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非平衡磁控溅射类金刚石碳膜的性能
引用本文:柳翠,李国卿,张成武,李新.非平衡磁控溅射类金刚石碳膜的性能[J].材料研究学报,2004,18(2):171-175.
作者姓名:柳翠  李国卿  张成武  李新
作者单位:大连理工大学三束材料改性国家重点实验室
基金项目:国家高技术研究发展计划(863计划) , 国家自然科学基金
摘    要:用非平衡磁控溅射的方法在室温下制备了光滑、均匀、致密的类金刚石(DLC)薄膜,分析和研究了DLC膜的形貌、结构和摩擦特性.结果表明,靶工作电流对DLC膜的沉积有重要的影响.随着工作电流的增大,薄膜的沉积速率增大,薄膜中sp3键的含量增加.薄膜的摩擦系数随着工作电流的增加略有增大,在摩擦的初始阶段,摩擦系数较高,随着摩擦循环次数的增加,摩擦系数逐渐减小,并逐渐趋于稳定.

关 键 词:无机非金属材料  类金刚石碳膜  非平衡磁控溅射  性能  非平衡  磁控溅射  类金刚石碳膜  性能  magnetron  sputtering  carbon  films  稳定  循环次数  初始阶段  摩擦系数  含量增加  沉积速率  影响  工作电流  结果  摩擦特性  结构  研究  分析  薄膜
文章编号:1005-3093(2004)02-0171-05
收稿时间:2004-05-21
修稿时间:2003年7月21日

Properties of diamond-like carbon films deposited by unbalanced magnetron sputtering
LIU Cui,LI Guoqing,ZHANG Chengwu,LI Xin State Key Lab for Materials Modification by Lasen Ion and Electron Beams,Dalian University of Technology,Dalian.Properties of diamond-like carbon films deposited by unbalanced magnetron sputtering[J].Chinese Journal of Materials Research,2004,18(2):171-175.
Authors:LIU Cui  LI Guoqing  ZHANG Chengwu  LI Xin State Key Lab for Materials Modification by Lasen Ion and Electron Beams  Dalian University of Technology  Dalian
Affiliation:LIU Cui,LI Guoqing,ZHANG Chengwu,LI Xin State Key Lab for Materials Modification by Lasen Ion and Electron Beams,Dalian University of Technology,Dalian 116024
Abstract:Smooth,dense and uniform diamond-like carbon(DLC)films for industrial applica- tion were successfully prepared by unbalanced magnetron sputtering.The morphology,structure and tribological properties were studied by AFM,Raman spectra and tribological tester.Results show that working current of target plays an important role in DLC film deposition.Deposition rate,sp~3 bonds content and friction coefficient oncrease with increasing the working current of target.In the beginning of the wear experiment,the friction coefficient is high.but then decreases gradually with the increase of sliding cycles,reaching a constant value ranging between 0.1 and 0.15.
Keywords:inorganic non-metallic materials  diamond-like carbon films  unbalanced magnetron sputtering  properties  
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