生长温度对于Ge衬底上分子束外延生长的InGaAs/GaAs量子阱结构质量的影响

本文研究了斜切割（100）Ge衬底上InxGa1-xAs/GaAs量子阱结构的分子束外延生长（In组分为0.17或者0.3）。所生长的样品用原子力显微镜、光致发光光谱和高分辨率透射电子显微镜进行了测量和表征。结果发现,为了生长没有反相畴的GaAs缓冲层,必须对Ge衬底进行高温退火。在GaAs外延层和InxGa1-xAs/GaAs量子阱结构的生长过程中,生长温度是一个至关重要的参数。文中讨论了温度对于外延材料质量的影响机理。通过优化生长温度,Ge衬底上的InxGa1-xAs/GaAs量子阱结构的光致发光谱具有很高的强度、很窄的线宽,样品的表面光滑平整。这些研究表面Ge 衬底上的III-V族化合物半导体材料有很大的器件应用前景。     

The effects of laser irradiation on InGaAs/GaAs multiple quantum wells grown by metalorganic molecular beam epitaxy

We studied the effects of Ar ion laser irradiation during the growth of InGaAs/ GaAs multiple quantum wells (MQW) structures by metalorganic molecular beam epitaxy. Structural and optical properties were characterized by Nomarski microscopy, Dektak stylus profiler, and low-temperature photoluminescence (PL) measurements. For MQW structures grown at a relatively low substrate temperature (500°C), the laser irradiation influences greatly the growth process of the In^Ga^^As well and results in a large blue shift of about 2000à in the PL peak. Such a large blue shift suggests that laser modification during growth could have some novel applications in optoelectronics. On the other hand, the laser irradiation has relatively small effects on samples grown at a higher substrate temperature (550°C).     

Lattice mismatched InGaAs on silicon photodetectors grown by molecular beam epitaxy

In_0.5Ga_0.5As on silicon photodetectors, including three types of interdigitated-finger devices as well as linear photoconductors, were fabricated and measured. The InGaAs/Si structure was grown by molecular beam epitaxy and utilized a 100 Å GaAs intervening nucleation layer between the silicon substrate and the InGaAs layers, step-graded In_xGa_1?xAs layers, and an in-situ grown 40 Å thick GaAs surface layer, which substantially enhanced the metal-semiconductor barrier height (Φ_b = 0.67 V) for the InGaAs. Schottky diodes fabricated independently of the photodetectors had nearly ideal characteristics with an ideality factor (n) of 1.02 and a reverse breakdown voltage of 40 V. The interdigitated Schottky photodetectors showed dark currents between <3nA and 54 μA at a 3 V bias and initial photoresponse rise times in the range of 600 to 725 ps, comparable to similar InGaAs metal-semiconductor-metal photodetectors grown lattice matched on InP. The photoconductors fabricated in the same material had rise times in the range of 575 to 1300 ps, thus being slightly slower, and had dark currents of 7 to 80 mA. The responsivity of the photoconductors was typically greater than that of the diodes by a factor of five to fifteen. The results show potential for monolithic integration of InGaAs photodetectors on silicon substrates.     

利用全固态分子束外延方法在Ge(100)衬底上异质外延GaAs薄膜及相关特性表征

利用全固态分子束外延(MBE)方法在Ge(100)衬底上异质外延GaAs薄膜,并通过高能电子衍射(RHEED)、高分辨X射线衍射(XRD),原子力显微镜等手段研究了不同生长参数对外延层的影响.RHEED显示在较高的生长温度或较低的生长速率下,低温GaAs成核层呈现层状生长模式.同时降低生长温度和生长速率会使GaAs薄膜的XRD摇摆曲线半高宽(FWHM)减小,并降低外延层表面的粗糙度,这主要是由于衬底和外延薄膜之间的晶格失配度减小的结果.     

