| 镀铬对光刻胶全息光栅掩模槽形的影响 |
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| 引用本文： | 陈刚,吴建宏,刘全.镀铬对光刻胶全息光栅掩模槽形的影响[J].光学仪器,2007,29(6):81-84. |
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| 作者姓名： | 陈刚 吴建宏 刘全 |
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| 作者单位： | 1. 南京信息职业技术学院微电子工程系,江苏,南京,210046
2. 苏州大学信息光学工程研究所,江苏,苏州,215006 |
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| 基金项目： | 江苏省高技术研究发展计划项目 |
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| 摘 要： | 为了研究镀铬对光刻胶光栅掩模槽形的影响,分析了铬膜反射引起的沿垂直光刻胶表面的驻波效应。分析表明驻波效应的对比度为0.28,不能忽略。将镀铬基底与普通的玻璃基底的掩模槽形对比,发现明显的不同。槽形模拟表明这种不同是由于驻波效应引起的。驻波效应会使掩模形成阶梯结构,且阶梯高度差正好为驻波波节间距离。
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| 关 键 词： | 衍射光栅 全息光栅掩模 铬膜 槽形 |
| 文章编号： | 1005-5630(2007)06-0081-04 |
| 收稿时间： | 2007/3/19 |
| 修稿时间： | 2007年3月19日 |
Influence of chromeplating to the profile of holographic grating mask of photoresist |
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| CHEN Gang,WU Jiang-hong,LIU Quan.Influence of chromeplating to the profile of holographic grating mask of photoresist[J].Optical Instruments,2007,29(6):81-84. |
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| Authors: | CHEN Gang WU Jiang-hong LIU Quan |
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| Abstract: | In order to study the influence to the final profile of the holographic grating mask of photoresist when chrome film is plated on substrate of glass,the standing wave effect normal to the surface of the photoresist due to the reflection on the surface of chrome film is analyzed theoretically.Analysis indicates that the standing wave effect whose contrast reaches 0.28,can not be neglected.Comparison between the profiles made on top of chrome film substrate and on top of glass substrate shows obvious difference due to the standing wave effect according the simulation of the profile.Standing wave effect will cause the step structure of the profile of the grating mask,and the height difference of the step structure is just the distance between the nodes of the standing wave. |
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| Keywords: | diffraction grating holographically recorded grating mask chrome film profile |
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