Electron‐beam crystallized large grained silicon solar cell on glass substrate

Thin film hetero‐emitter solar cells with large‐grained poly‐silicon absorbers of around 10 µm thickness have been prepared on glass. The basis of the cell concept is electron‐beam‐crystallization of an amorphous or nanocrystalline silicon layer deposited onto a SiC:B layer. The SiC:B layer covers a commercially well available glass substrate, serving as diffusion barrier, contact layer and dopand source. For silicon absorber deposition a low pressure chemical vapour deposition was used. The successively applied e‐beam crystallization process creates poly‐silicon layers with grain sizes up to 1 × 10 mm² with low defect densities. The high electronic quality of the absorber is reflected in open circuit voltages as high as 545 mV, which are realized making use of the well‐developed a‐Si:H hetero‐emitter technology. Copyright © 2011 John Wiley & Sons, Ltd.     

Polycrystalline silicon thin‐film solar cells on glass by aluminium‐induced crystallisation and subsequent ion‐assisted deposition (ALICIA)

A research project is under way at The University of New South Wales aiming at the realisation of a novel type of polycrystalline silicon thin‐film solar cell on glass. The idea is to first create a thin large‐grained polycrystalline seed layer on glass by aluminium‐induced crystallisation of amorphous silicon and then to epitaxially thicken the seed layer with ion‐assisted deposition. By mid‐2003 this ALICIA project had achieved laboratory cells with voltages of up to 163 mV, as reported elsewhere. In the present paper we give an overview of recent progress (improved Si epitaxy process, improved control of base doping profile due to the use of phosphorus dopants instead of gallium, hydrogen passivation) that has improved the voltages of ALICIA solar cells to 270 mV. Furthermore, the strategy for further voltage improvements is presented. At the present point in time only the voltages of ALICIA cells are known, but obviously solar cells also require current for good efficiency. Hence much improvement in both voltage and current is still needed. Copyright © 2004 John Wiley & Sons, Ltd.     

A novel way of texturing glass for microcrystalline silicon thin film solar cells application

In this paper, we present a novel way of texturing glass facilitated by ZnO:Al thin film as sacrificial layer for thin film silicon solar cell application. We name this technique zinc oxide‐induced texturing (ZIT). The texturing of glass was achieved by wet etching of ZnO:Al covered glass with HF and HNO₃ as etchants. We investigated the influence of the ZnO:Al layer sputtering condition, the layer thickness, and the etchant composition on the surface morphology of the textured glass. We demonstrate that we are able to control the roughness of the ZIT glass over a wide roughness range, ranging from 20 to 400 nm. Highly efficient microcrystalline silicon n‐i‐p solar cells were deposited on ZIT glass. The influence of the substrate morphology on the solar cell performance is also discussed. The highest efficiency for a single junction n‐i‐p microcrystalline silicon solar cell obtained in this work is 10.64% (Active area). Copyright © 2014 John Wiley & Sons, Ltd.     

Ultrathin PECVD epitaxial Si solar cells on glass via low‐temperature transfer process

Fabrication of high‐quality ultrathin monocrystalline silicon layers and their transfer to low‐cost substrates are key steps for flexible electronics and photovoltaics. In this work, we demonstrate a low‐temperature and low‐cost process for ultrathin silicon solar cells. By using standard plasma‐enhanced chemical vapor deposition (PECVD), we grow high‐quality epitaxial silicon layers (epi‐PECVD) from SiH₄/H₂ gas mixtures at 175 °C. Using secondary ion mass spectrometry and transmission electron microscopy, we show that the porosity of the epi‐PECVD/crystalline silicon interface can be tuned by controlling the hydrogen accumulation there. Moreover, we demonstrate that 13–14% porosity is a threshold above which the interface becomes fragile and can easily be cleaved. Taking advantage of the H‐rich interface fragility, we demonstrate the transfer of large areas (∽10 cm²) ultrathin epi‐PECVD layers (0.5–5.5 µm) onto glass substrates by anodic bonding and moderate annealing (275–350 °C). The structural properties of transferred layers are assessed, and the first PECVD epitaxial silicon solar cells transferred on glass are characterized. Copyright © 2016 John Wiley & Sons, Ltd.     

