Microwave Dielectric Properties of BiCu<Subscript>2</Subscript>PO<Subscript>6</Subscript> Ceramics with Low Sintering Temperature

A BiCu₂PO₆ microwave dielectric ceramic was prepared using a solid-state reaction method. As the sintering temperature increased from 800°C to 880°C, the bulk density of BiCu₂PO₆ ceramic increased from 6.299 g/cm³ to 6.366 g/cm³; the optimal temperature was 860°C. The best microwave dielectric properties [permittivity (? _r ) = ～16, a quality factor (Q × f) = ～39,110 GHz and a temperature coefficient of resonant frequency (τ _f ) = ～?59 ppm/°C] were obtained in the ceramic sintered at 860°C for 2 h. Then, TiO₂ with a positive τ _f (～+400 ppm/°C) was added to compensate the τ _f value. The composite material was found to have a near-zero τ _f (+2.7 ppm/°C) and desirable microwave properties (? _r  = 19.9, Q × f = 24,885 GHz) when synthesized at a sintering temperature of 880°C. This system could potentially be used for low-temperature co-fired ceramics technology applications.     

Thermoelectric Properties for a Suspended Microribbon of Quasi-One-Dimensional TiS<Subscript>3</Subscript>

Transition-metal trichalcogenides MX₃ (M = Ti, Zr, Nb, Ta; X = S, Se) are well-known inorganic quasi-one-dimensional conductors. Among them, we have investigated the thermoelectric properties of titanium trisulfide TiS₃ microribbon. The electrical resistivity ρ, thermal conductivity κ, and thermoelectric power S were measured using 3ω method. The weight mean values were found to be ρ = 5 mω m and κ = 10 W K^?1 m^?1 along the one-dimensional direction (b-axis) of the TiS₃ microribbon. Combined with the thermoelectric power S = ?530 μV K^?1, the figure of merit was calculated as ZT = 0.0023. This efficiency is the same as that of randomly oriented bulk TiS₃. We also estimated the anisotropy of σ and κ using the present results and those for randomly oriented bulk material. The obtained weak anisotropy for TiS₃ is attributable to strong coupling between triangular columns consisting of TiS₃ units. These experimental results are consistent with theoretical results obtained using density functional theory (DFT) calculations.     

Improvement in Thermoelectric Performance of SnS Due to Electronic Structure Modification Under Biaxial Strain

Ab-initio calculations using the full potential linearized augmented plane-wave technique and the semi-classical Boltzmann theory are used to study thermoelectric properties of unstrained SnS and at 1%, 2% and 3% applied biaxial tensile (BT) strain. The studies are carried out at 800 K for p-type and n-type carriers. For an increase in BT strain, lattice constants of SnS change causing changes in the band structure and increase in the band gap which in turn modifies thermoelectric coefficients. In the case of unstrained SnS, the maximum thermopower (S) obtained is 426 μV/K at carrier concentration 5.40?×?10¹⁸ cm^?3 for p-type carriers and 435 μV/K at carrier concentration 1.68?×?10¹⁸ cm^?3 for n-type carriers. At 3% applied BT strain, S is increased to 696 μV/K at carrier concentration 4.61?×?10¹⁷ cm^?3 for p-type carriers and 624 μV/K at carrier concentration 3.21?×?10¹⁷ cm^?3 for n-type carriers. The power factor (PF) increases?～?2 times at 3% BT strain as compared to unstrained SnS, and it is 6.20 mW K^?2 m^?1 for p-type carriers. For n-type carriers, PF at 3% applied BT is slightly less than the PF for unstrained SnS, which is 6.81 mW K^?2 m^?1. For both types of carriers, the figure of merit (ZT) is found to be?～?1.5 for unstrained SnS. For p-type carriers ZT is enhanced 1.4 times at 3% applied BT strain as compared to that of unstrained SnS. However, for n-type carriers, ZT does not change drastically with increase in BT strain.     

