AlxGa1-xAs/AlyGa1-yAs微腔中的激子吸收增强效应

文章采用Al_xGa_1-xAs/Al_yGa_1-yAs微腔结构,研究了微腔中激子的吸收行为,在室温下观察到了激子吸收的增强效应,激子的峰值吸收强度是自由空间中激子吸收强度的2,6倍;我们从激子与光波场相互作用和腔中模函数的分布建立了计算.激子先吸收的模型,文中给出的微腔结构的数值计算表明激子的吸收增强与实验结果相一致;数值计算表明,微腔中激子吸收的强弱不仅与上、下两腔镜的反射率和腔长有关,而且还取决于量子阱在腔中的位置.     

SiC1-xGex/SiC 异质结光电二极管特性的研究

使用二维器件模拟软件Medici, 对SiC_1-xGe_x/SiC异质结的光电特性进行了模拟.设计了N型重掺杂SiC层的厚度为1 μm, P型轻掺杂SiC_1-xGe_x层厚为0.4 μm, 二者之间形成突变异质结.在反向偏压3 V、光强度为 0.23 W/cm²的条件下, p-n+ SiC_0.8Ge_0.2/SiC和p-n+ SiC_0.7Ge_0.3/SiC敏感波长λ分别可以达到0.64 μm和0.7 μm, 光电流分别为7.765×10^－7 A/μm和7.438×10^－7 A/μm; 为了进一步提高SiC_1-xGe_x/SiC 异质结的光电流, 我们把p-n+两层结构改进为p-i-n三层结构.在同样的偏压、光照条件下, p-i-n SiC_0.8Ge_0.2/SiC和p-i-n SiC_0.7Ge_0.3/SiC的光电流分别达到1.6734×10－6 A/μm和1.844×10－6 A/μm.     

InxGa1－xAs缓冲层上InyGa1－yAs/(Al)Ga

本文中,发现在In_xGa_1-xAs缓冲层上非故意掺杂的In_yGa_1-yAs/(Al)GaAs超晶格样品中存在着两个互相反向的自建电场区,一个位于样品表面,另一个位于In_xGa_1-xAs缓冲层和超晶格界面。据此,合理地解释了样品的光伏测试结果,并对此类样品的MOCVD生长工艺给予指导。     

Composition Dependence of Surface Phonon Polariton Mode in Wurtzite InxGa1-xN (0≤x≤1) Ternary Alloy

We present a theoretical study on the composition dependence of the surface phonon polariton (SPP) mode in wurtzite structure α-In_xGa_1-xN ternary alloy over the whole composition range. The SPP modes are obtained by the theoretical simulations by means of an anisotropy model. The results reveal that the SPP mode of α-In_xGa_1-xN semiconductors exhibits one-mode behaviour. From these data, composition dependence of the SPP mode with bowing parameter of -28.9cm^-1 is theoretically obtained..     

1.3μm场助TE光阴极In1-xGaxAsyP1-y/InP的能带计算及外延层的设计

本文首先简述了1.3μm场助TE光阴极InP(衬底)/In_1-xGa_xAs_yP_1-y(光吸收层)/InP(发射层)/Ag/CsO的工作原理,并对其能带结构进行了计算,得到了In_1-xGa_xAs_yP_1-y(光吸收层)/InP(发射层)的势垒高度、掺杂、InP发射层厚度、组份、渐变区宽度,偏压及耗尽层宽度间的定量关系。并由此出发,对光阴极各参数的设计进行了分析讨论。     

热电材料PbTe1-xSex的高压制备及电学性能研究

 利用高温高压技术,制备了热电材料PbTe和PbSe的固溶体合金PbTe_1-xSe_x,在室温下对其结构及电学性质进行了研究。X射线衍射（XRD）测试结果表明：PbTe_1-xSe_x具有NaCl结构;晶格常数随着Se含量（x）的增加而减小;PbTe_1-xSe_x的电阻率和Seebeck系数的绝对值随x的增大而减小;功率因子随x的增大先增大而后减小,当x=0.1时功率因子最高,达到21.7 μW/(cm·K²),比相同条件下制备的PbTe高20%。     

Ⅰ类和Ⅱ类准周期半导体超晶格的电子子带和波函数

本文将包迹函数近似推广用于计算有理数近似下,垂直于超晶格轴的波矢K_⊥不等于零时,准周期半导体超晶格(QSS)的电子子带和波函数,对K_⊥=0的情形,分别计算了Ⅰ类的GaAs/Al_xGa_1-xAs和Ⅱ类的InAs/GaSb QSS的电子子带和波函数,直至代序数m=9和6。对于价带对导带影响强的InAs/GaSb QSS,分别计算了m=5和6时电子子带随K_⊥的变化关系。并提出了利用本文结果计算Ⅰ类的GaAs/Al_xGa_1-xAs QSS带间集体激发的具体方法。     