Anti-phase domain-free growth of GaAs on offcut (001) Ge wafers by molecular beam epitaxy with suppressed Ge outdiffusion

The nucleation and growth of GaAs films on offcut (001) Ge wafers by solid source molecular beam epitaxy (MBE) is investigated, with the objective of establishing nucleation conditions which reproducibly yield GaAs films which are free of antiphase domains (APDs) and which have suppressed Ge outdiffusion into the GaAs layer. The nucleation process is monitored by in-situ reflection high energy electron diffraction and Auger electron spectroscopy. Several nucleation variables are studied, including the state of the initial Ge surface (single-domain 2×1 or mixed-domain 2×1:1×2), the initial prelayer (As, Ga, or mixed), and the initial GaAs growth temperature (350 or 500°C). Conditions are identified which simultaneously produce APD-free GaAs layers several microns in thickness on Ge wafers with undetectable Ge outdiffusion and with surface roughness equivalent to that of GaAs/GaAs homoepitaxy. APD-free material is obtained using either As or Ga nucleation layers, with the GaAs domain dependent upon the initial exposure chemical species. Key growth steps for APD-free GaAs/Ge growth by solid source MBE include an epitaxial Ge buffer deposited in the MBE chamber to bury carbon contamination from the underlying Ge wafer, an anneal of the Ge buffer at 640°C to generate a predominantly double atomic-height stepped surface, and nucleation of GaAs growth by a ten monolayer migration enhanced epitaxy step initiated with either pure As or Ga. We identify this last step as being responsible for blocking Ge outdiffusion to below 10¹⁵ cm⁻³ within 0.5 microns of the GaAs/Ge interface.     

Gas-Source molecular beam epitaxy and characterization of inGaAs/lnGaAsP quantum well structures on InP

In this paper, we report the effect of using a group-V residual source evacuation (RSE) time on the interfaces of InGaAs/lnGaAsP quantum wells (QWs) grown by gas-source molecular beam epitaxy. High-resolution x-ray rocking curve and low-temperature photoluminescence (PL) were used to characterize the material quality. By optimizing the RSE time, a PL line width at 15K as narrow as 6.6 meV is observed from a 2 nm wide single QW, which is as good as or better than what has been reported for this material system. Very sharp and distinct satellite peaks as well as Pendellosung fringes are observed in the x-ray rocking curves of In_xGa_1−xAs/InxGa_1−xAS_yP_1−y multiple QWs, indicating good crystalline quality, lateral uniformity, and vertical periodicity. Theoretical considerations of the PL linewidths of In_xGa_1−xAs/InxGa_1−xAS_yP_1−y single QWs show that for QW structures grown with the optimized RSE time, the PL linewidth is mainly due to alloy scattering, whereas the contribution from interface roughness is small, indicating a good interface control.     

Interdiffusion and relaxation in metalorganic vapor phase epitaxy grown InGaAs/GaAs strained layer quantum wells

Low pressure metalorganic vapor phase epitaxy grown strained InGaAs/GaAs quantum well structures have been characterized by photoluminescence and x-ray diffraction. It is shown that beyond the pseudomorphic limit, these structures show considerable gallium/indium interdiffusion at the interfaces and partial strain relaxation in the quantum well layers.     

Influence of Ga vs As prelayers on GaAs/Ge growth morphology

The surface morphology of GaAs films grown on Ge substrates is studied by scanning force microscopy. We find a dramatic difference arising from Ga as opposed to As prelayers in the formation of anti-phase boundaries (APBs), surface features near threading dislocations, and surface roughness, for films as thick as 1 μm. Ga prelayer samples are smooth; thin films display some APBs with predominantly one growth domain while the 1 μm thick film displays the morphology of a homoepitaxial GaAs film. In contrast, As prelayer samples are rough with complicated APB structures, which can be attributed to the increase in single steps during As₂ deposition.     

Enhancement of Si-donor incorporation by Ga adatoms in Si delta-doped GaAs grown by molecular beam epitaxy

We report on the realization of a modified delta doping technique to obtain doping profiles in MBE grown GaAs, measured by capacitance-voltage (C-V) methods with full-widths at half-maximum (FWHM)s of 25 ± 5Å and peak concentrations of up to 1.1 × 10¹⁹ cm^?3. In this modified delta doping technique, both the Ga and Si shutters were opened for 15 sec during the delta doped layer growth while only the Si shutter is opened during conventional delta doping. Comparison of the two techniques under the same dopant flux and shutter-open-time interval shows that higher sheet-carrier concentrations with narrower FWHMs and higher peak concentrations are obtained with the modified delta doping than with the conventional delta doping method. This suggests that Si donor incorporation is enhanced by the Ga adatoms while broadening of the Si donor distribution is still negligible for this short time interval. The effects of the substrate temperature and the shutter-open time on the Si donor distribution have also been investigated.     