Characterization of HgCdTe Films Grown on Large-Area CdZnTe Substrates by Molecular Beam Epitaxy

Recent advances in growth of Hg_1?x Cd _x Te films on large-area (7 cm × 7.5 cm) CdZnTe (CZT) substrates is presented. Growth of Hg_1?x Cd _x Te with good uniformity on large-area wafers is achieved using a Riber 412 molecular beam epitaxy (MBE) tool designed for growth of Hg_1?x Cd _x Te compounds. The reactor is equipped with conventional CdTe, Te, and Hg sources for achieving uniform exposure of the wafer during growth. The composition of the Hg_1?x Cd _x Te compound is controlled in situ by employing a closed-loop spectral ellipsometry technique to achieve a cutoff wavelength (λ _co) of 14 μm at 78 K. We present data on the thickness and composition uniformity of films grown for large-format focal-plane array applications. The composition and thickness nonuniformity are determined to be <1% over the area of a 7 cm × 7.5 cm wafer. The films are further characterized by Fourier-transform infrared spectroscopy, optical microscopy, and Hall measurements. Additionally, defect maps show the spatial distribution of defects generated during the epitaxial growth of the Hg_1?x Cd _x Te films. Microdefect densities are in the low 10³ cm^?2 range, and void defects are below 500 cm^?2. Dislocation densities less than 5 × 10⁵ cm^?2 are routinely achieved for Hg_1?x Cd _x Te films grown on CZT substrates. HgCdTe 4k × 4k focal-plane arrays with 15 μm pitch for astronomical wide-area infrared imagers have been produced using the recently developed MBE growth process at Teledyne Imaging Sensors.     

Real-Time Determination of Absolute Frequency in Continuous-Wave Terahertz Radiation with a Photocarrier Terahertz Frequency Comb Induced by an Unstabilized Femtosecond Laser

A practical method for the absolute frequency measurement of continuous-wave terahertz (CW-THz) radiation uses a photocarrier terahertz frequency comb (PC-THz comb) because of its ability to realize real-time, precise measurement without the need for cryogenic cooling. However, the requirement for precise stabilization of the repetition frequency (f _rep) and/or use of dual femtosecond lasers hinders its practical use. In this article, based on the fact that an equal interval between PC-THz comb modes is always maintained regardless of the fluctuation in f _rep, the PC-THz comb induced by an unstabilized laser was used to determine the absolute frequency f _THz of CW-THz radiation. Using an f _rep-free-running PC-THz comb, the f _THz of the frequency-fixed or frequency-fluctuated active frequency multiplier chain CW-THz source was determined at a measurement rate of 10 Hz with a relative accuracy of 8.2?×?10^?13 and a relative precision of 8.8?×?10^?12 to a rubidium frequency standard. Furthermore, f _THz was correctly determined even when fluctuating over a range of 20 GHz. The proposed method enables the use of any commercial femtosecond laser for the absolute frequency measurement of CW-THz radiation.     

Carrier Lifetimes in Lightly-Doped <Emphasis Type="Italic">p</Emphasis>-Type 4H-SiC Epitaxial Layers Enhanced by Post-growth Processes and Surface Passivation

We investigated limiting factors of carrier lifetimes and their enhancement by post-growth processes in lightly-doped p-type 4H-SiC epitaxial layers (N _A ～ 2 × 10¹⁴ cm^?3). We focused on bulk recombination, surface recombination, and interface recombination at the epilayer/substrate, respectively. The carrier lifetime of 2.8 μs in an as-grown epilayer was improved to 10 μs by the combination of V_C-elimination processes and hydrogen annealing. By employing surface passivation with deposited SiO₂ followed by POCl₃ annealing, a long carrier lifetime of 16 μs was obtained in an oxidized epilayer. By investigating carrier lifetimes in a self-standing p-type epilayer, it was revealed that the interface recombination at the epilayer/substrate was smaller than the surface recombination on a bare surface. We found that the V_C-elimination process, hydrogen annealing, and surface passivation are all important for improving carrier lifetimes in lightly-doped p-type epilayers.     

