The enhancement of homogeneity in the textured structure of silicon crystal by using ultrasonic wave in the caustic etching process |
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Authors: | Jung M Kim Young K Kim |
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Affiliation: | Department of Materials Science and Engineering, University of Incheon, Incheon 402-749, South Korea |
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Abstract: | The presence of the ultrasonic wave in the caustic etching process enhances the etching rate and results in a finer, and more homogeneous, textured structure. The silicon solar cell, texture etched for 20 min at 60°C in the caustic solution with ultrasonic wave, gives higher cell performance than the cell texture etched for 40 min at 70°C without ultrasonic wave. This comparison indicates a strong possibility of lowering the texturing cost of the silicon crystal by saving time and expensive chemicals normally employed in the texturisation of the crystalline silicon. |
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Keywords: | Ultrasonic wave Texturisation Pyramid |
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