富Sb状态下GaSb/AlGaSb异质结的液相外延生长

本文分析了以往在制作GaSb/Al_xGa_1-xSb结构雪崩光电二极管(APD)中存在的问题,提出了在富Sb状态下进行液相外延(LPE)生长GaSb/AlGaSb异质结APD的方法。经过多次试验获得了在富Sb状态下Al-Ga-Sb三元系相图数据,并且在富Sb状态下液相外延生长出了优良的AlGaSb外延层。     

GaAlAs低温液相外延研究

本文概述了GaAlAs低温液相外延技术在制作超薄外延层,包括量子阶材料中的工作;报道了在700℃和600℃下用液相外延技术生长的GaAlAs层厚度与生长时间的关系,以及在600℃下Ga_1-xAl_xAs外延层中工值与液相中Al含量的关系的实验结果;并且用扫描电镜测得在600℃下10s时间生长的Ga_0.9Al_0.1As层厚为30nm.     

Ti1-xCexO2体系纳米粉体的制备及其结构表征

 采用溶胶凝胶法制备了纳米Ti_1-xCe_xO₂系列样品。利用X射线衍射（XRD）、透射电子显微镜（TEM）、高分辨电子显微镜（HRTEM）对纳米Ti_1-xCe_xO₂系列样品颗粒尺寸、形貌以及固溶区范围和物相组成进行了研究；同时，采用Rietveld结构精修的方法研究了Ce的不同掺杂量对TiO₂晶体结构的影响。实验结果表明，Ce掺杂TiO₂能够形成Ti_1-xCe_xO₂固溶体，Ti_1-xCe_xO₂的固溶区范围在x=0～0.06之间，Ti_1-xCe_xO₂的晶粒度为5～10 nm，平均颗粒粒度约35 nm，且粒度均匀。     

Strain-confined wires and dots at a GaAs/AlxGa1-xAs interface

We have observed lateral exciton confinement at the GaAs/Al_xGa_1-xAs interface. The confinement is achieved in both the growth and lateral directions by the strain potential under an amorphous carbon stressor. The potential welt varies from 15 meV to 40 meV for different stressor sizes. We have also made transient measurements on this structure, which show efficient exciton transfer from the bulk GaAs to the confined region.     

Near-surface and bulk deep trap states in AlxGa1-xAs/GaAs

We have measured the field-effect deep-level transient spectra of Al_xGa_1-xAs/GaAs (where x=0.385) at different reverse-bias fields to probe the near-surface deep trap and bulk deep trap states. In the temperature range 77 to 380 K and for a reverse-bias field -1 to -5 V/cm, four major deep traps were identified. The results of our investigation indicate a distinct effect on the deep-level spectra. Three of the deep trap states E1, E2 and E3 showed definite peak enhancement with the applied reverse-bias field and were identified as bulk deep trap states. The fourth deep trap state E4 was a very weak deep trap state and it showed a decrease of the peak height with the applied reverse-bias field. It was labeled as a near-surface deep trap state. PACS 73.60.Fw     

1MeV Si+衬底加温注入Al0.3Ga0.7As/GaAs超晶格和GaAs的晶格损伤研究

用卢瑟福背散射／沟道技术研究了１ＭｅＶＳｉ⁺在衬底加温和室温下以不同剂量注入Ａｌ_0.3Ｇ_0.7Ａｓ／ＧａＡｓ超晶格和ＧａＡｓ后的晶格损伤。在衬底加温下，观察到Ａｌ_0.3Ｇａ_0.7Ａｓ／ＧａＡｓ超晶格和ＧａＡｓ都存在一个动态退火速率与缺陷产生速率相平衡的剂量范围，以及两种速率失去平衡的临界剂量。超晶格比ＧａＡｓ更难以损伤，并且它的两种速率失去平衡的临界剂量也大于ＧａＡｓ中的相应临界剂量，用热尖峰与碰撞模型解释了晶格损伤积累与注入剂量和衬底温度的关系。用ＣＮＤＯ／２量子化学方法计算了ＧａＡｓ和Ａｌ_xＧａ_1-xＡｓ中化学键的相对强度，并根据计算结果解释了注入过程中Ａｌ_0.3Ｇａ_0.7Ａｓ／ＧａＡｓ超晶格和ＧａＡｓ中晶格损伤程度的差别。 关键词：     

Transmission in symmetrical GaAs/AlxGa1-xAs double-barriers with compositionally nonabrupt interfaces

Transmission properties of electrons through GaAs/Al_xGa_1-xAs symmetrical double-barriers with abrupt and nonabrupt interfaces are calculated and compared. The interface potential and carrier effective-mass are obtained assuming a linear variation of the aluminium molar fraction in the transition regions GaAs ⇔ Al_xGa_1-xAs. When the electron energy E_0,-1,e is smaller than the double-barrier height V_x0 , changes in the internal interfaces widths shift tunneling resonances, while changes in the external interfaces increase the energy widths of the resonant transmission peaks. When E_0,-1,e > V_x0, both external and internal interfaces modify remarkably the transmission of nonabrupt GaAs/Al_xGa_1-xAs double-barriers when compared with the abrupt double-barrier, even if their widths are as small as two GaAs lattice parameters. However, the first transmission peaks of abrupt and nonabrupt GaAs/Al_xGa_1-xAs double-barriers are very similar, except when the interface widths are greater than four lattice parameters.     