Good Thermal Stability,High Permittivity,Low Dielectric Loss and Chemical Compatibility with Silver Electrodes of Low-Fired BaTiO<Subscript>3</Subscript>–Bi(Cu<Subscript>0.75</Subscript>W<Subscript>0.25</Subscript>)O<Subscript>3</Subscript> Ceramics

(1 ? x)BaTiO₃–xBi(Cu_0.75W_0.25)O₃ [(1 ? x)BT–xBCW, 0 ≤ x ≤ 0.04] perovskite solid solutions ceramics of an X8R-type multilayer ceramic capacitor with a low sintering temperature (900°C) were synthesized by a conventional solid state reaction technique. Raman spectra and x-ray diffraction analysis demonstrated that a systematically structural evolution from a tetragonal phase to a pseudo-cubic phase appeared near 0.03 < x < 0.04. X-ray photoelectron analysis confirmed the existence of Cu⁺/Cu²⁺ mixed-valent structure in 0.96BT–0.04BCW ceramics. 0.96BT–0.04BCW ceramics sintered at 900°C showed excellent temperature stability of permittivity (Δε/ε _25°C ≤ ±15%) and retained good dielectric properties (relative permittivity ～1450 and dielectric loss ≤2%) over a wide temperature range from 25°C to 150°C at 1 MHz. Especially, 0.96BT–0.04BCW dielectrics have good compatibility with silver powders. Dielectric properties and electrode compatibility suggest that the developed materials can be used in low temperature co-fired multilayer capacitor applications.     

Demonstration of a Dual-Band Mid-Wavelength HgCdTe Detector Operating at Room Temperature

In this paper, the performance of sequential dual-band mid-wavelength N⁺-n-p-p-P⁺-p-p-n-n⁺ back-to-back HgCdTe photodiode grown by metal-organic chemical vapor deposition (MOCVD) operating at room temperature is presented. The details of the MOCVD growth procedure are given. The influence of p-type separating-barrier layer on dark current, photocurrent and response time was analyzed. Detectivity without immersion D^* higher than 1 × 10⁸ cmHz^1/2/W was estimated for λ_Peak = 3.2 μm and 4.2 μm, respectively. A response time of τ_s ～ 1 ns could be reached in both MW1 and MW2 ranges for the optimal P⁺ barrier Cd composition at the range 0.38–0.42, and extra series resistance related to the processing R_Series equal to 500 Ω.     

Investigation of MBE-Growth of Mid-Wave Infrared Hg<Subscript>1−<Emphasis Type="Italic">x</Emphasis></Subscript>Cd<Subscript><Emphasis Type="Italic">x</Emphasis></Subscript>Se

Undoped mid-wave infrared Hg_1?xCd_xSe epitaxial layers have been grown to a nominal thickness of 8–14 μm on GaSb (211)B substrates by molecular beam epitaxy (MBE) using constant beam equivalent pressure ratios. The effects of growth temperature from 70°C to 120°C on epilayer quality and its electronic parameters has been examined using x-ray diffraction (XRD) rocking curves, atomic force microscopy, Nomarski optical imaging, photoconductive decay measurements, and variable magnetic field Hall effect analysis. For samples grown at 70°C, the measured values of XRD rocking curve full width at half maximum (FWHM) (116 arcsec), root mean square (RMS) surface roughness (2.7 nm), electron mobility (6.6?×?10⁴ cm² V^?1 s^?1 at 130 K), minority carrier lifetime (～?2 μs at 130 K), and background n-type doping (～?3?×?10¹⁶ cm^?3 at 130 K), indicate device-grade material quality that is significantly superior to that previously published in the open literature. All of these parameters were found to degrade monotonically with increasing growth temperature, although a reasonably wide growth window exists from 70°C to 90°C, within which good quality HgCdSe can be grown via MBE.     