Current-voltage characteristics ofp-Ge/n-GaAs heterojunction diodes grown by molecular beam epitaxy

Electrical characteristics ofp-Ge/n-GaAs heterojunctions on GaAs(l00) grown by molecular beam epitaxy (MBE) have been investigated. Thep-type Ge layer was produced by intentionally doping with Ga atoms, in addition to the diffusion of Ga atoms from the surface of the GaAs layer. The best ideality factor of 1.04 over six decades of the forward current and the lowest reverse current density of the order of 10⁻⁶ A/cm² were obtained for diodes with Ge grown at 500° C. The ideality factor increased slightly up to 1.12 when the operating temperature was decreased to 77 K. By studying the temperature dependence of the forward current, the conduction band discontinuity has been estimated to be 40 ± 10 meV. The suppression of Ga diffusion into the Ge film and its effect on pn-junction characteristics were also studied by growing a thin Ge film on GaAs at less than 300° C prior to the normal Ge film growth at 500° C.     

分子束外延生长高应变单量子阱激光器

采用分子束外延方法研究了高应变 In Ga As/Ga As量子阱的生长技术 .将 In Ga As/Ga As量子阱的室温光致发光波长拓展至 116 0 nm,其光致发光峰半峰宽只有 2 2 me V.研制出 112 0 nm室温连续工作的 In Ga As/Ga As单量子阱激光器 .对于 10 0 μm条宽和 80 0 μm腔长的激光器 ,最大线性输出功率达到 2 0 0 m W,斜率效率达到 0 .84m W/m A,最低阈值电流密度为 45 0 A/cm2 ,特征温度达到 90 K.     

Dual-band infrared detectors made on high-quality HgCdTe epilayers grown by molecular beam epitaxy on CdZnTe or CdTe/Ge substrates

In this paper, we present all the successive steps for realizing dual-band infrared detectors operating in the mid-wavelength infrared (MWIR) band. High crystalline quality HgCdTe multilayer stacks have been grown by molecular beam epitaxy (MBE) on CdZnTe and CdTe/Ge substrates. Material characterization in the light of high-resolution x-ray diffraction (HRXRD) results and dislocation density measurements are exposed in detail. These characterizations show some striking differences between structures grown on the two kinds of substrates. Device processing and readout circuit for 128×128 focal-plane array (FPA) fabrication are described. The electro-optical characteristics of the devices show that devices grown on Ge match those grown on CdZnTe substrates in terms of responsivity, noise measurements, and operability.     

InAs/InGaAs数字合金应变补偿量子阱激光器

采用气态源分子束外延在InP衬底上生长InAs/InGaAs数字合金应变补偿量子阱激光器.有源区的多量子阱结构由压应变的InAs/In_(0.53)Ga_(0.47)As数字合金三角形势阱和张应变的In_(0.43)Ga_(0.57)As势垒构成.X射线衍射测试表明赝晶生长的量子阱结构具有很高的晶格质量.在100K、130mA连续波工作模式下,激光器的峰值波长达到1.94μm,对应的阈值电流密度为2.58 kA/cm~2.随着温度升高,激光器的激射光谱出现独特的蓝移现象,这是由于激光器结构中相对较高的内部吸收和弱的光学限制引起最大增益函数斜率降低所导致的.     

High uniformity of Al0.3Ga0.7As/ln0.15Ga0.85As doped-channel structures grown by molecular beam epitaxy on 3″ GaAs substrates

Al_0.3Ga_0.7As/ln_0.15Ga_0.85As doped-channel structures were grown by molecular beam epitaxy on 3″ GaAs substrates. The uniformities of electrical and optical properties across a 3″ wafer were evaluated. A maximum 10% variation of sheet charge density and Hall mobility was achieved for this doped-channel structure. A1 μm long gate field-effect transistor (FET) built on this layer demonstrated a peak transconductance of 350 mS/mm with a current density of 470 mA/mm. Compared to the high electron mobility transistors, this doped-channel FET provides a higher current density and higher breakdown voltage, which is very suitable for high-power microwave device applications.     

