Behavior of N atoms after thermal nitridation of Si1 − xGex surface

Behavior of N atoms after thermal nitridation of Si_1 − xGe_x (100) surface in NH₃ atmosphere at 400 °C was investigated. X-ray photoelectron spectroscopy (XPS) results show that N atomic amount after nitridation tends to increase with increasing Ge fraction, and amount of N atoms bonded with Ge atoms decreases by heat treatment in H₂ at 400 °C. For nitrided Si_0.3Ge_0.7(100), the bonding between N and Si atoms forms Si₃N₄ structure whose amount is larger than that for nitrided Si(100). Angle-resolved XPS measurements show that there are N atoms not only at the outermost surface but also beneath surface especially in a deeper region around a few atomic layers for the nitrided Si(100), Si_0.3Ge_0.7(100) and Ge(100). From these results, it is suggested that penetration of N atoms through around a few atomic layers for Si, Si_0.3Ge_0.7 and Ge occurs during nitridation, and the N atoms for the nitrided Si_0.3Ge_0.7(100) dominantly form a Si₃N₄ structure which stably remains even during heat treatment in H₂ at 400 °C.     

Photoluminescence investigation of GaAs1 − xBix/GaAs heterostructures

In this work the impact of doped GaAs buffer and cap layers on the bismide photoluminescence (PL) spectra has been studied. For this study three types of heterostructures were grown: a thin GaAsBi layer deposited directly onto the nominally undoped GaAs buffer layer, a GaAsBi layer grown onto the GaAs:Be layer, and a GaAsBi layer deposited onto the GaAs:Be layer and capped with the GaAs:Be layer. It has been demonstrated that p-type doping of the GaAs buffer and cap layers is resulting in a significant increase of the PL intensity. This enhancement was explained by a better photoexcited electron and hole confinement in the GaAsBi layer.     

Low-temperature growth of Ge1 − xSnx thin films with strain control by molecular beam epitaxy

High-quality Ge_1 − xSn_x thin films on InGaAs buffer layers have been demonstrated using low-temperature growth by molecular beam epitaxy. X-ray diffraction and secondary ion mass spectrometry are used to determine the strain and Sn concentration. Up to 10.5% Sn has been incorporated into the Ge_1 − xSn_x thin film without Sn precipitation, as verified by transmission electron microscopy. Roughened surfaces are found for tensile strained Ge_1 − xSn_x layers.     

Deposition and characterization of pulsed direct current magnetron sputtered Al95.5Cr2.5Si2 (N1 − xOx) thin films

Aluminum rich oxynitride thin films were prepared using pulsed direct current (DC) magnetron sputtering from an Al_95.5Cr_2.5Si₂ (at.%) target. Two series of films were deposited at 400 °C and 650 °C by changing the O₂/(O₂ + N₂) ratio in the reactive gas from 0% (pure nitrides) to 100% (pure oxides). The films were investigated by X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), scanning electron microscopy (SEM) and nanoindentation. The results showed the existence of three different regions of microstructure and properties with respect to the oxygen concentration. For the samples deposited at 650 °C in the nitrogen rich region (O₂/(O₂ + N₂) ≤ 0.08), the formation of the h-AlN (002) and Al-N bond were confirmed by XRD and XPS measurements. The hardness of the films was around 30 GPa. In the intermediate region (0.08 ≤ O₂/(O₂ + N₂) ≤ 0.24), the presence of an amorphous structure and the shifting of the binding energies to lower values corresponding to non-stoichiometric compounds were observed and the hardness decreased to 12 GPa. The lowering of mechanical properties was attributed to the transition of the clean target to the reacted target under non-steady state deposition conditions. In the oxygen rich region (0.24 ≤ (O₂/(O₂ + N₂) ≤ 1), the existence of α-Al₂O₃-(113), α-Al₂O₃-(116) and Al-O bonds confirmed the domination of this phase in this region of deposition and the hardness increased again to 30-35 GPa. Films deposited at 400 °C showed the same behavior except in the oxygen rich region, where hardness remains low at about 12-14 GPa.     

Structural study of Si1 − xGex nanocrystals embedded in SiO2 films

We have investigated the structural properties of Si_1 − xGe_x nanocrystals formed in an amorphous SiO₂ matrix by magnetron sputtering deposition. The influence of deposition parameters on nanocrystal size, shape, arrangement and internal structure was examined by X-ray diffraction, Raman spectroscopy, grazing incidence small angle X-ray scattering, and high resolution transmission electron microscopy. We found conditions for the formation of spherical Si_1 − xGe_x nanocrystals with average sizes between 3 and 13 nm, uniformly distributed in the matrix. In addition we have shown the influence of deposition parameters on average nanocrystal size and Ge content x.     

