基于DSP的直流磁控溅射电源设计

该文通过研究磁控靶工作时的负载特性,设计了以全桥逆变开关电源技术为基础的高效、大功率磁控溅射电源。利用Matlab搭建的模型对电路的参数、输出波形进行了仿真,在仿真的基础上完成了主回路、控制电路硬件及软件程序的设计及样机测试,并在JTP-1400型磁控溅射镀膜机上进行了实验。实验结果证实该电源具有恒流控制效果好,电流截止负反馈反应迅速,工作稳定等优点。     

交流脉冲式磁控溅射靶极电源的研制

本文介绍了一种中频交流脉冲式磁控溅射靶极电源。该电源采用全桥逆变拓扑电路、PWM控制方式、输出功率叠加的方案，具有快速的过流检测与保护功能。在等离子体负载下进行了抑制弧光放电和空心阴极效应的实验，同低频直流脉冲电源相比，交流脉冲放电对其抑制是非常有效的。这表明该电源作为磁控溅射靶极电源是完全可行的，也为进一步探索交流磁控溅射新工艺提供了可靠的研究设备。     

A multichannel power supply for high power magnetrons

The paper describes characteristics and design principles of a multichannel power supply for CW magnetrons with RF power up to 3 kW. An advanced control system implemented in the power supply has resulted in its good operational properties as well as allowed providing adaptive procedures for the regulation of magnetron operation. A modular approach based on utilization of novel electronic components increases reliability and lowers weight and dimensions of the power supply.     

磁控溅射技术进展及应用(上)

近年来磁控溅射技术的应用日趋广泛,在工业生产和科学研究领域发挥巨大作用。随着对具有各种新型功能的薄膜需求的增加,相应的磁控溅射技术也获得进一步的发展。本文将介绍磁控溅射技术的发展,以及闭合磁场非平衡溅射、高速率溅射及自溅射、中频及脉冲溅射等各种新技术及特点,阐述磁控溅射技术在电子、光学、表面功能薄膜、薄膜发光材料等许多方面的应用。     

磁控溅射技术进展及应用(下)

近年来磁控溅射技术的应用日趋广泛,在工业生产和科学研究领域发挥巨大作用。随着对具有各种新型功能的薄膜需求的增加,相应的磁控溅射技术也获得进一步的发展。本文将介绍磁控溅射技术的发展,以及闭合磁场非平衡溅射、高速率溅射及自溅射、中频及脉冲溅射等各种新技术及特点,阐述磁控溅射技术在电子、光学、表面功能薄膜、薄膜发光材料等许多方面的应用。     

基于单片机的磁控溅射稳压开关电源设计

磁控溅射真空镀膜技术与传统的化学电镀技术相比,具有环保、降耗、减排等优点,磁控电源是这种镀膜装置的关键部件之一。该文研究和设计了以高频开关电源技术为基础的高效率、大功率磁控稳压电源。文中介绍了主电路、控制电路的原理设计,用Matlab仿真软件搭建了电路模型,并进行了仿真实验,在此基础上完成了硬件电路、软件程序设计。通过AT89C51单片机实现了在不同工作方式下电源输出电压和电流的调节。实际应用证明该电源具有恒流控制效果好,可靠性高,工作稳定等优点。     

Rhodium coated mirrors deposited by magnetron sputtering for fusion applications

Metallic mirrors will be essential components of all optical spectroscopy and imaging systems for ITER plasma diagnostics. Any change in the mirror performance, in particular, its reflectivity, due to erosion of the surface by charge exchange neutrals or deposition of impurities will influence the quality and reliability of the detected signals. Due to its high reflectivity in the visible wavelength range and its low sputtering yield, rhodium appears as an attractive material for first mirrors in ITER. However, the very high price of the raw material calls for using it in the form of a film deposited onto metallic substrates. The development of a reliable technique for the preparation of high reflectivity rhodium films is therefore of the highest importance. Rhodium layers with thicknesses of up to 2 microm were produced on different substrates of interest (Mo, stainless steel, Cu) by magnetron sputtering. Produced films exhibit a low roughness and crystallite size of about 10 nm with a dense columnar structure. No impurities were detected on the surface after deposition. Scratch tests demonstrate that adhesion properties increase with substrate hardness. Detailed optical characterizations of Rh-coated mirrors as well as results of erosion tests performed both under laboratory conditions and in the TEXTOR tokamak are presented in this paper.     

A modular power supply for electrochemical etching

A power supply for the electrochemical etching of polycarbonate foils from radon dosimeters is described. Our modular design combines reliability, stability and low-cost by using standard components.     