8% Efficient thin‐film polycrystalline‐silicon solar cells based on aluminum‐ induced crystallization and thermal CVD

A considerable cost reduction could be achieved in photovoltaics if efficient solar cells could be made from polycrystalline‐silicon (pc‐Si) thin films on inexpensive substrates. We recently showed promising solar cell results using pc‐Si layers obtained by aluminum‐induced crystallization (AIC) of amorphous silicon in combination with thermal chemical vapor deposition (CVD). To obtain highly efficient pc‐Si solar cells, however, the material quality has to be optimized and cell processes different from those applied for standard bulk‐Si solar cells have to be developed. In this work, we present the different process steps that we recently developed to enhance the efficiency of pc‐Si solar cells on alumina substrates made by AIC in combination with thermal CVD. Our present pc‐Si solar cell process yields cells in substrate configuration with efficiencies so far of up to 8·0%. Spin‐on oxides are used to smoothen the alumina substrate surface to enhance the electronic quality of the absorber layers. The cells have heterojunction emitters consisting of thin a‐Si layers that yield much higher V_oc values than classical diffused emitters. Base and emitter contacts are on top of the cell in interdigitated finger patterns, leading to fill factors above 70%. The front surface of the cells is plasma textured to increase the current density. Our present pc‐Si solar cell efficiency of 8% together with the fast progression that we have made over the last few years indicate the large potential of pc‐Si solar cells based on the AIC seed layer approach. Copyright © 2007 John Wiley & Sons, Ltd.     

Structural analyses of seeded thin film microcrystalline silicon solar cell

This contribution investigates the effect of seeding the growth of thin film microcrystalline silicon (µc‐Si : H) deposited by radio frequency plasma‐enhanced chemical vapor deposition on the material properties of µc‐Si : H film and the device performance of p‐i‐n and n‐i‐p µc‐Si : H solar cells. By means of Raman measurement, x‐ray diffraction (XRD) and transmission electron microscopy (TEM), we investigate the structure of seeded µc‐Si : H. In particular, the effect of seed layers on the crystallinity development is investigated. Measurements of the depth profile of the crystalline mass fraction using Raman spectroscopy show that seed layers lead to a more rapid and uniform crystallinity development in growth direction. The amorphous incubation layer is suppressed and crystallization begins directly from onset of film growth without evolving through the intermediate growth phases. From TEM analyses, we observe that crystal sizes are not affected by seed layers. Horizontal cracks are however observed to dominate the early growth of µc‐Si : H in p‐i‐n solar cell and this is reduced upon seeding. For the n‐i‐p cells, these cracks are not affected by seeding. XRD results also indicate that the use of seed layers does not affect the crystal sizes but affects the direction of preferential orientation. Solar cell external parameters show that seeding of p‐i‐n solar cells leads mainly to increase in short‐circuit current density, J_sc with a slight drop in open‐circuit voltage, V_oc. For the n‐i‐p cells, a reverse effect is observed. In this case, the V_oc increases and the J_sc decreases. Copyright © 2012 John Wiley & Sons, Ltd.     

Fine line printed silicon solar cells exceeding 20% efficiency

Silicon solar cells with passivated rear side and laser‐fired contacts were produced on float zone material. The front side contacts are built up in two steps, seed and plate. The seed layer is printed using an aerosol jet printer and a silver ink. After firing this seed layer through the silicon nitride layer, the conductive layer is grown by light induced plating. The contact formation is studied on different emitter sheet resistances, 55 Ω/sq, 70 Ω/sq, and on 110 Ω/sq. These emitters are passivated with a PECVD silicon nitride layer which also acts as an anti‐reflection coating. Even on the 110 Ω/sq emitters it was possible to reach a fill factor of 80·1%. The electrical properties i.e., the contact resistance of the front side contacts are studied by transfer length model (TLM) measurements. On a cell area of 4 cm² and emitter sheet resistance of 110 Ω/sq, a record efficiency of 20·3% was achieved. Excellent open‐circuit voltage (V_oc) and short‐circuit current (j_sc) values of 661 mV and 38·4 mA/cm² were obtained due to the low recombination in the 110 Ω/sq emitter and at the passivated rear surface. These results show impressively that it is possible to contact emitter profiles with a very high efficiency potential using optimized printing technologies. Copyright © 2008 John Wiley & Sons, Ltd.     