Compositional dependence on the optical properties of amorphous As2 − xS3 − xSbx thin films

In this paper, we report results of the optical properties of thermally deposited As_2 − xS_3 − xSb_x thin films with x = 0.02, 0.07, 0.1 and 0.15. We have characterized the deposited films by Fourier Transform Infrared, Raman and X-ray photoelectron spectroscopy (XPS). The relationship between the structural and optical properties and the compositional variation were investigated. It was found that the optical bandgap decreases with increase in Sb content. The XPS core level spectra show a decrease in As₂S₃ percentage with increase in Sb content. This is confirmed from the shifting of the Raman peak from AsS₃ vibrational mode towards SbS₃ vibrational mode.     

Photoluminescence and Raman study of Cu2ZnSn(SexS1 − x)4 monograins for photovoltaic applications

The quaternary semiconductors Cu₂ZnSnSe₄ and Cu₂ZnSnS₄ have attracted a lot of attention as possible absorber materials for solar cells due to their direct bandgap and high absorption coefficient (> 10⁴ cm⁻¹). In this study we investigate the optical properties of Cu₂ZnSn(Se_xS_1 − x)₄ monograin powders that were synthesized from binary compounds in the liquid phase of potassium iodide (KI) flux materials in evacuated quartz ampoules. Radiative recombination processes in Cu₂ZnSn(Se_xS_1 − x)₄ monograins were studied by using low-temperature photoluminescence (PL) spectroscopy. A continuous shift from 1.3 eV to 0.95 eV of the PL emission peak position with increasing Se concentration was observed indicating the narrowing of the bandgap of the solid solutions. Recombination mechanisms responsible for the PL emission are discussed. Vibrational properties of Cu₂ZnSn(Se_xS_1 − x)₄ monograins were studied by using micro-Raman spectroscopy. The frequencies of the optical modes in the given materials were detected and the bimodal behaviour of the A₁ Raman modes of Cu₂ZnSnSe₄ and Cu₂ZnSnS₄ is established.     

Instantaneous preparation of CuIn(S1 − x, Sex)2 films by means of sparks using microwave irradiation

CuIn(S_1 − x,Se_x)₂ (CISSe) films aimed at flexible solar cells were directly prepared on Ti foils from elemental In, Cu, S, and Se particle precursor using microwave irradiation. The formation of the CISSe phase was deduced from X-ray diffraction (XRD) patterns. The (112) peaks of CISSe were well defined and the lattice constants increased in direct proportion to the S/(S + Se) ratio almost satisfying Vegard's law. In particular, CuInSe₂ was formed in the desired chalcopyrite lattice as indicated by the presence of (101), (103) and (211) peaks in the XRD pattern. Porous surfaces and formation of by-products were avoided by employing an evaporated In and Cu films instead of In and Cu particles.     

Magnetic properties and microstructures of single-layered Fe100 − xPtx films deposited onto heated substrates

The single-layered Fe_100 − xPt_x films of 30 nm thick with Pt contents (x) of 35-57 at.% are deposited on heated Si (100) substrate at a temperature (Ts) of 620 °C by magnetron co-sputtering. When the Pt content in the Fe-Pt alloy film is 35 at.%, the value of in-plane coercivity (Hc_//) is close to perpendicular coercivity (Hc_⊥) and both values are about 800 kA/m. The FePt films exhibit perpendicular magnetic anisotropy when the Pt content increases to the values of between 45 and 51 at.%. The perpendicular coercivity, saturation magnetization (Ms) and perpendicular squareness (S_⊥) for Fe₅₄Pt₄₆ film are as high as 1113 kA/m, 0.594 Wb/m² and 0.96, respectively. These magnetic properties reveal its significant potential as perpendicular magnetic recording media. Upon further increasing the Pt content to 57 at.%, the coercivity of the Fe-Pt film decreases drastically to below 230 kA/m and tends to be closer to in-plane magnetic anisotropy.     

A facile method to immobilize ZnxCd1 − xS nanocrystals on graphene nanoribbons

In this paper, Zn_xCd_1 − xS nanocrystals (NCs) were directly immobilized on graphene nanoribbons (NRs) by a facile one-step reaction. During the reaction, the formation of NCs and the reduction of graphene oxide to graphene NRs occurred simultaneously and the value of x could be adjusted by controlling the molar ratio of Zn and Cd precursors. The facts were confirmed by X-ray diffraction (XRD), transmission electron microscopy (TEM), and Fourier transform infrared (FT-IR). Moreover, Ultraviolet-visible (UV-vis) absorption spectroscopy data indicate that the absorbance of the nanocomposites can be successfully tuned from 319 to 583 nm, making them a great promise for wide potential applications in optoelectronics.     

