| Recent Developments in Magnetron Sputtering |
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| 作者姓名： | 于翔 王成彪 刘阳 于德洋 邢廷炎 |
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| 作者单位： | [1]School of Engineering ＆ Technology, China University of Geosciences, Beijing 100083,China [2]Power Technology Co. Ltd., Beijing 100072, China [3]School of Information Engineering, China University of Geosciences, Beijing 100083, China |
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| 基金项目： | supported by the National Natural Science Foundation of China （No. 50475057） and the Tribology Science Fund of the State Key-laboratory of Tribology （No. Kf04.02） |
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| 摘 要： |
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| 关 键 词： | 平衡磁电管喷射 中频磁电管喷射 离子支援喷射 等离子物理 |
| 收稿时间： | 2005-06-09 |
| 修稿时间： | 2005-06-09 |
Recent Developments in Magnetron Sputtering |
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| YU Xiang, WANG Chengbiao, LIU Yang, YU Deyang, XING Wingyan.Recent Developments in Magnetron Sputtering[J].Plasma Science & Technology,2006,8(3):337-343. |
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| Authors: | YU Xiang WANG Chengbiao LIU Yang YU Deyang XING Wingyan |
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| Abstract: | The principle of magnetron sputtering is introduced andthe balanced and unbalanced magnetrons are compared andthe necessity of unbalanced magnetrons is explained as well. Several recent developments in plasma magnetron sputtering, i.e., unbalanced magnetron sputtering, pulsed magnetron sputtering and ion assisted sputtering, are discussed. The recent developments of unbalanced magnetron systems and their incorporation with ion sources result in an understanding in growingimportance of the magnetron sputtering technology, which makes the technology an applicable deposition process for a variety of important films, such as wear-resistant films and decorative films. |
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| Keywords: | balanced and unbalanced magnetron sputtering mid-frequency magnetron sputtering ion assisted sputtering |
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