Optimised antireflection coatings for planar silicon solar cells using remote PECVD silicon nitride and porous silicon dioxide

Silicon nitride (SiN) films fabricated by remote plasma‐enhanced chemical vapour deposition (RPECVD) have recently been shown to provide an excellent electronic passivation of silicon surfaces. This property, in combination with its large refractive index, makes RPECVD SiN an ideal candidate for a surface‐passivating antireflection coating on silicon solar cells. A major problem of these films, however, is the fact that the extinction coefficient increases with increasing refractive index. Hence, a careful optimisation of RPECVD SiN based antireflection coatings on silicon solar cells must consider the light absorption within the films. Optimal optical performance of silicon solar cells in air is obtained if the RPECVD SiN films are combined with a medium with a refractive index below 1·46, such as porous SiO₂. In this study, the dispersion of the refractive indices and the extinction coefficients of RPECVD SiN, porous SiO₂, and several other relevant materials (MgF₂, TiO_x, ZnS, B270 crown glass, soda lime glass, ethylene vinyl acetate and resin as used in commercial photovoltaic modules) are experimentally determined. Based on these data, the short‐circuit currents of planar silicon solar cells covered by RPECVD SiN and/or porous SiO₂ single‐ and multi‐layer antireflection coatings are numerically maximised for glass‐encapsulated as well as non‐encapsulated operating conditions. The porous SiO₂/RPECVD SiN‐based antireflection coatings optimised for these applications are shown to be universally suited for silicon solar cells, regardless of the internal blue or red response of the cells. Copyright © 1999 John Wiley & Sons, Ltd.     

Solar‐Energy Conversion in TiO2/CuInS2 Nanocomposites

The search for low‐cost thin‐film solar cells, to replace silicon multi‐crystalline cells in due course, calls for new combinations of materials and new cell configurations. Here we report on a new approach, based on semiconductor nanocomposites, towards what we refer to as the three‐dimensional (3D) solar‐cell concept. Atomic layer chemical vapor deposition is employed for infiltration of CuInS₂ inside the pores of nanostructured TiO₂. In this way it is possible to obtain a nanometer‐scale interpenetrating network between n‐type TiO₂ and p‐type CuInS₂. X‐ray diffraction, Raman spectroscopy, photoluminescence spectroscopy, scanning electron microscopy, transmission electron microscopy, and current–voltage measurements are used to characterize the nanostructured devices. The 3D solar cells obtained show photovoltaic activity with a maximum monochromatic incident photon‐to‐current conversion efficiency of 80 % and have an energy‐conversion efficiency of 4 %.     

Improving the Extraction of Photogenerated Electrons with SnO2 Nanocolloids for Efficient Planar Perovskite Solar Cells

Great attention to cost‐effective high‐efficiency solar power conversion of trihalide perovskite solar cells (PSCs) has been hovering at high levels in the recent 5 years. Among PSC devices, admittedly, TiO₂ is the most widely used electron transport layer (ETL); however, its low mobility which is even less than that of CH₃NH₃PbI₃ makes it not an ideal material. In principle, SnO₂ with higher electron mobility can be regarded as a positive alternative. Herein, a SnO₂ nanocolloid sol with ≈3 nm in size synthesized at 60 °C was spin‐coated onto the fuorine‐doped tin oxide (FTO) glass as the ETL of planar CH₃NH₃PbI₃ perovskite solar cells. TiCl₄ treatment of SnO₂‐coated FTO is found to improve crystallization and increase the surface coverage of perovskites, which plays a pivotal role in improving the power conversion efficiency (PCE). In this report, a champion efficiency of 14.69% (J_sc = 21.19 mA cm^?2, V_oc = 1023 mV, and FF = 0.678) is obtained with a metal mask at one sun illumination (AM 1.5G, 100 mW cm^?2). Compared to the typical TiO₂, the SnO₂ ETL efficiently facilitates the separation and transportation of photogenerated electrons/holes from the perovskite absorber, which results in a significant enhancement of photocurrent and PCE.     

