| 磁控溅射制备纳米厚度连续金膜 |
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| 引用本文： | 易泰民,邢丕峰,郑凤成,谢军,李朝阳,杨蒙生.磁控溅射制备纳米厚度连续金膜[J].原子能科学技术,2010,44(4):479-483. |
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| 作者姓名： | 易泰民 邢丕峰 郑凤成 谢军 李朝阳 杨蒙生 |
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| 作者单位： | 中国工程物理研究院 ;激光聚变研究中心，四川 ;绵阳621900 |
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| 基金项目： | 国家高技术研究发展计划(863计划) |
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| 摘 要： | 研究了磁控溅射工艺参数对Au膜生长速率、表面粗糙度和微观结构的影响。结果表明:当溅射功率低于200W时,溅射功率对薄膜表面粗糙度、微观结构的影响不明显。标定了溅射功率为20W条件下的Au膜生长速率,观察了Au的生长过程,在Si基底沉积的Au为岛状(Volver-Weber)生长模式,Au膜厚度为8nm时,薄膜开始连续。晶粒尺寸与薄膜厚度的关系研究结果表明:在生长初期,晶粒尺寸随厚度线性增大;随后,晶粒尺寸增速变缓,直至停滞;趋于70nm时,新晶粒形成取代晶粒长大。
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| 关 键 词： | 磁控溅射 表面粗糙度 纳米Au膜 |
Preparation of Continuous Gold Nano-films by Magnetron Sputtering |
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| YI Tai-min,XING Pi-feng,ZHENG Feng-cheng,XIE Jun,LI Chao-yang,YANG Meng-sheng.Preparation of Continuous Gold Nano-films by Magnetron Sputtering[J].Atomic Energy Science and Technology,2010,44(4):479-483. |
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| Authors: | YI Tai-min XING Pi-feng ZHENG Feng-cheng XIE Jun LI Chao-yang YANG Meng-sheng |
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| Affiliation: | China Academy of Engineering Physics, P. O. Box 919-987, Mianyang 621900, China |
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| Abstract: | Gold nanometer films were deposited on Si substrates at different condition by magnetron sputtering. Influences of the sputtering power on film growing rate,surface roughness,microstrcture were investigated. The influences were neglectable for sputtering power below 200 W. Film growing rate under 20 W was accurately calibrated,and the evolution process of gold film was observed. It shows that the growing model of gold film on Si substrates is Volver-Weber growth. Films become continuous when thickness reach... |
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| Keywords: | magnetron sputtering surface roughness nano-gold film |
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