| 退火对氧化钒薄膜成分及热敏性能的影响 |
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| 引用本文： | 魏雄邦,蒋亚东,吴志明,廖家轩,贾宇明,田忠.退火对氧化钒薄膜成分及热敏性能的影响[J].稀有金属材料与工程,2009,38(Z2). |
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| 作者姓名： | 魏雄邦 蒋亚东 吴志明 廖家轩 贾宇明 田忠 |
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| 作者单位： | 电子科技大学,四川,成都,610054 |
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| 摘 要： | 在衬底上溅射沉积一层金属钒膜,然后对其退火制备氧化钒薄膜.研究了原位退火热处理和后续退火热处理对氧化钒薄膜成分及其热敏性能的影响.XPS分析表明,原位380 ℃退火处理得到的氧化钒薄膜中4价态和5价态钒的比例为1.097:1,经后续退火处理后,该比例变为0.53:1;同时,原位退火处理得到的氧化钒薄膜的V/O比为1:2.24,经后续退火处理变为1:2.33.AFM分析后显示,经后续退火处理的薄膜晶粒尺寸有所增大.测试了薄膜方阻随温度的变化,结果显示,生成的薄膜具有明显的金属-半导体相变;原位退火热处理后的薄膜方阻(R)为5.46 kΩ/□(25 ℃),方阻温度系数(TRC)为-1.5%/℃(25 ℃);后续退火热处理后,薄膜方阻增大到231 kΩ/□(25 ℃),方阻温度系数升高为-2.74%/℃(25 ℃).此外,就氧化钒薄膜的成分、热敏性能与退火处理之间的关系进行了讨论.
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| 关 键 词： | 氧化钒薄膜 退火 薄膜成分 热敏性能 |
Effect of Annealing Processes on Composition and Thermal-Sensitive Properties of Vanadium Oxide Thin Films |
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| Wei Xiongbang,Jiang Yadong,Wu Zhiming,Liao Jiaxuan,Jia Yuming,Tian Zhong.Effect of Annealing Processes on Composition and Thermal-Sensitive Properties of Vanadium Oxide Thin Films[J].Rare Metal Materials and Engineering,2009,38(Z2). |
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| Authors: | Wei Xiongbang Jiang Yadong Wu Zhiming Liao Jiaxuan Jia Yuming Tian Zhong |
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| Affiliation: | Wei Xiongbang,Jiang Yadong,Wu Zhiming,Liao Jiaxuan,Jia Yuming,Tian Zhong (University of Electronic Science , Technology of China,Chengdu 610054,China) |
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| Abstract: | Vanadium oxide (VOx) thin films were prepared by a new method. By a two-step procedure,the pure vanadium thin films were first deposited onto the substrates,and then they were annealed to form the VOx thin films. The effects of annealing on the composition and the thermal-sensitive properties of VOx films were studied. XPS analysis reveals that the ratios of V4+/V5+ are 1.097:1 and 0.53:1 for the as-annealed film and post-annealed film,respectively. Moreover,the ratios of V/O are 1:2.24 and 1:2.33 for the a... |
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| Keywords: | vanadium oxide thin films annealing composition of thin film thermal-sensitive properties |
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