Ferroelectric properties of Bi_4Zr_(0.5)Ti_(2.5)O_(12) thin films prepared on LaNiO_3 bottom electrode by sol-gel method

The Bi4Zr0.5Ti2.5O12 (BZT) thin films were fabricated on the LaNiO3 bottom electrode using sol-gel method. The structure and morphology of the films were character-ized using X-ray diffraction, AFM and SEM. The results show that the films have a perovskite phase and dense microstructure. The 2Pr and 2Vc of the Pt/BZT/LaNiO3 capacitor are 28.2 μC/cm2 and 14.7 V respectively at an applied voltage of 25 V. After the switching of 1×1010 cycles, the Pr value decreases to 87% of its pre-fatigue val-ues. The dielectric constant (ε) and the dissipation factor (tanδ) of the BZT thin films are about 204 and 0.029 at 1 kHz, respectively. The films show good insulating behavior according to the test of leakage current. The clockwise C-V hysteresis curve observed shows that the Pt/BZT/LaNiO3 structure has a memory effect be-cause of the BZT film’s ferroelectric polarization.     

Effect of Annealing on Ferroelectric Properties of Bi3.25La0.75Ti3O12 Thin Films Prepared by the Sol-gel Method

Bi_3.25La_0.75Ti₃O₁₂(BLT) thin films were prepared on Pt/Ti/SiO₂/Si substrate by the sol-gel method. The effect of annealing on their structures and ferroelectric properties was investigated. The XRD patterns indicate that the BLT films annealed at different temperatures are randomly orientated and the single perovskite phase is obtained at 550°C. The remnant polarization increases and the coercive field decreases with the annealing temperature increasing. The leakage current density of the BLT films annealed at 700°C is about 5.8×10⁻⁸ Al cm² at the electric field of 250 kV/cm. Funded by the National Natural Science Foundation of China (No. 90407023)     

Leakage behavior and distortion of the hysteresis loop in ferroelectric thin films

Leakage behavior and distortion of the polarization hysteresis loop in ferroelectric thin films are analyzed by applying a totally depleted asymmetric back-to-back Schottky model, with the Pt/Pb(Zr, Ti)O3/Pt ( Pt/ PZT/Pt) sandwich structural thin film capacitor as an example. Some interesting phenomena resulting from the asymmetric interfaces, such as the leakage current level, the flat-band voltage, the disclosure of the hysteresis loop, and the change in the remanent polarization and coercive field, as well as the vertical drift of the polarization hysteresis loop, are discussed in detail. The calculated results are also verified with experiments.     

不同退火气氛下Bi2NiMnO6薄膜的铁电性能和漏电流研究

采用化学溶液法以LaNiO₃为底电极在Si(100)衬底上生长了Bi₂NiMnO₆薄膜,分别在N₂和O₂下对薄膜进行退火,退火温度均为600 ℃,研究不同退火气氛对薄膜结构与电性能的影响.用XRD测量分析了Bi₂NiMnO₆薄膜的结构,用铁电性能测量仪表征了样品的铁电性能和漏电流特性.结果表明,在N₂或O₂气氛下,Bi₂NiMnO₆薄膜均能成相,所有样品在室温下均表现出铁电性能,同时,这些样品都呈现出相当低的漏电流密度.此外,还讨论了Bi₂NiMnO₆薄膜的导电机制.     

PVDF薄膜的极化及其电性能研究

利用傅里叶红外光谱(FTIR)、示差扫描量热分析(DSC)、电滞回线和漏电流的分析,研究热极化和电晕极化对PVDF薄膜电性能的影响。结果表明,热极化和电晕极化都可以提高PVDF薄膜的铁电性能,但是不同的极化温度、极化电场强度和极化时间使得PVDF薄膜具有不同的漏电流性能。在强电场作用下,热极化的温度更高,时间更长,偶极电荷的沿电场取向更完全,α晶型向β晶型的转变更彻底,因此剩余极化值、结晶度和β晶型的含量均高于电晕极化后的薄膜。热极化中注入的空间电荷主要被PVDF的深阱俘获;而电晕极化过程中大量的空间电荷被聚合物材料的浅阱俘获。浅阱俘获的空间电荷稳定性要弱于深阱中的电荷,因此电晕极化的PVDF薄膜的漏电流需要更长的稳定时间。     

(Ba,Sr)TiO3铁电薄膜制备技术及其研究进展

(Ba,Sr)TiO3(简称BST)铁电薄膜较传统的铁电材料有高介电常数、高击穿场强、快响应速度、居里温度可调等优点,在DRAM、微波调节器等领域具有广阔的发展前景,是目前国际上新型功能材料研究的热点之一.通过对铁电薄膜及其制备技术研究新进展的综合评述,就BST的微观结构、性能及应用,深入分析BST铁电薄膜主要制备技术的优缺点,指出了目前铁电薄膜及其制备技术研究中应注意的问题.     

