Formation and Characterization of Pd, Pt and Pd-Pt Alloy Films on Polyimide by Catalyst-Enhanced Chemical Vapor Deposition

Platinum, palladium and their alloy films on polyimide were formed by catalyst-enhanced chemical vapor deposition （CVD） in the carrier gas （N2, O2） at 220-300℃ under reduced pressure and normal pressure. The deposition of palladium complexes [ Pd（（η3-allyl）（hfac） and Pd（hfac）2 ] gives pure palladium film, while the deposition of platinum needs the enhancement of palladium complex by mixing precursor platinum complex Pt（COD）Me2 and palladium complex in the same chamber. The co-deposition of Pd and Pt metals was used for the deposition of alloy films. During the CVD of palladium-platinum alloy, the Pd/Pt atomic ratios vary under different co-deposition conditions. These metal films were characterized by XPS and SEM, and show a good adhesive property.     

High rate deposition of microcrystalline silicon films by high-pressure radio frequency plasma enhanced chemical vapor deposition (PECVD)

Hydrogenated microcrystalline silicon (μc-Si:H) thin films were prepared by high-pressure radio-frequency (13.56 MHz) plasma enhanced chemical vapor deposition (rf-PECVD) with a screened plasma. The deposition rate and crystallinity varying with the deposition pressure, rf power, hydrogen dilution ratio and electrodes distance were systematically studied. By optimizing the deposition parameters the device quality μc-Si:H films have been achieved with a high deposition rate of 7.8 ?/s at a high pressure. The V _oc of 560 mV and the FF of 0.70 have been achieved for a single-junction μc-Si:H p-i-n solar cell at a deposition rate of 7.8 ?/s. Supported by the National Natural Science Foundation of China (Grant No. 50662003) and the State Development Program for Basic Research of China (Grant No. G2000028208)     

CVD法制备Sb掺杂SnO2薄膜的结构与性能研究

采用化学气相沉积法（CVD）制备了Sb掺杂SnO2薄膜（ATO），研究了Sb掺杂量对ATO薄膜结构和性能的影响。利用X射线衍射（XRD）、扫描电镜（SEM）、X射线光电子能谱（XPS）等分析手段对所制得薄膜的结构、形貌、成分等进行了表征，XRD结果表明在基板温度为665 ℃时能够制得结晶性能较好的多晶薄膜，XPS分析确定掺杂后的Sb以Sb5+离子形式存在。讨论了Sb掺杂量对方块电阻、透射率和反射率等薄膜性质的影响，结果表明,当Sb掺杂量为2%时取得最小方块电阻为7.8 Ω/□,在可见光区薄膜的透射率和反射率随着Sb掺杂量的增加呈下降趋势。最后探讨了Sb掺杂SnO2薄膜的显色特性，认为Sb5+离子的本征吸收是薄膜显色的主要原因。     

电子束反应蒸发技术生长Mo掺杂In_2O_3薄膜

利用电子束反应蒸发技术,调制衬底温度200～350℃,详细研究了Mo掺杂In2O3(IMO,In2O3:Mo)薄膜的微观结构以及光电性能的变化。随着衬底温度增加,原子力显微镜(AFM)与扫描电子显微镜(SEM)图像均证明IMO薄膜表面趋于粗糙,透过率和Hall测试表明其光学和电学性能逐渐提高。在衬底温度为350℃时,获得薄膜最小电阻率为2.1×10-4Ωcm,载流子迁移率为34.2cm2/Vs,其可见光区及近红外区的平均透过率为78%。衬底温度为200℃时,薄膜表现为黑褐色,经分析X射线光电子能谱(XPS)结果认为与薄膜中钼的低价氧化有关,提高衬底温度可改善薄膜氧化状态。     

沉积温度对ZnO薄膜结构形貌及光学性能的影响

以Zn(NO3)2·6H2O为前驱体,采用超声喷雾热解法在玻璃衬底上沉积了ZnO薄膜,采用X射线衍射(XRD)、扫描电子显微镜(SEM)、紫外光谱仪(UVS)等对所得ZnO薄膜进行表征,研究了沉积温度对ZnO薄膜的结构、微观形貌及光学性能的影响。结果表明,沉积温度为500℃时所制备的薄膜质量最佳,形成的是六角纤锌矿ZnO结构,且薄膜沿(002)晶面择优取向生长显著,薄膜表面光滑致密,晶粒细小均匀,尺寸在50~60nm。薄膜表现出良好的光学性能,可见光透过率可达87%。     

Characterization of EBPVD micro-layer composites and simulation of its internal stress state

Based on the basic operating principal and the technology characteristic of electron beam physical vapor deposition(EBPVD) technique, EBPVD was used to prepare the micro-layer composites. The effect on the substrate preheating temperature was taken into accounts and the finite element analysis package ANSYS was used to simulate the internal stress field and the potential displacement changing tendency. The results show that one of the most important quality factors on the judgment of micro-layer composites is the adhesion between the substrate and the deposition layers as well as among the different deposition layers. Besides the existance of temperature gradient through the thickness of layers, the main reason for the internal stress in micro-layer composites is the mismatch of various properties of the layer and the substrate of different thermal expansions and crystal lattice types. With the increase of substrate preheating temperature, the inter-laminar shear stress also takes on a tendency of increase but the axial residual stress decrease.     

液冷系统中均热板气液相变的热质传输模拟

为提高电池热管理液冷系统的均温性,研究一种铝槽式均热板和直流式液冷板相结合的复合液冷系统,并建立相应的三维传热模型。采用Volume-of-fluid(VOF)多相流模型,模拟均热板槽道内丙酮工质的气液相变过程,以及与液冷流道的耦合传热过程,并将模拟结果与实验结果进行了对比,验证了模型的正确性。研究结果显示,均热板可以提高液冷系统散热过程中的均温性,加热表面的温差可以控制在2.72 K以内。通过机理分析发现,其原因与均热板内部气液工质的热质传输过程有关。在液冷系统冷却液沿程温升的影响下,均热板腔室中的丙酮气相工质在长度方向上存在定向输运现象,相变产生的蒸汽会携带热量从高温区往低温区流动,从而抑制液冷板低温冷却水对加热表面温度分布的影响,提高了均温性能。