Determination of optical constants of thin films from transmittance trace

A simple method is depicted in this communication to determine the optical constants of transparent thin films from transmittance versus wavelength traces, showing no fringes, for evaluating thickness. The strength of this technique is apparent when applied to Zn_1 − xMg_xO films.     

Hemispherical and diffuse reflectance and transmittance of a slightly inhomogeneous film bounded by rough, unparallel interfaces

The optical reflectance and transmittance of an ideal thin film are calculated in a well-known way. As far as a non-ideal thin film is concerned - i.e., a slightly inhomogeneous thin film bounded by rough, unparallel interfaces - three categories of spectral coefficients can be defined, i.e.: specular reflectance and direct transmittance (light intensity flux along the optical axis), hemispherical reflectance and transmittance (light intensity flux integrated over the solid half angle π), and diffuse reflectance and transmittance (light intensity flux scattered around the optical axis) coefficients. In this paper a model recently introduced for the specular and direct coefficients is generalized to calculate also the hemispherical and diffuse coefficients of a non-ideal film.     

Structural and morphological properties of ZnO:Ga thin films

Zinc oxide (ZnO) is a promising semiconductor material with a great variety of applications. Compared to undoped ZnO, impurity-doped ZnO has a lower resistivity and better stability. With this aim, Ga has been proposed as a dopant. In this study, the structural characteristics and surface morphology of ZnO films produced by PEMOCVD at a substrate temperature of 250 °C on the c-plane (001) of sapphire were investigated. Doping was realized with 1, 3, 5 and 10 wt.% of Ga₂(AA)₃ in the precursor's mixture. At lower contents, Ga stimulates growth of (002) oriented textured films and the smallest FWHM was obtained as low as 0.17° for ZnO:Ga with 1 wt.%. A change in preferential orientation as well as surface smoothing and roughness decreasing of the films were observed with further increasing Ga content in precursor's mixture. We assume a key role of Ga and note that such a feature would be beneficial for the application of ZnO thin films for formation of abrupt junctions in p-n device structures.     

Temperature dependence of photocapacitance spectrum of CIGS thin-film solar cell

Deep levels in Cu(In_1 − x,Ga_x)Se₂ (CIGS) are studied by transient photocapacitance (TPC) spectroscopy by varying the Ga concentration, x, from 0.38 to 0.7. The TPC spectra of CIGS thin-film solar cells at 140 K exhibited a defect level with an optical transition energy of about 0.8 eV. The spectrum shape in the sub-bandgap region is independent of the Ga concentration. Therefore, the optical transition energy to the defect level is almost constant with about 0.8 eV from the valence band. The TPC signals for defect level are quenched by increasing temperature. The activation energy of thermal quenching is estimated to be about 0.3 eV. The thermal and optical activation processes are explained using configuration coordinate diagram.     

Dielectric properties of sol-gel derived barium strontium titanate thin films

Barium strontium titanate (Ba_xSr_1−xTiO₃) films were deposited by sol-gel technique on platinized silicon substrate for the composition range x = 0.0 to 1.0 in steps of 0.1. The as-deposited films were found to be amorphous. The films crystallize on annealing in air at 700 °C for 1 h. Dielectric constant (ε′) and loss tangent (tanδ) were measured in the temperature range − 180 °C to 150 °C in the frequency range 0.1 to 100 kHz. Both ε′ and tanδ show a small dispersion for all the compositions. This dispersion is more at the peak value than at room temperature. A comparison of the room temperature and peak value of the dielectric constant for various compositions are made with the reported values. Transition temperatures are reported for the entire composition range. All the compositions show a transition from ferroelectric to paraelectric phase except strontium titanate. Transition temperature shows a systematic decrease with increase in strontium content. The variation is at a rate of 3.4 °C/mol% of SrTiO₃. Curie constants are also reported for the entire composition range.     