Ferroelectric properties of Bi<Subscript>4</Subscript>Zr<Subscript>0.5</Subscript>Ti<Subscript>2.5</Subscript>O<Subscript>12</Subscript> thin films prepared on LaNiO<Subscript>3</Subscript> bottom electrode by sol-gel method

The Bi4Zr0.5Ti2.5O12 (BZT) thin films were fabricated on the LaNiO3 bottom electrode using sol-gel method. The structure and morphology of the films were characterized using X-ray diffraction, AFM and SEM. The results show that the films have a perovskite phase and dense microstructure. The 2Pr and 2Vc of the Pt/BZT/LaNiO3 capacitor are 28.2 μC/cm2 and 14.7 V respectively at an applied voltage of 25 V. After the switching of 1×1010 cycles, the Pr value decreases to 87% of its pre-fatigue values. The dielectric constant (ε) and the dissipation factor (tanδ) of the BZT thin films are about 204 and 0.029 at 1 kHz, respectively. The films show good insulating behavior according to the test of leakage current. The clockwise C-V hysteresis curve observed shows that the Pt/BZT/LaNiO3 structure has a memory effect because of the BZT film's ferroelectric polarization.     

组合法制备Pb（ZrxTi（1-x））O3组分梯度薄膜

在无蒸馏和无惰性气氛保护的条件下,快速制备了用于组合合成Pb(ZrxTi1-x)O3薄膜的前驱溶液PT和PZ。采用组合法在Pt/Ti/SiO2/Si衬底上制备了一系列Pb(ZrxTi1-x)O3组分梯度薄膜。经XRD分析表明,薄膜具有钙钛矿结构,择优取向为(111)。SEM结果显示薄膜厚度在500nm左右。电滞回线的测试表明,下梯度薄膜PZT-654表现出良好的铁电性能,明显优于其它薄膜。PZT-654梯度薄膜的剩余极化强度Pr为38.4μC/cm2,矫顽场Ec为75.0kV/cm,有较大的极化偏移,Poffset为12.9μC/cm2,表现出梯度铁电薄膜的特性。     

Effect of La Doping on Microstructure and Ferroelectric Properties of Bi4Ti3O12 Thin Films Prepared by Sol-gel Method

The Bi4Ti3O12 and Bi3.25La0.75Ti3O12 thin films were prepared on the Pt/Ti/SiO2/Si substrate using the sol-gel method. The effect of La doping on the microstructure and ferroelectric properties of Bi4Ti3O12 films were investigated. Both the Bi4Ti3O12 and Bi3.25La0.75Ti3O12 thin films exhibited typical bismuth layered perovskite structure. The 2Pr (remanent polarization) value of Bi3.25La0.75Ti3O12 thin films is 18.6 Μc/cm2, which is much larger than that of Bi4Ti3O12 thin films. And the Bi3.25La0.75Ti3O12 films show fatigue-free behavior, while the Bi4Ti3O12 thin films exhibit the fatigue problem. The mechanism of improvement of La doping was discussed.     

Remarkable improvement of ferroelectric properties and leakage current in BiFeO<Subscript>3</Subscript> thin films by nd modification

Ferroelectric and leakage properties are important for ferroelectric applications. Pure and Nd-doped (x=0.05-0.20) BiFeO3 thin films were fabricated by sol-gel method on FTO substrates. The phase structure, surface morphology, leakage current, ferroelectric properties, and optical properties of BiFeO₃^- based thin films were investigated. The substitution of Nd³⁺ ions for the Bi3+ site converts the structure from rhombohedral to coexisting tetragonal and orthorhombic. Nd doping improves the crystallinity of BiFeO₃ thin films. The leakage current of Nd-doped BiFeO₃ decreases by two to three orders of magnitude compared with that of pure BiFeO₃. Among the samples, 15% Nd-doped BiFeO₃ exhibits the strongest ferroelectric polarization of 17.96 μC/cm². Furthermore, the absorption edges of Bi_1-xNd _x FeO₃ thin films show a slight red-shift after Nd doping.     

