a Department of Chemical and Materials Engineering, Arizona State University, Tempe, AZ 85287-6006, USA
b Digital DNA Laboratories, Motorola Inc., Tempe, AZ 85284, USA
Abstract:
Titanium aluminide thin films are being considered as coating materials for high temperature applications due to their high melting points and high oxidation resistance. In this study, Ti37Al63 and Ti53Al47 thin films are deposited onto SiO2 substrates by RF magnetron sputtering using compound targets and then annealed in vacuum to investigate the properties of the films. Rutherford backscattering spectrometry, X-ray diffractometry, transmission electron microscopy, and four-point probe measurements are used to analyze the characteristics of Ti37Al63 and Ti53Al47 thin films for high temperature electronics applications. The films show good thermal stability up to 700 °C for 1 h in vacuum. Reasonable resistivity is obtained when appropriate compositions and anneal conditions are used.