GaAs/AlGaAs多量子阱激光器

用国产的分子束外延设备生长出多量子阱激光器结构,在室温下,其宽接触阈电流密度为3000A/cm~2,质子轰击条形器件单管最佳阈值电流为128mA,单面连续输出功率可大于22mw,在一定注入范围内可单纵模工作,最高单面微分量子效率达34％,激射波长在8590～8640埃之间,远场光强分布呈单峰,在室温附近的特征温度T_o为202K.对外延材料和器件的初步研究表明,AlGaAs材料特别是掺杂的AlGaAs材料质量不理想是导致激光器阈电流密度不够低的可能原因.     

量子阱无序的窗口结构InGaAs/GaAs/AlGaAs量子阱激光器

对ＳｉＯ２薄膜在快速热退火条件下引起的空位诱导ＩｎＧａＡｓ／ＧａＡｓ应变量子阱无序和ＳｒＦ２薄膜抑制其量子阱无序的方法进行了实验研究。并将这两种技术的结合（称为选择区域量子阱无序技术）应用于脊形波导ＩｎＧａＡｓ／ＧａＡｓ／ＡｌＧａＡｓ应变量子阱激光器，研制出具有无吸收镜面的窗口结构脊形波导量子阱激光器。该结构３μｍ条宽激光器的最大输出功率为３４０ｍＷ，和没有窗口的同样结构的量子阱激光器相比，最大输出功率提高了３６％。在１００ｍＷ输出功率下，发射光谱中心波长为９７８ｎｍ，光谱半宽为１．２ｎｍ。平行和垂直方向远场发散角分别为７．２°和３０°     

CCTS结构GaAs/AlGaAs单量子阱双稳态激光器

本文报道了CaAs/AlGaAs单量子阱(SQW)双区共腔(CCTS)结构的双稳态激光器,给出了增益区和吸收区分别注入电流时的三端器件结构。并在脉冲工作下得到了双稳特性。     

低阈值电流密度INGaAs/GaAs/AlGaAs应变量子阱激光器

利用分子束外延技术，生长了极低阈值电流密度、低内损耗、高量子效率的InGaAs／GaAs／AlGaAs应变量子阱激光器．在腔长900μm时，80μm宽接触激光器阈值电流密度是125A／cm2，在腔长为2000μm时是113A／cm2，这样低的阈值电流密度是目前国内报道的最低值．激光器的内损耗和内量子效率分别是2cm－1和84％．     

量子阱激光器的阈值电流和外量子效率

地于半导体分别限制单量子阱激光器，为了降低阈值电流，提高外量子效率，分析和讨论了影响阈值电流和外量子效率的各种因素，并做了一定的数值计算，给出了量佳结构参数。     

量子阱半导体激光器发展动态

综述了近几年来国外在量子阱半导体激光器方面的开发现状，着重阐述了在提高器件性能方面获得低阈值电流，降低α参数和线宽的重要性。     

单模AlGaAs／GaAs脊形波导量子阱半导体激光器

本文报道用分子束外延设备研制梯度折射率分别限制式单量子阱AlGaAs/GaAs脊形波导半导体激光器。该激光器具有良好的性能,条宽5μm器件室温阈值电流23mA,线性连续输出单模激光功率大于15mW。     

具有线性GRIN结构GaAs/AlGaAs单量子阱激光器

采用ＭＯＣＶＤ 方法成功地研制了具有线性ＧＲＩＮ 结构ＧａＡｓ／ＡｌＧａＡｓ单量子阱激光器。该激光器的峰值波长为８１５～８２５ ｎｍ ,阈值电流为１３０ ｍ Ａ。工作电流在４８０ ｍ Ａ 时,单面连续输出光功率高达２００ ｍ Ｗ,且基本保持在单模工作状态。工作在９７０ ｍ Ａ 时,单面连续输出光功率为０．５ Ｗ。     

大功率量子阱远结半导体激光器

通过将下波导层掺杂为ｐ型,使半导体激光器的有源区与ｐｎ结分离,制作了大功率远结半导体激光器。该器件在老化期间表现出输出功率变大的趋势。理论分析表明,远结半导体激光器特殊的外延结构,决定了器件的阈值比正常器件的高,但是阈值受温度的影响较小,并且器件的退化机制转变为ｐｎ结的退化,这对于制作高可靠性、长寿命、低温度敏感性的半导体激光器具有重要意义。     

Electron mobility in a AlGaAs/GaAs/AlGaAs quantum well

An oscillatory dependence of the electron mobility on the quantum well (QW) thickness in a AlGaAs/GaAs/AlGaAs heterostructure with double-sided modulation doping has been observed experimentally. A steep decrease in mobility with increasing electron concentration in the QW is established. The conditions for an increase in mobility on introducing a thin barrier into the QW are determined. The first experimental observation of an increase in mobility by a factor of 1.3 in a QW of thickness L=26 nm upon introducing a thin (1–1.5 nm) AlAs barrier is reported.     