Effect of Bi content in precursor solutions on microstructure and ferroelectric properties of bismuth cerium titanate thin films

Sol-gel derived bismuth cerium titanate (BCT) thin films with different Bi contents in precursor solutions were deposited on the Pt/Ti/SiO₂/Si substrates. The effect of Bi content in the precursor solutions on the microstructure and ferroelectric properties of the films was investigated. It is found that with Bi content increasing from 90% to 110% of the nominal value in the precursor solutions, the dissipation factor and leakage current density of the BCT films obtained decrease, while the grain sizes, dielectric constant and remanent polarizations (2Pr) increase, and concurrently, a Bi-deficient phase of Bi₂Ti₂O₇ gradually disappears. The film prepared from solution with 110% of the nominal Bi content exhibits pure Bi-layered Aurivillius polycrystalline phase, and the 2Pr value and coercive field value are 67.1 μC/cm² and 299.7 kV/cm, respectively. Their dielectric constant and the dissipation factor are about 172 and 0.033 at 1 kHz, respectively. Moreover, this film shows no polarization fatigue after 4.46×10⁹ switching cycles. Supported by the Hubei Province Natural Science Foundation (Grant No. 2007ABA309)     

溶胶-凝胶法制备（Nd,Bi）_4Ti_3O_（12）铁电薄膜

采用溶胶-凝胶法在Pt/Ti/SiO2/Si基片上制备了（Nd,Bi）4Ti3O12薄膜。将薄膜于空气中分别进行每1层、每2层、每3层500℃预退火10 min,最后于氮气氛中680℃退火30 min。结果表明：预退火工艺对薄膜的结构和铁电性能都有影响：每一层预退火处理的薄膜具有较大的剩余极化值和最小的矫顽场（2Pr=47.8μC/cm2,2Ec=254 kV/cm）。所有薄膜都呈现良好的抗疲劳特性。     

Ferroelectric properties of Bi_(3.25)La_(0.75)Ti_(3)O_(12) thin films prepared by sol-gel method

The Bi3.25La0.75Ti3O12 thin films were fabricated on the Pt/Ti/SiO2/Si substrates using sol-gel method. The structure and morphology of the films were characterized us-ing X-ray diffraction and atomic force microscopy. The thin films showed a perov- skite phase and dense microstructure. The 2Pr and 2Vc of the Bi3.25La0.75Ti3O12 thin films annealed at 700℃ were 18.6 μC/cm2 and 4.1 V, respectively, under an applied voltage 10 V. After the switching of 1×1010 cycles, the Pr value decreased to 90% of its pre-fatigue values. The films showed good insulating behavior according to the test of leakage current. The dielectric constant and the dissipation factor of the Bi3.25La0.75Ti3O12 thin films were about 176 and 0.046 at 1 kHz, respectively.     

Influence of substrate metals on the crystal growth of AIN films

AIN films were deposited by reactive radio frequency (RF) sputtering on various bottom electrodes, such as Al, Ti, Mo, Au/Ti, and Pt/Ti. The effects of substrate metals on the orientation of A1N thin films were investigated. The results of X-ray diffraction, atomic force microscopy, and field emission scanning electron microscopy show that the orientation of A1N films depends on the kinds of substrate metals evidently. The differences of A1N films deposited on various metal electrodes are attributed to the differences in lattice mismatch and thermal expansion coefficient between the A1N material and substrate metals. The A1N film deposited on the Pt/Ti electrode reveals highly the c-axis orientation with well-textured columnar structure. The positive role of the Pt/Ti electrode in achieving the high-quality A1N films and high-performance film bulk acoustic resonator (FBAR) may be attributed to the smaller lattice mismatch as well as the similarity of thermal expansion coefficient between the deposited A1N material and the Pt/Ti electrode substrate.     

Influence of annealing time on the microstructure and properties of Pb(Zr0.53Ti0.47)O3 thin films

The PZT thin films were prepared on (111)- Pt/Ti/SiO2/Si substrates by sol-gel method, and lead acetate [Pb(CH3COO)2], zirconium nitrate [Zr(NO3)4] were used as raw materials. The X-ray diffractometer (XRD) and scanning electron microscopy (SEM) were used to characterize the phase structure and surface morphology of the films annealed at 650 ℃ but with different holding time. Ferroelectric and dielectric properties of the films were measured by the ferroelectric tester and the precision impedance analyzer, respectively. The PZT thin films were constructed with epoxy resin as a composite structure, and the damping properties of the composite were tested by dynamic mechanical analyzer (DMA). The results show that the films annealed for 90 minutes present a dense and compact crystal arrangement on the surface; moreover, the films also achieve their best electric quality. At the same time, the largest damping loss factor of the composite constructed with the 90 mins-annealed film shows peak value of 0.9, higher than the pure epoxy resin.     

