Ge/Si半导体量子点的应变分布与平衡形态

基于各向异性弹性理论的有限元方法，研究了金字塔形自组织Ge/Si半导体量子点应变能随高宽比变化的规律：系统的应变能随着高宽比的增大而逐渐减小.并通过自由能(应变能与表面能之和)讨论了量子点的平衡形态.结果表明，对于固定体积的量子点，存在一个高宽比值，称之为平衡高宽比，使得系统的自由能最低.同时，还给出了量子点的应力、应变、流体静应变及双轴应变分布.这些可以作为阐明应变自组织量子点实验的理论基础. 关键词： 量子点 应变分布 自由能 平衡形态     

有限元法分析不同形状量子点的应变能及弛豫度变化

利用有限元方法研究了不同形状量子点的应变能量分布和弛豫度随着高宽比变化的规律.分析了量子点间距和量子点形状对量子点应变弛豫的影响,定量地讨论了量子点的弛豫度与量子点形状之间的关系.计算结果表明,在不考虑表面能的情况下,当量子点高宽比增加时,弛豫度上升,并且发现平顶金字塔形量子点最先达到稳定;岛间距增大时,量子点内应变能下降,其中立方体形量子点应变能下降最快.研究表明,量子点的弛豫度可以成为控制量子点成岛形状的重要依据. 关键词： 量子点 弛豫度     

埋置量子点应力分布的有限元分析

通过衬底材料和外延材料的交替生长方式制备出多层排列的自组装量子点超晶格结构.这些埋置量子点的应力/应变场影响着它们的光电性能、压电性能以及力学稳定性.基于各向异性弹性理论的有限元方法,研究了埋置金字塔形应变自组织Ge/Si半导体量子点的应力/应变分布以及流体静应变和双轴应变分布,并与非埋置量子点的应力/应变分布做了比较,指出了它们之间的异同以及覆盖层对量子点应力/应变分布的影响. 关键词： 量子点 应力分布 应变分布     

低维半导体材料应变分布

在各向同性弹性理论的假设下，探讨了理想简单化的二维、一维与零维半导体材料量子阱、量子线与量子点的应力和应变分布规律，并讨论了它们应力、应变与应变能密度分布之间的差异.结果有助于定性理解更复杂形状结构的低维半导体材料的应力、应变及应变能分布. 关键词： 低维材料 应变分布 量子阱 量子线 量子点     

用格林函数法计算量子点中的应变分布

自组装量子点材料作为一种新型的光电材料无论在理论和实际应用都成为当今物理学界的研 究热点.由GaAs包围的InAs小岛，由于较大的晶格失配（≈-0.067），应变效应在量子点 的 形成过程中起主导作用.大部分计算量子点结构应变分布的方法都是基于数值解法，需要大 量的计算工作.给出用格林函数法推导各种常见形状量子点应变分布的解析表达式详细过程，讨论了弹性各向异性和形状各向异性对量子点应变分布的影响程度.结果表明对于不 同形状量子点结构中主要部分的应变分布都是相似的，流体静压变部分的特征值随量子点形状的变化不 关键词： 自组装量子点 格林函数 应变分布     

基于连续弹性理论分析量子线线宽对应变分布和带隙的影响

基于连续弹性理论分别采用数值方法和格林函数法讨论了量子线的应变分布.格林函数法可以得到应变分布的解析表示式,对规则形状的量子线的应变分布计算比较方便;连续弹性理论采取的是数值解法,结果精度不如格林函数法,但是能方便计算任意形状量子线的应变分布情况, 并可以考虑不同材料的弹性常数的影响.文章还具体讨论了量子线线宽对应变分布和带隙的影响,结果表明：沿线宽方向,应变的绝对值逐渐减小,并随线宽的增加而变大;带隙则随线宽的减小而增大. 关键词： 连续弹性理论 格林函数法 应变 带隙     

带隙法测定SiGe/Si材料的应变状态

从固体模型理论的结果出发，计算了生长于Si（100）衬底上x值小于085的Si_1-xGe_x合金材料（能带结构为类Si结构）的间接带隙与应变的关系，结 果表明，应变的S iGe材料的带隙和完全弛豫状态下材料的带隙之差与应变呈线性关系.基于这一结果，提出了 用测量带隙来间接测定SiGe/Si应变状态的方法.用带隙法和x射线双晶衍射法测量了不同应 变状态下的SiGe/Si多量子阱材料的应变弛豫度，两者可以较好的符合，表明带隙法测量SiG e应变弛豫度是可行的. 关键词： SiGe合金 应变 带隙     

应变补偿层对量子点生长影响的理论研究

量子点的光学特性与量子点的大小均匀性、密度、内部应变以及隔离层的厚度等有密切关系.文中从理论角度定量研究了GaNXAs1-X应变补偿层对InAs/GaAs量子点生长质量的改善作用,分析了应变补偿层对隔离层厚度减小的作用.讨论了应变补偿层的补偿位置和补偿层N组分X对量子点生长时局部应变和体系应变的补偿作用.分析了应变补偿层对体系应变的减少作用,并计算了相邻层量子点的垂直对准概率.研究结果对实验中应变补偿的优化和高质量量子点阵列的生长实现提供了理论依据.     

