| 摘 要： | The indium–tin oxide(ITO) film as the antireflection layer and front electrodes is of key importance to obtaining high efficiency Si heterojunction(HJ) solar cells. To obtain high transmittance and low resistivity ITO films by direct-current(DC) magnetron sputtering, we studied the impacts of the ITO film deposition conditions, such as the oxygen flow rate,pressure, and sputter power, on the electrical and optical properties of the ITO films. ITO films of resistivity of 4×10-4?·m and average transmittance of 89% in the wavelength range of 380–780 nm were obtained under the optimized conditions:oxygen flow rate of 0.1 sccm, pressure of 0.8 Pa, and sputtering power of 110 W. These ITO films were used to fabricate the single-side HJ solar cell without an intrinsic a-Si:H layer. However, the best HJ solar cell was fabricated with a lower sputtering power of 95 W, which had an efficiency of 11.47%, an open circuit voltage(V oc) of 0.626 V, a filling factor(FF) of 0.50, and a short circuit current density(J sc) of 36.4 m A/cm2. The decrease in the performance of the solar cell fabricated with high sputtering power of 110 W is attributed to the ion bombardment to the emitter. The V oc was improved to 0.673 V when a 5 nm thick intrinsic a-Si:H layer was inserted between the(p) a-Si:H and(n) c-Si layer. The higher V oc of 0.673 V for the single-side HJ solar cell implies the excellent c-Si surface passivation by a-Si:H.
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