首页 | 官方网站   微博 | 高级检索  
     


Effect of self-etching primer containing N-acryloyl aspartic acid on enamel adhesion.
Authors:Yasuhiro Torii  Kousuke Itou  Yoshihiro Nishitani  Masahiro Yoshiyama  Kunio Ishikawa  Kazuomi Suzuki
Affiliation:Department of Operative Dentistry, Okayama University Dental School, 2-5-1 Shikata, Okayama 700-8525, Japan. torii@md.okayama-u.ac.jp
Abstract:OBJECTIVES: A previous study demonstrated that N-acryloyl aspartic acid (N-AAsp) aqueous solution is useful as a self-etching primer for dentin adhesion. The purpose of this study was to evaluate whether N-AAsp solution can be used for enamel etching, when compared with phosphoric acid. METHODS: N-AAsp was synthesized by the reaction of DL-aspartic acid and acryloyl chloride. The experimental self-etching primers were prepared by dissolving N-AAsp in water at various concentrations up to 20 wt%. The tensile bond strength of resin to bovine enamel was measured after the enamel was treated with the N-AAsp primers. The 40 wt% H(3)PO(4) was used for comparison. The treated enamel surfaces and the resin-enamel interfaces were also observed with a scanning electron microscope. RESULTS: The tensile bond strength to enamel increased linearly with the increasing N-AAsp concentration and reached the same value as that to enamel etched with 40 wt% H(3)PO(4) when N-AAsp concentration was 20 wt%, even though the etching ability of 20 wt% N-AAsp was inferior to 40 wt% H(3)PO(4). Regardless of the concentration of N-AAsp, the bond strength to enamel was the same as that to dentin reported in our previous study. SIGNIFICANCE: The 20 wt% N-AAsp aqueous solution showed enamel bonding equivalent to 40 wt% H(3)PO(4) in addition to the advantage of eliminating the rinse step with water. Based on the results obtained in this study along with those obtained in a previous study, it was concluded that 20 wt% N-AAsp aqueous solution is a promising self-etching primer to simultaneously treat enamel and dentin.
Keywords:
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司    京ICP备09084417号-23

京公网安备 11010802026262号