Threshold currents for AlGaAs quantum well lasers

The threshold currents for AlGaAs quantum well lasers are studied theoretically. The structure dependent gain coefficient is obtained by taking into account the electron distribution inLvalleys. Theoretical threshold current densities calculated using the gain coefficient agree well with reported experimental results for separate-confinement heterostructure lasers. A design procedure for low threshold current laser is elucidated. The lowest threshold currents are 570 and 53 μA per 1 μm stripe width for modified multiple quantum well lasers with 32 percent and 90 percent reflectivity facet mirrors, respectively.     

Room-temperature electroreflectance and reflectance of a GaAs/AlGaAs single quantum well structure

The room-temperature electroreflectance and reflectance of a GaAs/AlGaAs single quantum well (QW) structure are studied. An oscillatory behavior of the electroreflectance signal as a function of the thickness of the top AlGaAs barrier layer is observed. The experimental data are analyzed using a dielectric function of QWs and the transfer matrix method for multilayer systems. This analysis allows the determination of the parameters of the QW and the barrier layers.     

GaAs/AlGaAs太赫兹量子级联激光器的热分析

为研究太赫兹量子级联激光器(THz QCLs)中的热传输及有效散热方法,建立了二维/三维有限元热分析模型,模拟计算了GaAs/AlGaAs THz QCLs低温工作时的温度及热流分布;并讨论了源区结构参数、热沉材料及散热膜层对器件热传输的影响规律。研究结果表明,器件源区温度水平方向分布较均匀,垂直方向温差大,源区热量主要依靠热沉导出;减小源区厚度、增加腔长与减小脊宽均有利于促进热传导并降低源区温度;在器件顶部增加AlN薄膜具有显著的辅助散热效果,当薄膜厚度大于8 μm时,源区温降趋于缓慢。     

Ion beam milling-induced damage in AlGaAs/GaAs/AlGaAs single quantum well

Ion beam milling-induced damage in a 500 AA AlGaAs/40 AA GaAs/500 AA AlGaAs single quantum well structure was investigated using low temperature cathodoluminescence spectroscopy. The ion beam energy (500-1500 eV) dependence of luminescence intensity indicated that minimum damage is introduced at a beam energy of 500 eV. Most (80-85%) of the original luminescence intensity was recovered on annealing at 400 degrees C for 5 min.<>     

Intervalley scattering in GaAs/AlGaAs quantum wells and quantum cascade lasers

The results of simulations of Γ−X scattering in GaAs/AlGaAs quantum wells are presented, discussing the importance of the mole fraction, doping density, and lattice and electron temperatures in determining the scattering rates. A systematic study of Γ−X scattering in GaAs/Al_xGa_1−xAs heterostructures, using a single quantum well to determine the importance of well width, molar concentration x, lattice temperature, and doping density, has been performed. After this we consider a double quantum well to determine the role of intervalley scattering in the transport through single-layer heterostructures, i.e. Γ−X−Γ scattering compared with Γ−Γ scattering. Finally, we estimate the relative importance of intervalley scattering in a GaAs-based quantum-cascade laser device and compare it with other relevant scattering mechanisms important to describe carrier dynamics in the structure. Our simulations suggest that Γ−X scattering can be significant at room temperature but falls off rapidly at lower temperatures.     

单量子阱GaAs/AlGaAs半导体激光器

本文介绍了用分子束外延法制作的梯度折射率分别限制式单量子阱GaAs/AlGaAs半导体激光器。该器件具有较低的阈值电流密度和单模运转特性,连续输出功率可达55mw。     

GaAs/AlGaAs quantum well infrared photodetector with low noise

A novel kind of multi-quantum well infrared photodetector（QWlP） is presented. In the new structure device,a p-type contact layer has been grown on the top of the conventional structure of QWlP,then a small tunneling current is instead of the large compensatory current,which made the device low dark current and low noise characteristics. The measured result of dark current is consistent with the calculated result, and the noise of the new structure QWIP is decreased to one third of the conventional QWlP.     

Low-voltage phase modulation in GaAs/AlGaAs quantum well opticalwaveguides

Reports GaAs/AlGaAs quantum well waveguide phase modulators with high phase shift coefficients, as large as 520 degrees per V mm. By operating at wavelengths far below the bandedge and applying DC bias the authors achieve large electro-optic modulation with low absorption loss in device lengths on the order of 100 μm and drive voltages on the order of 1 V