Low-frequency noise in gallium nitride epitaxial layers with different degrees of order of mosaic structure

The correlation between the noise level 1/f and the degree of mosaic-structure order in gallium nitride epitaxial layers was studied for the first time. Samples with a doping level of N _d ?N _a ≈8×10¹⁶ cm^?3 and a relatively high degree of order were characterized by the Hooge parameter α≈1.5×10^?3. This value is unprecedently low for thin GaN epitaxial films. The Hooge parameter was significantly higher for samples with N _d ?N _a ≈1.1×10¹⁸ cm^?3 and a low degree of order despite the fact that α generally decreases with increasing doping level at the same degree of order. Thus, the degree of mosaic-structure order affects not only the optical and electrical characteristics but also the fluctuation parameters of GaN epitaxial layers.     

Effects of Nb Content on the Ferroelectric and Dielectric Properties of Nb/Nd-Co-doped Bi<Subscript>4</Subscript>Ti<Subscript>3</Subscript>O<Subscript>12</Subscript> Thin Films

Nd/Nb-co-substituted Bi_3.15Nd_0.85Ti_3?x Nb _x O₁₂ (BNTN _x , x = 0.01, 0.03, 0.05 and 0.07) thin films were grown on Pt/Ti/SiO₂/Si (100) substrates by chemical solution deposition. The effects of Nb content on the micro-structural, dielectric, ferroelectric, leakage current and capacitive properties of the BNTN _x thin films were investigated. A low-concentration substitution with Nb ions in BNTN _x can greatly enhance its remanent polarization (2P _r) and reduce the coercive field (2E _c) compared with those of Bi₄Ti₃O₁₂ (BIT) thin film. The highest 2P _r (71.4 μC/cm²) was observed in the BNTN_0.03 thin film when the 2E _c was 202 kV/cm. Leakage currents of all the films were on the order of 10^?6 to 10^?5 A/cm², and the BNTN_0.03 thin film has a minimum leakage current (2.1 × 10^?6 A/cm²) under the high electric field (267 kV/cm). Besides, the C–V curve of the BNTN_0.03 thin film is the most symmetrical, and the maximum tunability (21.0%) was also observed in this film. The BNTN_0.03 thin film shows the largest dielectric constant and the lowest dielectric loss and its maximum Curie temperature is 410 ± 5°C.     

Preparation by Poly(Acrylic Acid) Sol–Gel Method and Thermoelectric Properties of γ-Na<Subscript><Emphasis Type="Italic">x</Emphasis></Subscript>CoO<Subscript>2</Subscript> Bulk Materials

γ-Na _x CoO₂ single-phase powders have been synthesized by a poly(acrylic acid) (PAA) sol–gel (SG) method, and γ-Na _x CoO₂ bulk ceramic fabricated using spark plasma sintering. The effects of the PAA concentration on the sample phase composition and morphology were investigated. The thermoelectric properties of the γ-Na _x CoO₂ bulk ceramic were also studied. The results show that the PAA concentration did not significantly affect the crystalline phase of the product. However, agglomeration of γ-Na _x CoO₂ crystals was suppressed by the steric effect of PAA. The Na _x CoO₂ bulk ceramic obtained using the PAA SG method had higher crystallographic anisotropy, better chemical homogeneity, and higher density than the sample obtained by solid-state reaction (SSR), leading to improved thermoelectric performance. The PAA SG sample had power factor (in-plane PF = σS ²) of 0.61 mW m^?1 K^?2 and dimensionless figure of merit (ZT) along the in-plane direction of 0.19 at 900 K, higher than for the SSR sample (in-plane PF = 0.51 mW m^?1 K^?2, in-plane ZT = 0.17). These results demonstrate that a simple and feasible PAA SG method can be used for synthesis of Na _x CoO₂ ceramics with improved thermoelectric properties.     