A Raman spectroscopic study of structural evolution of electrochemically deposited ZnO films with deposition time

Zinc oxide thin films were fabricated on ITO substrates by electrodeposition method. The electrolyte used was a 0.2 M zinc nitrate aqueous solution. The substrates were maintained at room temperature and the deposition performed for different times between 10 and 30 min. X-ray diffraction measurements indicated the formation of polycrystalline ZnO film with hexagonal wurtzite structure. The structure and crystallinity of the films was also confirmed by Raman spectroscopy. Further, the degree of disorder was estimated both from the phonon correlation length calculated from the Raman spectra using the spatial correlation model and from the intensity ratios of the phonons. The variation with deposition time followed the same trend as the crystallite sizes obtained from X-ray diffraction. X-ray photoelectron spectroscopy measurements indicated oxygen deficiency in the films. A combination of annealing and optimum deposition time improves the quality of the electrodeposited ZnO films.     

Preparation of Li and Er codoped ZnO thin films and their photoluminescence

Li-Er codoped ZnO thin films have been prepared on Si(100) substrates by pulsed laser deposition (PLD). Both the as-grown and post-annealed films exhibit good crystalline quality with preferred c-axis orientation. After post-annealing at 850 °C, the photoluminescence (PL) related to intra-4f shell of Er³⁺ can be clearly observed. The Li-Er codoped ZnO film shows higher intensity of PL around 1.54 μm than the Er monodoped ZnO film. The behavior is attributed to the lowering of the symmetry of the crystal field around Er³⁺ ions by introducing Li⁺ into ZnO lattice, which is also confirmed by Raman scattering spectra.     

Study on the Hall-effect and photoluminescence of N-doped p-type ZnO thin films

N-doped, p-type ZnO thin films have been grown by plasma-assisted metal-organic chemical vapor deposition method. The results under optimized growth conditions included a resistivity of 1.72 Ω cm, a Hall mobility of 1.59 cm²/V s, and a hole concentration of 2.29 × 10¹⁸ cm^− 3, and were consistently reproducible. A N-related free-to-neutral-acceptor emission and an associated phonon replica were evident in room temperature photoluminescence spectra, from which the N acceptor energy level in ZnO was estimated to be 180 meV above the valence band maximum.     

ZnO薄膜材料的发光谱

随着人们对ZnO薄膜材料发光特性的不同深入，发现了不同能量位置的多个发光峰，本文对用不同方法制备的ZnO薄膜材料的发光谱、发光特性及其相应的发光机制、国内外研究动态进行了综合评述。介绍了由带间跃迁、激子复合和缺陷能级引起的发光和发光谱特性。     

Effects of phosphorus doping source temperatures on fabrication and properties of p-type ZnO thin films

Phosphorus-doped p-type ZnO thin films have been deposited by metalorganic chemical vapor deposition using P₂O₅ as the dopant source. The conductivity types of the as-grown thin films were strongly temperature-dependent. When the substrate temperature maintains at the optimal one of 420 °C, the evaporating temperature of the phosphorus source plays significant roles in controlling the phosphorus content doping into films, then influences the films' performance. Optimizing the growth parameters, the optimal results were obtained with a resistivity of 6.49 Ω cm, a Hall mobility of 0.40 cm²/V s and a hole concentration of 2.42 × 10¹⁸ cm^− 3. The optical property of the optimal film was characterized by PL measurements, which indicated the film is of high optical quality.     

Photoluminescence and energy transfer of terbium doped titania film

Strong visible luminescence of Tb³⁺ions due to intra-4f shell transitions are obtained from Tb³⁺-doped titania (TiO₂) films fabricated by sol-gel method. Based on the overlap of excitation band of Tb³⁺-doped TiO₂ and absorption band of undoped TiO₂, we propose an energy transfer mechanism from TiO₂ host to Tb³⁺ions. Photoluminescence (PL) intensity is found to have a well matching relation with the doping concentration of Tb³⁺ ions. Concentration quenching of PL occurs when Tb³⁺ concentration exceeds a certain value (9.5 mol%). Luminescence intensity is improved obviously after co-doped with Ce³⁺ ions because of the sensitization effect of Ce³⁺ ions and the dispersion of Tb³⁺ ions in TiO₂ system.     

