An All-Thin-Film Electrochromic Device Composed of MoO3--LiBSO--NiOx Multilayer Structure |
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| Authors: | YANG Hai-Gang WANG Cong ZHU Kai-Gui DIAO Xun-Gang WANG Huai-Yi CUIYi WANG Tian-Min |
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| Affiliation: | Center for Condensed Matter and Materials Physics, School of Science, Beihang University, Beijing 100083 |
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| Abstract: | An all-thin-film (ATF) electrochromic device for modulating the opticaltransmittance is manufactured using magnetron sputtering. The devicesconsists of MoO3 as the main electrochromic layer, LiBO2+Li2SO4(LiBSO) as the ion conductor layer, and NiOx as the complementary electrochromic layer. Glass covered with indium tin oxide (ITO) is used as the substrate and the ITO film is used as the bottom electrode. The ITO film deposited on the top of the devices is used as the other electrode. The structure and morphology ofthe films are characterized by x-ray diffraction (XRD) and scanning electron microscopy (SEM). The devices exhibit good optical properties with low transmittance values in the coloured state, and the optical modulation is measured by spectrophotometer in the wavelength range from 400 to 800nm. The average visible light transmittance reaches 50.2% and 3.7% in bleached and coloured state, respectively. The results indicate that such a monolithic system has great potential to be applied in smart windows. |
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| Keywords: | 81 15 Cd 82 47 Tp 83 80 Ab |
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