Electrical, optical and surface properties of P2S5/(NH4)2Sx+ Se-treated doped-channel field-effect transistors with double etch-stop layers

This work describes doped-channel field-effect transistors (DCFETs), featuring both low-high doped-channels and double AlAs etch-stop layers used in a selective etch recessed-gate process. A developed highly selective wet etching process is applied as a gate-recess technique to fabricate DCFETs. Selective wet etching using citric acid/H₂O₂/NH₄OH/H₂O solutions in conjunction with double thin AlAs etch-stop layers is a reasonably simple, safe, and reliable process for gate recessing in the fabrication of the DCFETs herein. Surface passivation using P₂S₅/(NH₄)₂S_x+ Se on GaAs Schottky barrier diodes, formed by Pt/Au contacts, is examined for the first time and the results are compared with those of unpassivated devices. For the passivated Pt/Au gate device, the two-terminal gate-drain breakdown (source floating) at − 1 mA/mm is 17 V, and the device provides an excellent combination of transconductance and output current. The X-ray photoelectron spectroscopy, secondary ion mass spectrometry, and photoluminescence results are highly consistent with the Schottky barrier measurements and the device performance.     

Effect of annealing temperature on magnetic property of Si1 − xCrx thin films

Polycrystalline Si_1 − xCr_x thin films have been prepared by magnetron sputtering followed by rapid thermal annealing (RTA) for crystallization. RTA was performed at 800 °C for 5 min, 1200 °C for 30 s and 1200 °C for 2 min, in a N₂ flow. The magnetic hysteresis loops were observed at room temperature in all the samples except for RTA at 800 °C for 5 min, and the annealing caused the decrease of saturation magnetization relative to the as-grown film. X-ray diffraction spectra and Raman spectra showed that the annealing process lead the deposited amorphous film to be crystallized and CrSi₂ phase formed. The magnetism of the films was determined by the competition between crystallinity and precipitation of diamagnetic CrSi₂ phase.     

Enhancing epitaxial SixC1 − x deposition by adding Ge

In this work, a possible way to enhance the epitaxial growth of metastable, tensile strained Si_xC_1 − x layers by the addition of germanium is demonstrated. During ultra-high vacuum chemical vapor deposition growth, the co-mixing of germane to the Si_xC_1 − x precursors was found to enhance the growth rate by a factor of ~ 3 compared to the growth of pure Si_xC_1 − x. Furthermore, an increase of the amount of substitutional incorporated carbon has been observed. Selective Si_xGe_yC_{1 − x − y} deposition processes utilizing a cyclic deposition were developed to integrate epitaxial tensile strained layers into source and drain areas of n-channel transistors.     

An artificial nonradiative recombination center model created by use of a Si1 − xGex/Si quantum-well-inserted pseudomorphic superlattice

An attempt is made to mimic a system under the influence of nonradiative recombination (NR) by use of a Si_1 − xGe_x quantum well (QW) embedded in a Si_1 − xGe_x/Si strained-layer superlattice. Carrier transfer mediates the coupling between the first miniband of superlattice barrier and QW ground state, which is useful in setting up an artificial NR center based only on radiative channels. Steady-state and transient photoluminescence (PL) reproduces spectroscopic features shared by NR systems at large such as quadratic dependence of PL intensity on excitation power and prolonged decay time at increased pumping, which are quite opposite to radiative recombination.     

Fabrication and characterization of all-oxide heterojunction p-CuAlO2 + x/n-Zn1 − xAlxO transparent diode for potential application in “invisible electronics”

Transparent p-n heterojunction diodes have been fabricated by p-type copper aluminum oxide (p-CuAlO_2 + x) and n-type aluminum doped zinc oxide (n-Zn_1 − xAl_xO) thin films on glass substrates. The n-layers are deposited by sol-gel-dip-coating process from zinc acetate dihydrate (Zn(CH₃COO)₂·2H₂O) and aluminum nitrate (Al(NO₃)₃·9H₂O). Al concentration in the nominal solution is taken as 1.62 at %. P-layers are deposited onto the ZnO:Al-coated glass substrates by direct current sputtering process from a prefabricated CuAlO₂ sintered target. The sputtering is performed in oxygen-diluted argon atmosphere with an elevated substrate temperature. Post-deposition oxygen annealing induces excess oxygen within the p-CuAlO_2 + x films, which in turn enhances p-type conductivity of the layers. The device characterization shows rectifying current-voltage characteristics, confirming the proper formation of the p-n junction. The turn-on voltage is obtained around 0.8 V, with a forward-to-reverse current ratio around 30 at ± 4 V. The diode structure has a total thickness of 1.1 μm and the optical transmission spectra of the diode show almost 60% transmittance in the visible region, indicating its potential application in ‘invisible electronics’. Also the cost-effective procedures enable the large-scale production of these transparent diodes for diverse device applications.     

