|
|||||
|
|
Spectroscopic ellipsometry characterization of SiNx antireflection films on textured multicrystalline and monocrystalline silicon solar cells |
|
| Authors: | MF Saenger J Sun J Hilfiker JA Woollam |
| Affiliation: | a Department of Electrical Engineering, and Nebraska Center for Materials and Nanoscience, University of Nebraska-Lincoln, USA b J. A. Woollam Co., Inc., Lincoln, Nebraska, USA c Q-Cells A.G., OT Thalheim, Germany |
| Abstract: | We present a spectroscopic ellipsometry study of silicon nitride based antireflection films deposited on chemically textured multi- and monocrystalline silicon wafers. The ellipsometric parameters were measured from the near infrared to the ultra violet spectral region. We report the effective thickness and complex index of refraction parameters of the antireflection films from all studied surfaces, regardless of their microscopic morphology. We report on a method to make ellipsometric measurements of the effective optical constants and thickness parameters of thin films deposited on alkaline etched (100)-oriented monocrystalline silicon. The effect of the texture on the complex index of refraction can be described within an effective medium approximation approach. The optical properties are consistent with those obtained from a series of reference films deposited on flat silicon surfaces. |
| Keywords: | Ellipsometry Solar cells Antireflective coating Texture |
| 本文献已被 ScienceDirect 等数据库收录！ | |