Sol–Gel Grown SnO<Subscript>2</Subscript> Nanoparticles: Evaluation of Structure,Morphology, and Raman Spectra

Tin oxide (SnO₂) nanoparticles (TONPs) were prepared using sol–gel method under different growth conditions. The influence of calcination temperature (450°C and 600°C) and molecular weight of polyethylene glycol (PEG 300 and PEG 4000) on the nanocrystallinity, surface morphology, and Raman spectra of as-prepared TONPs were evaluated. Variation of calcination temperature and dopant (sulfosuccinic acid, SA) was found to affect considerably the structure, surface morphology, and Raman activities of the TONPs. The size of TONPs estimated using Scherrer equation was discerned to be in the range of 15–32 nm. The observed intensity enhancement in the Raman vibrational modes at lower calcination temperature was attributed to the enlargement of TONPs size. The absorption of molecules at the TONPs surface led to a quenching in the A ₂ g and Eu Raman peaks. Raman peaks centered around 673 cm^?1, 799 cm^?1, 640 cm^?1 , and 432 cm^?1 corresponding to A1g, B2g, A1g, and Eg modes, respectively have manifested highest peaks intensity. Furthermore, the enhancement of the Eg mode due to the addition of SA dopant was ascribed to the Jahn–Teller distortion mechanism.     

Structural and Electrical Properties of Ag/<Emphasis Type="Italic">n</Emphasis>-TiO<Subscript>2</Subscript>/<Emphasis Type="Italic">p</Emphasis>-Si/Al Heterostructure Fabricated by Pulsed Laser Deposition Technique

We have investigated the structural and electrical characteristics of the Ag/n-TiO₂/p-Si/Al heterostructure. Thin films of pure TiO₂ were deposited on p-type silicon (100) by optimized pulsed laser ablation with a KrF-excimer laser in an oxygen-controlled environment. X-ray diffraction analysis showed the formation of crystalline TiO₂ film having a tetragonal texture with a strong (210) plane as the preferred direction. High purity aluminium and silver metals were deposited to obtain ohmic contacts on p-Si and n-TiO₂, respectively. The current–voltage (I–V) characteristics of the fabricated heterostructure were studied by using thermionic emission diffusion mechanism over the temperature range of 80–300 K. Parameters such as barrier height and ideality factor were derived from the measured I–V data of the heterostructure. The detailed analysis of I–V measurements revealed good rectifying behavior in the inhomogeneous Ag/n-TiO₂/p-Si(100)/Al heterostructure. The variations of barrier height and ideality factor with temperature and the non-linearity of the activation energy plot confirmed that barrier heights at the interface follow Gaussian distributions. The value of Richardson’s constant was found to be 6.73 × 10⁵ Am^?2 K^?2, which is of the order of the theoretical value 3.2 × 10⁵ Am^?2 K^?2. The capacitance–voltage (C–V) measurements of the heterostructure were investigated as a function of temperature. The frequency dependence (Mott–Schottky plot) of the C–V characteristics was also studied. These measurements indicate the occurrence of a built-in barrier and impurity concentration in TiO₂ film. The optical studies were also performed using a UV–Vis spectrophotometer. The optical band gap energy of TiO₂ films was found to be 3.60 eV.     

Analysis of Carrier Transport in <Emphasis Type="Italic">n</Emphasis>-Type Hg<Subscript>1−<Emphasis Type="Italic">x</Emphasis></Subscript>Cd<Subscript><Emphasis Type="Italic">x</Emphasis></Subscript>Te with Ultra-Low Doping Concentration

Mercury cadmium telluride (HgCdTe, or MCT) with low n-type indium doping concentration offers a means for obtaining high performance infrared detectors. Characterizing carrier transport in materials with ultra low doping (N_D?=?10¹⁴ cm^?3 and lower), and multi-layer material structures designed for infrared detector devices, is particularly challenging using traditional methods. In this work, Hall effect measurements with a swept B-field were used in conjunction with a multi-carrier fitting procedure and Fourier-domain mobility spectrum analysis to analyze multi-layered MCT samples. Low temperature measurements (77 K) were able to identify multiple carrier species, including an epitaxial layer (x?=?0.2195) with n-type carrier concentration of n?=?1?×?10¹⁴ cm^?3 and electron mobility of μ?=?280000 cm²/Vs. The extracted electron mobility matches or exceeds prior empirical models for MCT, illustrating the outstanding material quality achievable using current epitaxial growth methods, and motivating further study to revisit previously published material parameters for MCT carrier transport. The high material quality is further demonstrated via observation of the quantum Hall effect at low temperature (5 K and below).     