Interdigitated back‐contact heterojunction solar cell concept for liquid phase crystallized thin‐film silicon on glass

We present an interdigitated back‐contact silicon heterojunction system designed for liquid‐phase crystallized thin‐film (~10 µm) silicon on glass. The preparation of the interdigitated emitter (a‐Si:H(p)) and absorber (a‐Si:H(n)) contact layers relies on the etch selectivity of doped amorphous silicon layers in alkaline solutions. The etch rates of a‐Si:H(n) and a‐Si:H(p) in 0.6% NaOH were determined and interdigitated back‐contact silicon heterojunction solar cells with two different metallizations, namely Al and ITO/Ag electrodes, were evaluated regarding electrical and optical properties. An additional random pyramid texture on the back side provides short‐circuit current density (j_SC) of up to 30.3 mA/cm² using the ITO/Ag metallization. The maximum efficiency of 10.5% is mainly limited by a low of fill factor of 57%. However, the high j_SC, as well as V_OC values of 633 mV and pseudo‐fill factors of 77%, underline the high potential of this approach. Copyright © 2015 John Wiley & Sons, Ltd.     

Solvent‐Assisted Low‐Temperature Crystallization of SnO2 Electron‐Transfer Layer for High‐Efficiency Planar Perovskite Solar Cells

A high‐quality polycrystalline SnO₂ electron‐transfer layer is synthesized through an in situ, low‐temperature, and unique butanol–water solvent‐assisted process. By choosing a mixture of butanol and water as a solvent, the crystallinity is enhanced and the crystallization temperature is lowered to 130 °C, making the process fully compatible with flexible plastic substrates. The best solar cells fabricated using these layers achieve an efficiency of 20.52% (average 19.02%) which is among the best in the class of planar n–i–p‐type perovskite (MAPbI₃) solar cells. The strongly reduced crystallization temperature of the materials allows their use on a flexible substrate, with a resulting device efficiency of 18%.     

Simulation and fabrication of heterojunction silicon solar cells from numerical computer and hot‐wire CVD

In this paper, we will present a Pc1D numerical simulation for heterojunction (HJ) silicon solar cells, and discuss their possibilities and limitations. By means of modeling and numerical computer simulation, the influence of emitter‐layer/intrinsic‐layer/crystalline‐Si heterostructures with different thickness and crystallinity on the solar cell performance is investigated and compared with hot wire chemical vapor deposition (HWCVD) experimental results. A new technique for characterization of n‐type microcrystalline silicon (n‐µc‐Si)/intrinsic amorphous silicon (i‐a‐Si)/crystalline silicon (c‐Si) heterojunction solar cells from Pc1D is developed. Results of numerical modeling as well as experimental data obtained using HWCVD on µc‐Si (n)/a‐Si (i)/c‐Si (p) heterojunction are presented. This work improves the understanding of HJ solar cells to derive arguments for design optimization. Some simulated parameters of solar cells were obtained: the best results for J_sc = 39·4 mA/cm², V_oc = 0·64 V, FF = 83%, and η = 21% have been achieved. After optimizing the deposition parameters of the n‐layer and the H₂ pretreatment of solar cell, the single‐side HJ solar cells with J_sc = 34·6 mA/cm², V_oc = 0·615 V, FF = 71%, and an efficiency of 15·2% have been achieved. The double‐side HJ solar cell with J_sc = 34·8 mA/cm², V_oc = 0·645 V, FF = 73%, and an efficiency of 16·4% has been fabricated. Copyright © 2009 John Wiley & Sons, Ltd.     