A power supply for a technological installation

A voltage changer for the power supply of an ultrasonic piezoelectric transducer is designed on the basis of a resonance inverter. The output filter designed on the basis of a series-resonant circuit with parallel and series compensation ensures matching of the changer to the load. The changer ensures a load current of 0.5A±10% within a wide range of the load resistance (from 50 to 400 Ω) at an input voltage of 220 V±15% with automatic tuning to the frequency of the load mechanical resonance. The changer output power is 100 W, and the output current is a sinusoid with a frequency of 22±2 kHz.     

A power supply for simulating lightning-current pulses

The circuit diagram of a power-supply unit for simulating a positive lightning on a system of grounding current pulses is presented. The main criteria that governed the development of this facility are expounded. The design and order of operation of an experimental specimen of a power supply developed at the VNIIEF on the basis of a BMΓ-320 cascade magnetic-cumulation generator are considered. A calculation technique is described with which a device for the formation of current pulses of up to 90 kA in a standard grounding system has been developed.     

基于磁控溅射制备铜基表面增强拉曼散射基底

为了提高拉曼光谱仪的探测灵敏度,设计了铜基表面增强拉曼散射(surface enhanced Raman scattering, SERS)薄膜基底。以Cu_(40)Ti_(60)合金为靶材,通过控制磁控溅射参数获得了一系列铜钛合金薄膜,采用脱合金法进一步获得了不同结构的铜基薄膜,系统地研究了不同溅射参数对铜基薄膜的SERS特性的影响,确定了制备SERS基底的最佳溅射参数。脱合金后所得铜膜具有多孔结构,能形成高强度局域电磁场,即SERS"热点"(hotspots),从而表现出优异的SERS增强性能。该基底制备成本低,重复性好,能用于灵敏检测且SERS增强因子可达1.8×10~7,具有较好的应用前景。     

Wear resistant TiMoN coatings deposited by magnetron sputtering

TiMoN coatings with different Mo concentrations were deposited using a reactive magnetron sputtering technique and characterized by X-ray diffraction, nano-indentation, pin-on-disc testing, SEM/EDS and X-ray photoelectron spectroscopy. Mo alloying of TiN coatings generally enhances hardness. When tested in a pin-on-disc test against WC-Co pin, the coefficients of friction of TiMoN coatings were found to decrease with the increase in Mo atomic fraction, with the lowest values (0.4-0.5) being only one-half that of TiN coating (1.03). The underlying mechanism of the Mo effect is the formation of lubricious MoO₃ on the wear track. The combination of low coefficient of friction and enhanced hardness reduces the wear rate of TiMoN coatings to less than 2.5% of the wear rate of TiN coating.     

Target cleaning for faster CrN/AlN coating growth in magnetron sputtering

Metallic sputtering may be used to clean the target surface in the course of coating application by reactive magnetron sputtering. The introduction of additional stages of metallic sputtering in reactive magnetron sputtering increases the growth rate of CrN/AlN coatings by around 23%, with little change in physicomechanical properties.     

A modular bipolar power supply for high-power ion-plasma installations

The circuitry solutions, design, and main parameters of a modular pulse bipolar power-supply unit for high-power ion-plasma facilities are described. The modular principle of designing power supplies provided their application in various processes. The results of tests of the developed device as the power supply of a magnetron sputtering system with a power of 60 kW and a high-voltage power supply of the substrate bias voltage with a power of up to 40 kW are presented. The efficiency of applying bipolar pulses for preventing arcing at the magnetron cathode is experimentally demonstrated.     

A power supply for a copper bromide vapor laser

A power supply for a copper bromide vapor laser with stepwise charging of the operating capacitance is presented. A technical solution intended for charging the operating capacitance to energies of about 1 J under automatic control of laser operation is described. The effect of the electric circuit parameters on the charging process of the operating capacitance is shown. The operating characteristics of the device are presented.     

一种新颖的超高频感应加热电源

通过对软开关技术的研究,提出了一种全新的双管LLC谐振负载电路拓扑,解决了传统感应加热过程中高频条件下开关损耗的问题.采用电感电流反馈控制,并加入电路保护环节进行保护,提高了电源的可靠性.该方案简单新颖,易于实现.实验结果有效地验证了理论分析,该电路可以实现零电压开通,提高电源的工作频率.     

磁控溅射工艺控制模式比较

对各种磁控溅射的工艺参数控制技术进行比较,分析各自的特色,并指出光学厚度监控对于制备精密光学多层膜的反应溅射工艺的重要性.     

磁控溅射工艺控制模式比较

对各种磁控溅射的工艺参数控制技术进行比较,分析各自的特色,并指出光学厚度监控对于制备精密光学多层膜的反应溅射工艺的重要性.