共查询到20条相似文献,搜索用时 15 毫秒
1.
Silicon - In this study, we present an ambipolar conduction and RF stability performance for a Germanium Source Dual Halo Dual Dielectric Triple Material Surrounding Gate Tunnel FET... 相似文献
2.
Silicon - Here in this work, we demonstrate the concept of hybrid biosensor based on embedded cavity gate all around (GAA) junctionless field effect transistors (JLT) capable of sensing,... 相似文献
3.
Silicon - This paper reported a dielectric modulated (DM) Schottky Barrier (SB) TFET (DM SB TFET) as label free biosensor applications. In a proposed device, we have created a nanogap cavity within... 相似文献
5.
Silicon - The gate material work function engineering and hetero-dielectric engineering concepts are discussed in this paper to design a novel triple material DG Tunnel FET. The three different... 相似文献
6.
Silicon - Conventional biosensor designs are often vulnerable to issues like random dopant fluctuations (RDFs) and high thermal budgets due to their design and the device they are based on. The... 相似文献
7.
Silicon - In this paper, we investigate the effect of low K dielectric pocket on DC and analog/RF performance in dual material stack gate oxide double gate tunnel field effect transistor. For this,... 相似文献
8.
Silicon - This work exclusively illustrates dual-metal double gate Ge pocket tunnel field effect transistor (DMG-DG-Ge pocket TFET) with hetero gate dielectric. This structure includes dual-metal... 相似文献
9.
Silicon - In this article, a two dimensional (2-D) threshold voltage modeling based gate and channel engineering are developed analytically for Dual Halo Gate Stacked Triple Material Dual Gate... 相似文献
10.
Silicon - In this paper, to solve the problem of higher ambipolar leakage current (Iambipolar) of Dielectric Engineered (DE) Dopant Segregated (DG) Schottky Barrier (SB) MOSFET (DE DS SBMOS), we... 相似文献
11.
Silicon - In this paper, we propose and develop an analytical model of a Triple material double gate Tunnel Field Effect Transistor (TM-DG TFET) with hetero-dielectric gate oxide stack comprising... 相似文献
12.
Silicon - A unique Symmetrical Dual Metal Gate Extended on drain side with overlapped and underlapped three regions of Tunnel Field Effect Transistor (DG-ED-TFET) have been designed and... 相似文献
13.
Silicon - The present paper has proposed a dielectric modulated gate underlap dopingless tunnel field effect transistor (DM-GUD-TFET). In the proposed device, a cavity is introduced on side of the... 相似文献
14.
Silicon - In this article, a Heterogeneous Gate-Dielectric Nanosheet Tunnel Field Effect Transistor (HD-NSH-TFET) with three channels is investigated using the 3-D Visual TCAD simulator. The HD... 相似文献
15.
Silicon - Here, a split gate insulator-controlled Junction less FET also known as SG-DM-JLFET is investigated and proposed to recognize biomolecules such as uricase, biotin, or aminopropyl-... 相似文献
16.
Silicon - This paper investigates the RF Stability performance of the Germanium Source Dual Halo Dual Dielectric Triple Material Surrounding Gate Tunnel FET Ge(SRC)-DH-DD-TM-SG-TFET using 3D -... 相似文献
17.
Silicon - In this paper, a compact 2D analytical modelling of surface potential and simulation of Si-Ge hetero-junction Dual Material Gate Vertical t-shape T-FET is presented. In the proposed... 相似文献
18.
Silicon - In this paper, analytical modeling of a Dielectric Modulated Double Gate Field Effect Transistor (DM-DGFET) for biosensing application is presented with extensive data analysis. Firstly,... 相似文献
19.
Silicon - In this study dual material gate FinFET is designed to work as a dielectric modulated biosensor for detecting a variety of proteins. Surface potential, Electric field, Threshold voltage,... 相似文献
20.
An improved subthreshold analytical model of Dual Material Double Gate Junctionless Tunnel FET (DMDG JLTFET) with stacked / hetero-dielectric gate oxide structure is proposed. The stacked gate oxide structure comprises of Silicon-dioxide (SiO2) and Titanium Oxide (TiO2). The high-K gate stack engineered device overcomes the Short Channel Effects (SCEs) caused by the ultrathin silicon devices. The subthreshold analysis is carried out by solving a two-dimensional Poisson’s equation using Parabolic approximation method. These characteristics are analyzed against various device parameters. Also, the impact of different high-K gate oxide materials with SiO2 is also studied. A comparative analysis of short channel effects for DMDG TFET and DMDG JLTFET has been carried out. The results reveal that the proposed device provides better ION current, low leakage current and improved Transconductance-to-drain current ratio. Using TCAD Sentaurus device simulator, the subthreshold analytical model results have been simulated and verified with other TFET models. 相似文献
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