Performance of CuIn1 − xGaxSe2/(PVD)In2S3 solar cells versus gallium content

The present work studies the influence of the Ga content (x = Ga / (Ga + In)) in the absorber on the solar cell performance for devices using (PVD)In₂S₃-based buffers. Input to the hypothesis of the relative conduction band positions can be found in the evolution of the device parameters with x. For experiments with x between 0 and 0.5 devices using (PVD)In₂S₃-based buffers are compared to reference devices using (CBD)CdS. Both buffers give similar cell characteristics for narrow band gap absorbers, typically E_gCIGSe < 1.1 eV. However, the parameters of the cells buffered with (PVD)In₂S₃ are degraded when the absorber gap is widened whereas (CBD)CdS reference devices are only slightly affected. Consequently, the solar cell efficiency is similar for both buffer layers at the lower x values and increases with x only in the case of (CBD)CdS. These evolutions are coherent with the existence of a conduction band cliff at the CIGSe/(PVD)In₂S₃ interface.     

Characterization of MgxZn1 − xO thin films grown on sapphire substrates by metalorganic chemical vapor deposition

Wurtzite-structure Mg_xZn_1 − xO materials with five different compositions of x from 0 to 0.14 were grown on sapphire substrates by metalorganic chemical vapor deposition. It was found that increasing Mg content in the Mg_xZn_1 − xO not only increased the band gap energy of the film but was also beneficial to the epitaxial growth of p-type Mg_xZn_1 − xO without using any doping sources. In addition, the combined ultraviolet photoluminescence (PL) and Raman scattering spectra were measured with PL-Raman signals obtained together, showing a blue-shift of PL band and variation of resonant Raman multi-order longitudinal optical phonon modes with an increase of Mg content.     

Basic properties of Sr1 − xBaxSi2

Basic properties, such as the phase relationship, crystal structure, and energy gap E_g, have been investigated in Sr-rich Sr_1 − xBa_xSi₂. Sr_1 − xBa_xSi₂ (0 ≤ x ≤ 1.0) has two phases: one with the SrSi₂-type structure and another with the BaSi₂-type structure. The SrSi₂ phase exists at x ranging from 0 to 0.13, and the BaSi₂ phase exists at x ranging from 0.24 to 1.0. The volume increases with x in both the SrSi₂ and BaSi₂ phases. A volume jump of 13.7% appears at the structural phase transition from the SrSi₂ phase to the BaSi₂ phase. E_g increases with x in SrSi₂-phase Sr_1 − xBa_xSi₂ but E_g decreases with x in the BaSi₂-phase Sr_1 − xBa_xSi₂. In Sr-rich BaSi₂-phase Sr_1 − xBa_xSi₂, Ba atoms at a specific crystallographic site, the A1 site, are preferentially substituted by Sr atoms, as well as in Ba-rich BaSi₂-phase Sr_1 − xBa_xSi₂.     

High-temperature thermoelectric properties of non-stoichiometric Ag1 − xInTe2 with chalcopyrite structure

Our group has revealed that AgGaTe₂ with the chalcopyrite structure exhibits relatively high thermoelectric (TE) figure of merit (ZT) when it has a deviation of Ag content from the stoichiometry. The maximum ZT value of 0.77 was obtained for Ag_0.95GaTe₂ at 850 K. On the other hand, the TE properties of AgInTe₂ with the same chalcopyrite structure with AgGaTe₂ have not been investigated. In the present study, we examined the high-temperature TE properties of AgInTe₂ with the composition of Ag_1 − xInTe₂ (x = 0, 0.01, 0.03, and 0.05). The deviation of Ag content from stoichiometry slightly enhanced the ZT value. The maximum ZT value was 0.07 at 600 K obtained in the samples of x = 0.03 and 0.05.     

Tuning the optical properties of alloyed CdSexS1 − x nanoparticles by changing the constituent stoichiometry

The spherical particles CdSe_xS_1 − x with 30-80 nm in radius have been successfully prepared by the hydrothermal reaction at 200 °C. The structure characterization which has been carried out using X-ray diffraction (XRD) shows hexagonal crystal structure. Novel properties have been observed via UV-visual absorption spectra and photoluminescence (PL) spectra. The absorption shoulder and the luminescence emission peaks have been tuned by changing the mole ratio of Se in the CdSe_xS_1 − x samples.