首页 | 官方网站   微博 | 高级检索  
     

新型可焊性锡铈铋镀层电镀工艺
引用本文:倪光明,严怡芹.新型可焊性锡铈铋镀层电镀工艺[J].表面技术,1994,23(1):34-36.
作者姓名:倪光明  严怡芹
作者单位:安徽师范大学化学系 (倪光明,严怡芹,张武),安徽师范大学化学系(钟明宏)
摘    要:介绍了新型可焊性锡铈铋镀层电镀工艺的镀液配方和电镀操作条件;测试了镀液的分散能力、阴极电流效率和沉积速率.用铜丝或铜片作镀件,在小槽内电镀,获得的镀层,外观致密均匀,似镜面光亮,结合力强.

关 键 词:可焊性  锡铈铋合金  镀合金

A New Plating Process of Weldable Sn-Ce-Bi Film
Ni Guangming & Yan Yiqin.A New Plating Process of Weldable Sn-Ce-Bi Film[J].Surface Technology,1994,23(1):34-36.
Authors:Ni Guangming & Yan Yiqin
Abstract:The bath formuler and the technological conditions of new weldable Sn-Ce-Bi plating are introduced. The dispersive capasity, the cathode current effeciency and the deposition rate are tested. A mirror glossy film on the copper wire or steel sheet is obtained. The uniform and compact film has strong binding force.
Keywords:weldable plating  Sn-Ce-Bi alloy  
本文献已被 CNKI 维普 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司    京ICP备09084417号-23

京公网安备 11010802026262号