Influence of Sn<Superscript>4+</Superscript> on Structural and DC Electrical Resistivity of Ni-Zn Ferrite Thick Films

Among the soft ferrites, Ni-Zn ferrite is one of the most versatile ceramic materials because of their important electrical and magnetic properties. These properties were improved by substituting Sn⁴⁺ in Ni-Zn ferrites with chemical composition of Ni _x Zn_1+y?x Fe_2?2y Sn _y O₄ (x = 0, 0.2, 0.4, 0.6, 0.8, 1.0; y = 0.1, 0.2). To achieve homogenous ferrite powder at lower sintering temperature and smaller duration in nano-size form, the oxalate co-precipitation method was preferred as compared to other physical and chemical methods. Using this powder, ferrite thick films (FTFs) were prepared by the screen printing technique because of its low cost and easy use. To study structural behavior, the FTFs were characterized by different techniques. The x-ray diffraction and thermo-gravimetric and differential thermal analysis studies show the formation of cubic spinel structure and ferrite phase formation, respectively. There is no remarkable trend observed in lattice constants for the Sn⁴⁺ (y = 0.1)- and Sn⁴⁺ (y = 0.2)-substituted Ni-Zn ferrites. The bond lengths as well as ionic radii on the A-site of Ni-Zn-Sn ferrites were found to decrease with increasing nickel content. The bond length and ionic radii on the B-sites remained almost constant for Sn⁴⁺ (y = 0.1, 0.2)-substituted Ni-Zn ferrites. The energy dispersive x-ray analysis confirms the elemental analysis of FTFs. The Fourier transform infrared spectra show two major absorption bands near 400 cm^?1 and 600 cm^?1 corresponding to octahedral and tetrahedral sites, respectively, which also confirms the formation of the ferrites. The field emission scanning electron microscopy images shows that the particles are highly porous in nature and located in loosely packed agglomerates. The average particle size of the FTFs lies in the range 20–60 nm. Direct current (DC) resistivity of Ni-Zn-Sn FTFs shows the semiconductor nature. The DC resistivity of Ni-Zn-Sn_0.2FTFs is lower than Ni-Zn-Sn_0.1 FTFs. The DC resistivity is found to decrease with the increase in Ni²⁺ content up to x = 0.6. It increases thereafter for a further increase in Ni²⁺ content up to x = 1.0, and a similar trend is observed for the variations of activation energy with Ni²⁺ content.     

Iodine Doping of CdTe and CdMgTe for Photovoltaic Applications

Iodine-doped CdTe and Cd_1?x Mg _x Te layers were grown by molecular beam epitaxy. Secondary ion mass spectrometry characterization was used to measure dopant concentration, while Hall measurement was used for determining carrier concentration. Photoluminescence intensity and time-resolved photoluminescence techniques were used for optical characterization. Maximum n-type carrier concentrations of 7.4 × 10¹⁸ cm^?3 for CdTe and 3 × 10¹⁷ cm^?3 for Cd_0.65Mg_0.35Te were achieved. Studies suggest that electrically active doping with iodine is limited with dopant concentration much above these values. Dopant activation of about 80% was observed in most of the CdTe samples. The estimated activation energy is about 6 meV for CdTe and the value for Cd_0.65Mg_0.35Te is about 58 meV. Iodine-doped samples exhibit long lifetimes with no evidence of photoluminescence degradation with doping as high as 2 × 10¹⁸ cm^?3, while indium shows substantial non-radiative recombination at carrier concentrations above 5 × 10¹⁶ cm^?3. Iodine was shown to be thermally stable in CdTe at temperatures up to 600°C. Results suggest iodine may be a preferred n-type dopant compared to indium in achieving heavily doped n-type CdTe.     