Effect of isoelectronic substitution of Bi on the photoelectrical properties in amorphous Sn-Sb-Se films

Amorphous thin films of Sn₁₀Sb_20 − xBi_xSe₇₀ (0 ≤ x ≤ 6) system have been prepared by thermal evaporation technique. The optical gap and dc activation energy first increases with the addition of Bi (x = 2) and then decreases sharply with further addition. The photocurrent initially increases with time and then saturates to a constant value for all the samples. The decay portion of photocurrent has two components, fast one followed by a slow decay. Photocurrent (I_ph) versus light intensity (F) follows the power law I_ph ∝ F^γ and the value of the exponent (γ) decreases from 0.76 to 0.53 as the Bi concentration varied from x = 0 to 6 in the present system. The photosensitivity of these samples varies from 1.27 to 1.13 as Bi content increases.     

High conductivity and transparent ZnO:Al films prepared at low temperature by DC and MF magnetron sputtering

Aluminum-doped zinc oxide thin films have been deposited by DC and MF magnetron sputtering from a ceramic oxide target in argon atmosphere without direct heating of the substrates. The samples were prepared at different predetermined conditions of input power or discharge voltage and the influence upon electronic, optical, and microstructural properties has been investigated. The as-deposited layers show low resistivity, such as 9 × 10^− 4 Ω cm minimum for DC excitation and 1.2 × 10^− 3 Ω cm for MF mode, with growth rates up to 130 nm/min, and resulting substrate temperatures always below 200 °C. Low resistivity of the films is combined with high transmission, 85-90% in the visible wavelength range (400-800 nm). A strong (002) texture perpendicular to the substrate has been found, with lower strain for DC than for MF sputtering.     

Optical constants and band edge of amorphous zinc oxide thin films

The optical characteristics of amorphous zinc oxide (a-ZnO) thin films grown by radio frequency reactive magnetron sputtering on various substrates at temperature < 325 K have been investigated in the spectral range 340-1600 nm. The amorphous nature of the a-ZnO films was verified by X-ray diffraction and the optical constants were obtained by analysis of the measured ellipsometric spectra using the Cauchy-Urbach model. Refractive indices and extinction coefficients of the films were determined to be in the range 1.67-1.93 and 3.9 × 10^− 8-0.32, respectively. The band edge of the films on Si (100) and quartz has been determined by spectroscopic ellipsometry (3.39 ± 0.05 eV) and spectrophotometric (3.35 ± 0.05 eV) methods, respectively. From the angle dependence of the p-polarized reflectivity we deduce a Brewster angle of 60.5°. Measurement of the polarized optical properties shows a high transmissivity (81%-99%) and low absorptivity (< 5%) in the visible and near infrared regions at different angles of incidence. Also, we found that there was a higher absorptivity for wavelength < 370 nm. This wavelength, ∼ 370 nm, therefore indicated that the band edge for a-ZnO thin films is about 3.35 eV.     

Properties of Al heavy-doped ZnO thin films by RF magnetron sputtering

Al-doped ZnO films were deposited by RF magnetron sputtering. From the X-ray diffraction and scanning electron spectrometer studies, wurtzite structure with (0 0 2) orientation ZnO thin films were obtained at Al concentration below 15 atomic percent (at.%). As the Al concentration above 15 at.%, the thin films did not fully crystallize. Two new emission peaks occurred at 351 nm and 313 nm when the Al doping above 15 at.% from the photoluminescence spectrum, and the peaks shift towards the shorter wavelengths with increasing the Al concentration. X-ray photonic spectra of O 1s conformed the amount of oxygen captured by Al³⁺ increasing as the Al³⁺ concentration increasing due to the dominant Al³⁺ possess high charge in competition with Zn²⁺ in the matrix of ZnO.     

Growth and electrical properties of ZnO thin films deposited by novel ion plating method

The URT(Uramoto-gun with Tanaka magnetic field)-IP(ion plating) method is a technique for depositing a thin film on a substrate. This method offers the advantage of low-ion damage, low deposition temperatures, large area deposition and high growth rates. Ga-doped ZnO thin films were grown using the URT-IP method, and the material properties were evaluated. The quality of ZnO thin films grown by the URT-IP method was found to be sensitive to oxygen supply during growth. It was observed that the saturation point of the growth rate corresponding to the optimum oxygen supply leads to the best electrical properties. The profiles of the dependence of film properties on oxygen supply revealed a part of growth mechanism of the URT-IP method.     