应变Si价带色散关系模型

基于K.P理论框架,通过引入应变哈密顿微扰项,详细推导并建立了应变Si的价带色散关系模型.所得模型适用于任意晶向弛豫Si_1－xGe_x(0≤x≤0.6)衬底上生长的应变Si,并且,通过该模型可以获取任意K矢方向的应变Si价带结构及空穴有效质量,对器件研究设计可提供有价值的参考. 关键词： 应变Si K.P理论 色散关系     

压强对GaSb/GaAs量子点形貌各向异性的影响

采用低压金属有机物化学气相沉积(LP-MOCVD)技术在Ga As(001)衬底上制备Ga Sb量子点,研究了反应室压强对改善Ga Sb/Ga As量子点形貌各向异性的影响。通过Sb表面处理方法,在Ga As衬底上形成低表面能的Sb-Sb浮层,实现以界面失配(IMF)生长模式对Ga Sb量子点诱导生长。用原子力显微镜(AFM)对各样品的量子点形貌进行了表征,结果表明Ga Sb量子点形貌各向异性明显且沿[110]方向拉长。在压强条件为10 k Pa时,IMF生长模式导致不对称岛的长宽比大于3,由于低能量(111)侧面的存在,Ga Sb量子点优先沿[110]方向生长而不是与之垂直的[110]方向。压强降低至4 k Pa时量子点密度增大为8. 3×109cm-2,量子点形貌转变为对称的半球形且长宽比约为1。低的压强降低了吸附原子的扩散激活能从而增大了扩散长度,可以有效改善Ga Sb量子点的各向异性。     

The strain relaxation of InAs/GaAs self-organized quantum dot

This paper presents a detailed analysis of the dependence of degree of strain relaxation of the self-organized InAs/GaAs quantum dot on the geometrical parameters. Differently shaped quantum dots arranged with different transverse periods are simulated in this analysis. It investigates the total residual strain energy that stored in the quantum dot and the substrate for all kinds of quantum dots with the same volume, as well as the dependence on both the aspect ratio and transverse period. The calculated results show that when the transverse period is larger than two times the base of the quantum dots, the influence of transverse periods can be ignored. The larger aspect ratio will lead more efficient strain relaxation. The larger angle between the faces and the substrate will lead more efficient strain relaxation. The obtained results can help to understand the shape transition mechanism during the epitaxial growth from the viewpoint of energy, because the strain relaxation is the main driving force of the quantum dot's self-organization.     

Influences of lattice mismatches on equilibrium morphologies and strain distributions of quantum dots

The morphologies of quantum dots and distributions of stresses in and around quantum dots structures have a significant effect on photoelectric properties and electronic structures. Optical and electronic devices of different efficiencies based on quantum dots can be manufactured by choosing self-assembly of different materials to control epitaxial growth. In this article we investigate the equilibrium morphologies and the strain distributions of self-assembled pyramidal semiconductor quantum dots in Stranski-Krastanov growth mode based on the finite element method of the anisotropic theory of elasticity. We also give the equilibrium morphologies and the distribution of the stress and the strain, the hydrostatic strain and the biaxial strain for different lattice mismatched quantum dots. The results can serve as a basis for interpretation of experiments.     

Raman study of Si–Ge intermixing in Ge quantum rings and dots

The Ge/Si (1 0 0) nanostructures have been studied by atomic force microscopy (AFM) and Micro Raman optical spectroscopy. Two layers of Ge of total thickness 0.75 nm and Si cap with thickness 2.5 nm were deposited by the method of molecular beam epitaxy at the temperature range 640–700 °C. AFM shows both quantum dots and ring-shape Ge nanostructures. From the analysis of the intensity and energy shift of the Raman signal we have found that the average concentration of Ge decreases considerably from 44% to 27%, when the growth temperature increases, whereas the degree of strain relaxation remains roughly the same. This allows us to conclude that intermixing is a dominating mechanism for strain relaxation in processes of transformation of Ge quantum dots to quantum rings.     

Quantum dots in quantum well structures

Recent progress toward fabricating and characterizing quantum dots in III–V quantum well structures is reviewed. Quantum dots made by use of lithography and etching, including deep-etched, barrier-modulated, strain-induced and interdiffused quantum dots, are described. Quantum dots fabricated by growth, including natural quantum dots, dots on patterned substrates, and self-assembled dots, are discussed. Dot sizes and uniformity, energy-level splittings, and luminescence efficiencies that are now being achieved are discussed. The status of key issues, such as the energy relaxation in quantum dots, is mentioned.     

Hole states in artificial molecules formed by vertically coupled Ge/Si quantum dots

In the tight binding approximation, the spatial configuration of the ground state and the binding energy of a hole in a “diatomic” artificial molecule formed by vertically coupled Ge/Si(001) quantum dots are studied. The inhomogeneous spatial distribution of elastic strain arising in the medium due to the lattice mismatch between Ge and Si is taken into account. The strain is calculated using the valence-force-field model with a Keating interatomic potential. The formation of the hole states is shown to be determined by the competition of two processes: the appearance of a common hole due to the overlapping of “atomic” wavefunctions and the appearance of asymmetry in the potential energy of a hole in the two quantum dots because of the superposition of the elastic strain fields from the vertically aligned Ge nanoclusters. When the thickness of the Si layer separating the Ge dots (t _Si) is greater than 2.3 nm, the binding energy of a hole in the ground state of the two-dot system proves to be lower than the ionization energy of a single quantum dot because of the partial elastic stress relaxation due to the coupling of the quantum dots and due to the decrease in the depth of the potential well for holes. For the values of the parameter t _Si, an intermediate region is revealed, where the covalent molecular bond fails and the hole is localized in one of the two quantum dots, namely, in the dot characterized by the highest strain values.