Influence of substrate on the growth of microcrystalline silicon thin films deposited by plasma enhanced chemical vapor deposition

Microcrystalline silicon (μc-Si) thin films are widely used for silicon thin film solar cells, especially in the high performance tandem solar cells which comprise an amorphous silicon junction at the top and a μc-Si junction at the bottom. One of the major factors affecting the photovoltaic properties of μc-Si thin film solar cells of thin films is the quality of the μc-Si thin films. In this work, we investigated the effect of substrates on the crystallization characteristics and growth behaviors of μc-Si thin films grown by the plasma enhanced chemical vapor deposition method (PECVD), and found that substrates have a strong effect on the crystallization characteristics of μc-Si thin films. In addition, the growth rate of μc-Si thin films was also highly influenced by the substrates. Three types of substrates, quartz glass, single crystalline silicon and thermally oxidized single crystalline silicon, were used for growing μc-Si thin films from SiH₄/H₂ with a flow rate ratio 2:98 at different temperatures. Crystallization characteristics of these μc-Si thin films were studied by Raman scattering and X-ray diffraction techniques.     

Deposition of highly efficient microcrystalline silicon solar cells under conditions of low H2 dilution: the role of the transient depletion induced incubation layer

This paper addresses the plasma deposition of highly efficient microcrystalline silicon (μc‐Si:H) p‐i‐n solar cells under conditions of high SiH₄ utilization and low H₂ dilution. It was established that the transient depletion of the initially present SiH₄ source gas induces the formation of an amorphous incubation layer that prevents successful crystallite nucleation in the i‐layer and leads to poor solar cell performance. The effect of this transient depletion induced incubation layer on solar cells was made visible through dedicated solar cell deposition series and selected area electron diffraction measurements. Applying a gas flow procedure at plasma ignition it was succeeded to prepare state‐of‐the‐art μc‐Si:H material and solar cells under low hydrogen dilution conditions, highlighted by μc‐Si:H solar cells of up to 9·5% efficiency prepared using an undiluted source gas flow consisting solely of SiH₄. Copyright © 2007 John Wiley & Sons, Ltd.     

High efficiency screen printed bifacial solar cells on monocrystalline CZ silicon

We present industrialized bifacial solar cells on large area (149 cm²) 2 cm CZ monocrystalline silicon wafers processed with industrially relevant techniques such as liquid source BBr₃ and POCl₃ open‐tube furnace diffusions, plasma enhanced chemical vapor deposition (PECVD) SiN_x deposition, and screen printed contacts. The fundamental analysis of the paste using at boron‐diffused surface and the bifacial solar cell firing cycle has been investigated. The resulting solar cells have front and rear efficiencies of 16.6 and 12.8%, respectively. The ratio of the rear J_SC to front J_SC is 76.8%. It increases the bifacial power by 15.4% over a conventional solar cell at 20% of 1‐sun rear illumination, which equals to the power of a conventional solar cell with 19.2% efficiency. We also present a bifacial glass–glass photovoltaic (PV) module with 30 bifacial cells with the electrical characteristics. Copyright © 2010 John Wiley & Sons, Ltd.     

Preparation and measurement of highly efficient a‐Si:H single junction solar cells and the advantages of μc‐SiOx:H n‐layers

