. Curing of the imprintedstructures is either done by subsequent UV-lightexposure in the case of UV-NIL or by cooling downbelow the glass transition temperature of the ther-moplastic material in case of HEL…     

Collinear phase-matching study of terahertz-wave generation via difference frequency mixed in GaAs and Inp

The collinearly phase-matching condition of terahertz-wave generation via difference frequency mixed in GaAs and InP is theoretically studied. In collinear phase-matching, the optimum phase-matching wave hands of these two crystals are calculated. The optimum phase-matching wave bands in GaAs and lnP are 0.95-1.38μm and 0.7-0.96μm respectively. The influence of the wavelength choice of the pump wave on the coherent length in THz-wave tuning is also discussed. The influence of the temperature alteration on the phase-matching and the temperature tuning properties in GaAs crystal are calculated and analyzed. It can serve for the following experiments as a theoretical evidence and a reference as well.     

Effects of the alloy compositions on the phonon-polaritons in ternary mixed crystals

Composition dependence of bulk and surface phonon-polaritons in ternary mixed crystals are studied in the framework of the modified random-element-isodisplacement model and the Bom-Huang approximation. The numerical results for Several Ⅱ - Ⅵ and Ⅲ- Ⅴ compound systems are performed, and the polariton frequencies as functions of the compositions for ternary mixed crystals AlxGa1-xAs, GaPxAS1-x, ZnSxSe1-x, GaAsxSb1-x, GaxIn1-xP, and ZnxCd1-xS as examples are given and discussed. The results show that the dependence of the energies of two branches of bulk phonon-polaritons which have phonon-like characteristics, and surface phonon-polaritons on the compositions of ternary mixed crystals are nonlinear and different from those of the corresponding binary systems.     

Influence of PVK ： NPB hole transporting layer on the characteristics of organic light-emitting devices

A doping system consisting of NPB and PVK is employed as a composite hole transporting layer （CHTL）. By adjusting the component ratio of the doping system, a series of devices with different concentration proportion of PVK ： NPB are constracted. The result shows that doping concentration of NPB enhances the competence of hole transporting ability, and modifies the recombination region of charge as well as affects the surface morphology of doped film. Optimum device with a maximum brightness of 7852 cd/m^2 and a power efficiency of 1.75 lm/W has been obtained by choosing a concentration proportion of PVK ： NPB at 1：3.     

New insert layer structure OLEDs

An insert layer structure organic electroluminescent device（OLED） based on a new luminescent material （Zn（salen）） is fabricated. The configuration of the device is ITO/CuPc/NPD/Zn（salen）/Liq/LiF/A1/CuPc/NPD/Zn（salen）/Liq/LiF/A1. Effective insert electrode layers comprising LiF（1nm）/Al（5 nm） are used as a single semitransparent mirror, and bilayer cathode LiF（1 nm）/A1（100 nm） is used as a reflecting mirror. The two mirrors form a Fabry-Perot microcavity and two emissive units. The maximum brightness and luminous efficiency reach 674 cd/m^2 and 2.652 cd/A, respectively, which are 2.1 and 3.7 times higher than the conventional device, respectively. The superior brightness and luminous efficiency over conventional single-unit devices are attributed to microcavity effect.     

Analysis of error performance on Turbo coded FDPIM

Due to variable symbol length of digital pulse interval modulation（DPIM）, it is difficult to analyze the error performances of Turbo coded DPIM. To solve this problem, a fixed-length digital pulse interval modulation（FDPIM） method is provided. The FDPIM modulation structure is introduced. The packet error rates of uncoded FDPIM are analyzed and compared with that of DPIM. Bit error rates of Turbo coded FDPIM are simulated based on three kinds of analytical models under weak turbulence channel. The results show that packet error rate of uncoded FDPIM is inferior to that of uncoded DPIM. However, FDPIM is easy to be implemented and easy to be combined, with Turbo code for soft-decision because of its fixed length. Besides, the introduction of Turbo code in this modulation can decrease the average power about 10 dBm, which means that it can improve the error performance of the system effectively.     

A method for calculating the center position of collimated light

It is a key problem to accurately calculate beam spots＇ center of measuring the warp by using a collimated laser. A new method, named double geometrical center method （DGCM）, is put forward for the first time. In this method, a plane wave perpendicularly irradiates an aperture stop, and a charge couple device （CCD） is employed to receive the diffraction-beam spots, then the geometrical centers of the fast and the second diffraction-beam spots are calculated respectively, and their mean value is regarded as the center of datum beam. In face of such adverse instances as laser intension distributing defectively, part of the image being saturated, this method can still work well. What＇s more, this method can detect whether an unacceptable error exits in the courses of image receiving, processing and calculating. The experimental results indicate the precision of this method is high.     

Resolution Enhancement Technology:Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.     

Cost-effective test solutions for smart card and other integrated flash applications

From its emergence in the late 1980s as a lower cost alternative to early EEPROM technologies, flash memory has evolved to higher densities and speedsand rapidly growing acceptance in mobile applications.In the process, flash memory devices have placed increased test requirements on manufacturers. Today, as flash device test grows in importance in China, manufacturers face growing pressure for reduced cost-oftest, increased throughput and greater return on investment for test equipment. At the same time, the move to integrated flash packages for contactless smart card applications adds a significant further challenge to manufacturers seeking rapid, low-cost test.