First-Principles Study of Structural,Electronic, Optical,and Thermal Properties of BeSiSb<Subscript>2</Subscript> and MgSiSb<Subscript>2</Subscript>

Structural, electronic, optical, and thermal properties of ternary II–IV–V₂ (BeSiSb₂ and MgSiSb₂) chalcopyrite semiconductors have been calculated using the full-potential linearized augmented plane wave scheme?in the generalized gradient approximation. The optimized equilibrium structural parameters (a, c, and u) are in good agreement with theoretical results obtained using other methods. The band structure and density of states reveal that BeSiSb₂ has an indirect (Γ–Z) bandgap of about 0.61 eV, whereas MgSiSb₂ has a direct (Γ–Γ) bandgap of 0.80 eV. The dielectric function, refractive index, and extinction coefficient were calculated to investigate the optical properties, revealing that BeSiSb₂ and MgSiSb₂ present very weak birefringence. The temperature dependence of the volume, bulk modulus, Debye temperature, and heat capacities (C _v and C _p) was predicted using the quasiharmonic Debye model at different pressures. Significant differences in properties are observed at high pressure and high temperature. We predict that, at 300 K and 0 GPa, the heat capacity at constant volume C _v, heat capacity at constant pressure C _P, Debye temperature θ _D, and Grüneisen parameter γ will be about 94.91 J/mol K, 98.52 J/mol K, 301.30 K, and 2.11 for BeSiSb₂ and about 96.08 J/mol K, 100.47 J/mol K, 261.38 K, and 2.20 for MgSiSb₂, respectively.     

The Improvement of Electrical Characteristics of Pt/Ti Ohmic Contacts to Ga-Doped ZnO by Homogenized KrF Pulsed Excimer Laser Treatment

We investigated the effect of KrF excimer laser surface treatment on Pt/Ti ohmic contacts to Ga-doped n-ZnO (N_d = 4.3 × 10¹⁷ cm^?3). The treatment of the n-ZnO surfaces by laser irradiation greatly improved the electrical characteristics of the metal contacts. The Pt/Ti ohmic layer on the laser-irradiated n-ZnO showed specific contact resistances of 2.5 × 10^?4 ～ 4.8 × 10^?4 Ω cm² depending on the laser energy density and gas ambient, which were about two orders of magnitude lower than that of the as-grown sample, 8.4 × 10^?2 Ω cm². X-ray photoelectron spectroscopy and photoluminescence measurements showed that the KrF excimer laser treatments increased the electron concentration near the surface region of the Ga-doped n-ZnO due to the preferential evaporation of oxygen atoms from the ZnO surface by the laser-induced dissociation of Zn-O bonds.     

Theoretical Study of Electronic Structure and Thermoelectric Properties of Doped CuAlO<Subscript>2</Subscript>

The doping level dependence of thermoelectric properties of delafossite CuAlO₂ has been investigated in the constant scattering time (τ) approximation, starting from the first principles of electronic structure. In particular, the lattice parameters and the energy band structure were calculated using the total energy plane-wave pseudopotential method. It was found that the lattice parameters of CuAlO₂ are a = 2.802 Å and c = 16.704 Å, and the internal parameter is u = 0.1097. CuAlO₂ has an indirect band gap of 2.17 eV and a direct gap of 3.31 eV. The calculated energy band structures were then used to calculate the electrical transport coefficients of CuAlO₂. By considering the effects of doping level and temperature, it was found that the Seebeck coefficient S(T) increases with increasing acceptor doping (A _d) level. The values of S(T) in our experiments correspond to an A _d level at 0.262 eV, which is identified as the Fermi level of CuAlO₂. Based on our experimental Seebeck coefficient and the electrical conductivity, the constant relaxation time is estimated to be 1 × 10^?16 s. The power factor is large for a low A _d level and increases with temperature. It is suggested that delafossite CuAlO₂ can be considered as a promising thermoelectric oxide material at high doping and high temperature.