Accumulation layer and interface effects in doped nonabrupt GaAs/AlxGa1-xAs heterojunctions

A theoretical model is proposed to describe doped nonabrupt GaAs/Al_xGa_1-xAs heterojunctions. It is used to study interface effects on the transmission properties and energy levels of electrons in these heterostructures. It is showed that interface effects are important in the case of high doping levels, and wide GaAs/Al_xGa_1-xAs interfaces.     

Energy levels of single nonabrupt GaAs/AlxGa1-xAs quantum wells

Energy levels of electrons in nonabrupt GaAs/Al_xGa_1-xAs single quantum wells are calculated with and beyond the constant interfacial effective mass approximation (CIEMA), and compared with those of abrupt GaAs/Al_xGa_1-xAs quantum wells. For a given interface width, the energy levels calculated with the CIEMA are higher than those calculated beyond it, but both are higher than those of the abrupt semiconductor quantum well. The shifts of the energy levels increase with the interfacial width of the nonabrupt quantum well, as well as with the degree of interfacial asymmetry.     

Hot electron energy and momentum relaxation in GaAs/AlAs and GaAs/Ga1-xAlxAs multiple quantum wells

Experimental results on high electric field longitudinal transport in GaAs/AlAs and GaAs/Ga_1-xAl_xAs multiple quantum wells (MQW) are presented and compared with the prediction of a dielectric continuum model. We draw from our experiments the following four conclusions.(i) In GaAs/Ga_1-xAl_xAs systems the dominant energy and momentum relaxation mechanism is through scattering with GaAs -modes.(ii) However, in GaAs/AlAs systems the AlAs interface mode is dominant in relaxing the energy and momentum of the quantum well electrons.(iii) The hot electron momentum relaxation as obtained from the high-field drift velocity experiments is strongly affected by the production of hot phonons as expected from a model involving a non-drifting hot phonon distribution.(iv) The importance of the AlAs interface mode in GaAs/Ga_1-xAl_xAs MQW is not the result of the intrinsic scattering rate but related to its shorter lifetime, compared to GaAs modes.     

Characterization of GaAs/AlxGa1-xAs heterointerface defects by means of capacitive measurememts

x Ga_1-xAs heterojunctions grown by liquid-phase epitaxy. Interface states with hiqh concentration, N_t=3×10¹¹ cm^-2 and energy level E_c-E_t=0.14 eV distributed in a box 150 Å wide at the heterointerface and acting as electron traps are observed. The possible origin could be the isolated arsenic vacancy V_As in n-GaAs. Received: 25 April 1996/Accepted: 22 January 1997     

GaAs/AlxGa1-xAs量子阱红外探测器微结构研究

采用金属有机物化学气相沉积法生长了两种不同结构参数GaAs/AlxGa1-xAs量子阱材料。利用傅里叶光谱仪分别对势垒中Al组分为0.20,0.30的1#,2#样品进行77 K液氮温度下光谱响应测试。结果显示:1#,2#峰值响应波长为8.38,7.59 m,而根据薛定谔方程得到峰值波长为9.694,8.134 m,二者误差分别为13.6%,6.68%。针对误差过大及吸收峰向高能方向发生漂移的现象,利用高分辨透射扫描电镜对样品微观界面结构进行分析,结果显示,样品存在不同程度的位错及不均匀性。结果表明:位错引起AlGaAs与GaAs晶格不匹配,是造成1#误差较大的主要原因;峰值响应波长随势垒中Al组分的降低而增大,说明Al组分减小致使量子阱子带间距离缩小是导致峰值响应波长红移的原因。     

Sacrificial etching of Al<Subscript>x</Subscript>Ga<Subscript>1-x</Subscript>As for III–V MEMS surface micromachining

A study of Al_xGa_1-xAs as a sacrificial film for surface micromachining is presented. Al_xGa_1-xAs etch rate and selectivity are measured over a range of aluminum mole fractions and HF etchant concentrations during the release of structural features up to 500 μm in width. The etch process is found to be diffusion limited, with an inverse power law relationship between etch depth and etch rate. Excellent selectivity greater than 10⁵ is achieved between sacrificial AlAs and structural GaAs, even for long etches up to 250 μm in length. Compared with previous studies of Al_xGa_1-xAs etching for epitaxial liftoff processing, measured etch rates for surface micromachining are approximately an order of magnitude lower, primarily due to the longer effective etch lengths required. However, unlike epitaxial liftoff, Al_xGa_1-xAs surface micromachining is compatible with higher HF concentrations which can provide comparable overall etch rates, with important implications for AlGaAs MEMS fabrication. PACS 81.05.Ea; 85.85.+j