GaAs-based long-wavelength InAs bilayer quantum dots grown by molecular beam epitaxy

Molecular beam epitaxy growth of a bilayer stacked InAs/GaAs quantum dot structure on a pure GaAs matrix has been systemically investigated.The influence of growth temperature and the InAs deposition of both layers on the optical properties and morphologies of the bilayer quantum dot（BQD） structures is discussed.By optimizing the growth parameters,InAs BQD emission at 1.436μm at room temperature with a narrower FWHM of 27 meV was demonstrated.The density of QDs in the second layer is around 9×10⁹ to 1.4×10¹⁰ cm^-2. The BQD structure provides a useful way to extend the emission wavelength of GaAs-based material for quantum functional devices.     

Study of metamorphic InGaAs/GaAs quantum well laser materials grown on GaAs substrate by molecular beam epitaxy

The GaAs based InGaAs metamorphic structures and their growth by molecular beam epitaxy (MBE) are investigated. The controlling of the source temperature is improved to realize the linearly graded InGaAs metamorphic structure precisely. The threading dislocations are reduced. We also optimize the growth and annealing parameters of the InGaAs quantum well (QW). The 1.3-μm GaAs based metamorphic InGaAs QW is completed. A 1.3-μm GaAs based metamorphic laser is reported.     

GaAs基长波长InAs耦合量子点材料的分子束外延生长

系统介绍了利用分子束外延方法在纯GaAs材料上生长InAs/GaAs耦合量子点结构。讨论了生长温度和上下两层量子点中InAs的淀积量对于材料发光性质和表面形貌的影响。通过优化生长参数,得到了室温发光波长在1.436μm,FWHM为27meV的耦合量子点材料。第二层量子点的密度在910⁹到1.410¹⁰cm^-2之间。耦合量子点结构为拓展GaAs基材料在量子功能器件应用中的发光波长提供了新的途径。     

Growth condition dependence for GaAs selective epitaxial growth by molecular beam epitaxy

GaAs selective epitaxial growth by conventional molecular beam epitaxy (MBE) was studied while varying its growth conditions, such as substrate temperature. As pressure, growth rate, and Si or Be doping. Selectivity is improved with the increase in substrate temperature, and with the decrease in As pressure or growth rate. Si and Be were doped up to 3 x 10¹⁸ and 3 × 10¹⁹ cm⁻³, respectively. While no Si doping influence was observed, Be doping degraded the surface morphology. Selective epitaxial growth by conventional MBE with appropriate growth conditions will be applicable to device fabrication.     

Strain effects in CdTe (111) epitaxial layers grown on GaAs (100) substrates by molecular beam epitaxy

Spectroscopic ellipsometry and photoreflectance measurements on CdTe/GaAs strained heterostructures grown by moleculclr beam epitaxy were carried out to investigate the effect of the strain and the dependence of the lattice parameter on the CdTe epitaxial layer thicknesses. Compressive strains exist in CdTe layers thinner than 2 μm. As the strain increases, the value of the critical-point energy shift increases linearly. These results indicate that the strains in the CdTe layers grown on GaAs substrates are strongly dependent on the CdTe layer thickness. Author to whom all correspondence should be addressed.     

Critical thickness of GaAs/InGaAs and AlGaAs/GaAsP strained quantum wells grown by organometallic chemical vapor deposition

In this paper we describe a study of strained quantum wells (QWs) as a means to experimentally observe the critical thickness (h _c) for the formation of interfacial misfit dislocations. Two material systems were investigated: GaAs/In_0.11Ga_0.89As, in which the QW layers are under biaxialcompression, and Al_0.35Ga_0.65As/GaAs_0.82P_0.18, in which the QW layers are under biaxialtension. Samples were grown by atmospheric pressure organometallic chemical vapor deposition, and characterized by low-temperature photoluminescence (PL), x-ray diffraction, optical microscopy, and Hall measurements. For both material systems, the observed onset of dislocation formation agrees well with the force-balance model assuming a double-kink mechanism. However, overall results indicate that the relaxation is inhomogeneous. Annealing at 800–850° C had no significant effect on the PL spectra, signifying that even layers that have exceededh _c and have undergone partial relaxation are thermodynamically stable against further dislocation propagation.