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Nanometric patterning of zinc by optical near-field photochemical vapour deposition |
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| Authors: | V V Polonski Y Yamamoto M Kourogi H Fukuda & M Ohtsu |
| Affiliation: | Department of Applied Electronics, Tokyo Institute of Technology, 4259 Nagatsuta-cho, Midori-ku, Yokohama 226-8502, Japan,;Kanagawa Academy of Science and Technology, KSP East 408, 3-2-1 Sakado, Takatsu, Kawasaki, 213-0012, Japan,;ERATO Ohtsu Localized Photon Project (Japan Science and Technology Corporation), 17-4 Tenko Building, 687-1 Tsuruma, Machida, Tokyo 194-0004 Japan,;RICOH Co, Ltd, R &D Center, 16-1 Shineityo, Tsuzuki-ku, Yokohama 224-0035 Japan |
| Abstract: | A new technique, optical near-field photochemical vapour deposition (NFO-PCVD) enables maskless production of nanometric structures with controllable size, chemical composition and morphology. By placing a near-field optical microscope inside the reaction chamber for photochemical vapour deposition we have deposited nanoscale metal patterns. We demonstrate for the first time, successfully deposited in the near-field region, lines of metallic zinc with the observed stripe width of 20 nm. |
| Keywords: | Nanoelectronic devices nanofabrication near-field optics patterned prenucleation photochemical vapour deposition |