Ferroelectric properties of Bi3.4Ho0.6Ti3O12 thin films prepared by sol-gel method

We have prepared the Ho-substituted bismuth titanate (Bi_3.4Ho_0.6Ti₃O₁₂, BHT) thin films on Pt/Ti/SiO₂/Si substrates using sol-gel method. The crystal structure and morphology of the films were characterized using X-ray diffraction and atomic force microscopy. The BHT film shows a single phase of Bi-layered Aurivillius structure and dense microstructure. The 2Pr and 2Ec of the 600-nm-thick BHT film were 38.4 μC/cm² and 376.1 kV/cm, respectively at applied electric field 500 kV/cm. The dielectric constant and dielectric loss are about 310 and 0.015 at a frequency of 1 MHz, respectively. The Pr value decreased to 93% of its pre-fatigue values after 4.46×10⁹ switching cycles at 1 MHz frenquency, and the BHT film shows good insulating behavior according to the test of leakage current. Supported by the Hubei Province Natural Science Foundation (Grant No. 2007ABA309)     

SrBi2Ta2O9/LaNiO3异质结薄膜的铁电、磁性能及漏电流研究

采用溶胶凝胶方法在Si（100）衬底上生长了SrBi2Ta2O9/LaNiO3（SBT/LNO）异质结薄膜,其中SrBi2Ta2O9薄膜呈高度（115）取向.测量了不同退火温度下异质结的电滞回线和漏电流密度,结果表明,700℃下退火的薄膜剩余极化值最高,漏电流最低,且表现出弱的室温铁磁行为.漏电流机理分析表明薄膜界面为欧姆接触.     

The domain structure and polarization retention properties of PT/PZT/PT ferroelectric thin film

The highly oriented perovskite-phase PT/PZT/PT ferroelectric thin film was pre- pared by sol-gel method. The domain structures and polarization retention proper- ties were investigated by scanning force microscopy. The amplitude and phase images of piezoresponse show complex various contrasts of dark, bright and gray. The complex variation of contrast in piezoresponse images results from the per- plexing orientation of grains and arrangement of domains in the ferroelectric films. The bright and dark areas in phase images correspond to top-to-bottom and bot- tom-to-top polarization oriented c-domain, respectively. The gray areas are c-domains with the polarization vector deviating from the direction normal to the film plane. The surface potential images of EFM are bright contrast, which is due to positive charges trapped on the film surface after being polarized by positive volt- age. And the brighter contrast is obtained from the higher electric field. The time-dependent surface potential images and line potential profiles show that the potential decays with time. And the decay in the region polarized by higher electric field is faster, especially at 15 min. This indicates that the polarization retention is related to the polarized electric field. Better retention properties may be obtained from a proper polarized electric field.     

异质结薄膜的铁电、磁性能及漏电流研究

采用溶胶凝胶方法在Si（100）衬底上生长了SrBi2Ta2O9/LaNiO3 (SBT/LNO)异质结薄膜,其中SrBi2Ta2O9薄膜呈高度（115）取向.测量了不同退火温度下异质结的电滞回线和漏电流密度,结果表明,700 ℃下退火的薄膜剩余极化值最高,漏电流最低,且表现出弱的室温铁磁行为.漏电流机理分析表明薄膜界面为欧姆接触.     

钙钛矿型铁电薄膜疲劳特性研究进展

针对铁电薄膜极化疲劳的问题,详细综述了其疲劳机理及其影响因素.给出了影响铁电薄膜疲劳的因素,该因素可分为内在因素和外在因素两大类.重点讨论了外在因素元素掺杂、电极、界面层优化、温度及气氛等的影响,并提出了相应的改善薄膜疲劳性能的措施.比较实用有效的方法是在金属电极和薄膜之间沉积一层与薄膜晶格参数接近的界面层.最后结合自身研究工作,指出建立界面层设计-微结构演变-疲劳性能之间的关系是我们以后重点关注的问题.