| optical, Structural and Laser-Induced Damage Threshold Properties of HfO2 Thin Films Prepared by Electron Beam Evaporation |
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| 作者姓名： | 占美琼 张东平 谭天亚 贺洪波 邵建达 范正修 |
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| 作者单位： | R＆DCenterforOpticalThinFilmCoatings,ShanghaiInstituteofOpticsandFineMechanics,ChineseAcademyofSciences,Shanghai201800 |
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| 摘 要： | We prepare HfO2 thin films by electron beam evaporation technology. The samples are annealed in air after deposition. With increasing annealing temperature, it is found that the absorption of the samples decreases firstly and then increases. Also, the laser-induced damage threshold (LIDT) increases firstly and then decreases.When annealing temperature is 473 K, the sample has the highest LID T of 2.17 J/cm^2, and the lowest absorption of 18ppm. By investigating the optical and structural characteristics and their relations to LIDT, it is shown that the principal factor dominating the LIDT is absorption.
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| 关 键 词： | 二氧化铪薄膜 激光人造损伤极限性质 光学性质 电子束蒸发 |
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