Physical and sensing properties of ZnO:F:Al thin films deposited by sol-gel

Fluorine and aluminum-doped zinc oxide thin films, ZnO:F:Al, were prepared on soda-lime glass substrates by the sol-gel method and repeated dip-coating. The effect of the solution ageing and film thickness on the physical characteristics of the films was studied. Two ageing times, namely, two and seven days, and three different thicknesses, in the order of 220, 330, and 520 nm, were the main variables used in this work. As-deposited ZnO:F:Al films showed a high electrical resistivity, however after a vacuum thermal treatment, it was registered a significant decrease. Structural, optical, and morphological characterizations were carried out in vacuum-annealed films. The X-ray diffraction (XRD) patterns revealed that both as-deposited and vacuum-annealed ZnO:F:Al thin films were polycrystalline with a hexagonal wurtzite-type structure with a well-defined (002) diffraction peak, irrespective of the ageing time of the starting solution. The (002) peak shows a proportional increase with the thickness magnitude. An average crystallite size of about 20 nm was estimated using the well-known Scherrer's formula. From the surface morphological study it was observed that the grain size is almost independent of the ageing time of the starting solution, and the film thickness. Films presented an average optical transmittance in the visible range (400-700 nm) in the order of 90%, as well as a band gap of 3.3 eV. The gas-sensing properties of ZnO:F:Al thin films in an atmosphere containing different concentrations of carbon monoxide, and at different operation temperatures were probed. The highest sensitivity registered was of the order of 93%.     

Substrate temperature dependence of the properties of Ga-doped ZnO films deposited by DC reactive magnetron sputtering

Ga-doped zinc oxide (ZnO:Ga) transparent conductive films were deposited on glass substrates by DC reactive magnetron sputtering. The influence of substrate temperature on the structural, electrical, and optical properties of ZnO:Ga films was investigated. The X-ray diffraction (XRD) studies show that higher temperature helps to promote Ga substitution more easily. The film deposited at 350 °C has the optimal crystal quality. The morphology of the films is strongly related to the substrate temperature. The film deposited is dense and flat with a columnar structure in the cross-section morphology. The transmittance of the ZnO:Ga thin films is over 90%. The lowest resistivity of the ZnO:Ga film is 4.48×10⁻⁴ Ω cm, for a film which was deposited at the substrate temperature of 300 °C.     

Raman spectra of intrinsic and doped hydrogenated nanocrystalline silicon films

Raman scattering characteristics of intrinsic and doped hydrogenated nanocrystalline silicon films which prepared by a plasma-enhanced chemical vapor deposition system are investigated. Results indicate that Raman spectra depend intensively on microstructure and impurity in the films. Taking into account phonon confinement effect and tensile strain effect in Si nanocrystals, peak redshift of measured transverse optical modes in Raman spectra of intrinsic films can be well interpreted. With respect to Raman scattering from doped samples, besides phonon confinement effect, the peak of experimental transverse optical mode further downshifts with heightening doping level, which can be primarily assigned to impurity effect from doping. In addition, the increase in relative integral intensity ratio of transverse acoustic branch to transverse optical mode and that of longitudinal acoustic branch to transverse optical mode with decreasing mean dimension of nanocrystals and heightening doping ratio, respectively, can be ascribed to disorder. Furthermore, at the same doping level, incorporation of boron can induce higher disorder than incorporation of phosphorus in nc-Si:H films.     

Correlation between optical path modulations and transmittance spectra of a-Si:H thin films

The optical constants of plasma-enhanced chemical-vapor-deposited amorphous silicon (a-Si:H) thin film upon a transparent substrate are determined within the UV-visible region by measurement of the transmittance spectrum. Apart from thickness irregularities, the effects of vertical film inhomogeneities (refractive-index distribution) on the spectrum are discussed. In this respect, although consideration of any possible variation in thickness of the film within the area illuminated by the probe beam is sufficient for correcting the modulation of the extrema of interference fringes, including in the model the thin transitional regions at substrate-film and film-air interfaces might be an alternative method for understanding the overall optical behavior of the spectrum.