| p-Si薄膜在氢氟酸溶液中的电化学抛光 |
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| 引用本文： | 胡飞,王晓丹,李小红,胡跃辉.p-Si薄膜在氢氟酸溶液中的电化学抛光[J].材料热处理学报,2011,32(Z1). |
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| 作者姓名： | 胡飞 王晓丹 李小红 胡跃辉 |
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| 作者单位： | 江西省先进陶瓷材料重点实验室,景德镇陶瓷学院材料科学与工程学院,江西景德镇333001 |
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| 基金项目： | 江西省自然科学基金(2010GQC0108); 江西省青年科学家(井岗之星)培养对象(20112BCB23022) |
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| 摘 要： | p-Si薄膜在氢氟酸溶液中的电化学抛光是通过阳极溶解降低薄膜表面粗糙度.本文用线性扫描研究了在不同的氢氟酸浓度下的电化学行为,发现随氢氟酸溶液浓度的增加阳极溶解速率也随之增加.当氢氟酸浓度为4％及6％时,可得到平整的表面.电化学抛光技术为制备光亮硅面提供了一种简单可行的方法.
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| 关 键 词： | 电化学抛光 p-Si薄膜 阳极溶解 微细加工 |
Electochemial polishing p-type silicon thin films in hydrofluoric acid solutions |
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| HU Fei
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WANG Xiao-dan
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LI Xiao-hong
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HU Yue-hui.Electochemial polishing p-type silicon thin films in hydrofluoric acid solutions[J].Transactions of Materials and Heat Treatment,2011,32(Z1). |
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| Authors: | HU Fei WANG Xiao-dan LI Xiao-hong HU Yue-hui |
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| Affiliation: | HU Fei,WANG Xiao-dan,LI Xiao-hong,HU Yue-hui(Jiangxi Key Laboratory of Advanced Ceramic Materals,School of Materials Science and Engineering,Jingdezhen Ceramic Institute,Jingdezhen 333001,China) |
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| Abstract: | Anodic dissolution on p-type silicon thin film in hydrofluoric acid(HF) solutions leads to a reduction of roughness on these surfaces.The electrochemical behavior in different HF concentration is investigated by linear sweep scan,and it is found that the HF has an important role in electrochemical behaviors,and the anodic dissolution rate increases with increasing HF concentration.A smooth surface state can be obtained in HF solutions,and the technique is promising for fabrication of reflecting silicon surf... |
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| Keywords: | electropolishing p-Si thin film anodic dissolution micromachining |
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