Reducing the optical losses and increasing the reflection while maintaining the function of doped layers at the back contact in solar cells are important issues for many photovoltaic applications. One approach is to use doped microcrystalline silicon oxide (μc‐SiO_x:H) with lower optical absorption in the spectral range of interest (300 nm to 1100 nm). To investigate the advantages, we applied the μc‐SiO_x:H n‐layers to a‐Si:H single junction solar cells. We report on the comparison between amorphous silicon (a‐Si:H) single junction solar cells with either μc‐SiO_x:H n‐layers or non‐alloyed silicon n‐layers. The origin of the improved performance of a‐Si:H single junction solar cells with the μc‐SiO_x:H n‐layer is identified by distinguishing the contributions because of the increased transparency and the reduced refractive index of the μc‐SiO_x:H material. The solar cell parameters of a‐Si:H solar cells with both types of n‐layers were compared in the initial state and after 1000 h of light soaking in a series of solar cells with various absorber layer thicknesses. The measurement procedure for the determination of the solar cell performance is described in detail, and the measurement accuracy is evaluated and discussed. For an a‐Si:H single junction solar cell with a μc‐SiO_x:H n‐layer, a stabilized efficiency of 10.3% after 1000 h light soaking is demonstrated. Copyright © 2015 John Wiley & Sons, Ltd.     

Comparison of the open circuit voltage of simplified PERC cells passivated with PECVD silicon nitride and thermal silicon oxide

Plasma enhanced chemical vapor deposited silicon nitride films have been used to passivate both the front and rear surface of simplified PERC silicon solar cells (planar surface, single‐step emitter). An independently confirmed open circuit voltage (V_oc) of 667 mV was measured, proving the outstanding surface passivation provided by the silicon nitride films. The achieved V_oc represents a significant improvement for all‐SiN passivated silicon solar cells. A conversion efficiency of 17˙8% was obtained. For comparison, similar cells with different passivation schemes, including high quality, thermally grown TCA oxides and thin SiO₂/SiN double layers, were also investigated. Open circuit voltages up to 673 mV and conversion efficiencies up to 18˙3% were achieved. Copyright © 2000 John Wiley & Sons, Ltd.     

纳米氧化钨薄膜改性的大孔硅气敏传感器

通过双槽电化学腐蚀法在P型单晶硅表面制备了大孔硅。然后通过直流对靶反应磁控溅射法在大孔硅表面淀积了纳米氧化钨薄膜。使用场发射扫描电子显微镜（FESEM）观察大孔硅和氧化钨/大孔硅样品的形貌。分别使用X射线衍射（XRD）图谱和X射线光电子能谱（XPS）分析氧化钨晶体结构和钨的化合价。在室温下测试大孔硅和氧化钨/大孔硅气敏传感器的气敏特性。结果表明：氧化钨/大孔硅气敏传感器表现出了P型半导体气敏传感器的气敏特性。它对1ppm的二氧化氮显示了良好的恢复特性和重复性。氧化钨/大孔硅气敏传感器的长期稳定性要好于大孔硅气敏传感器。氧化钨的添加提高了大孔硅气敏传感器对二氧化氮的灵敏度。氧化钨/大孔硅气敏传感器对于二氧化氮的灵敏度要高于其对氨气和乙醇的灵敏度。通过淀积纳米氧化钨薄膜,改善了大孔硅对二氧化氮的选择性。     

Nanostructured Si/Organic Heterojunction Solar Cells with High Open‐Circuit Voltage via Improving Junction Quality

Nanostructured silicon (Si) can provide improved light harvest efficiencies in organic‐Si heterojunction solar cells due to its low light reflection ratio compared with planar one. However, the associated large surface/volume ratio of nanostructured Si suffers from serious surface recombination as well as poor adhesion with organics in organic‐Si heterojunction solar cells, which leads to an inferior open‐circuit voltage (V_oc). Here, we develop a simple and effective method to suppress charge recombination as well as enhancing adhesion force between nanostructured Si and organics by incorporating a silane chemical, namely 3‐glycidoxypropyltrimethoxydsilane (GOPS). GOPS can chemically graft onto nanostructured Si and improve the aqueous organic wetting properties, suppressing surface charge recombination velocity dramatically. In addition, this chemically grafted layer can enhance adhesion force between organics and Si. In such a way, a record V_oc of 640 mV associated with a power conversion efficiency of 14.1% is obtained for organic‐nanostructured Si heterojunction devices. These findings suggest a promising approach to low‐cost and simple fabrication for high‐performance organic‐Si solar cells.