| Zr/Nb薄膜材料的制备及界面结构研究 |
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| 引用本文： | 姚文清,张立武,牟豪杰,张川,严谨,朱永法,杨江荣,刘柯钊,鲜晓斌.Zr/Nb薄膜材料的制备及界面结构研究[J].真空科学与技术学报,2011,31(2):134-137. |
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| 作者姓名： | 姚文清 张立武 牟豪杰 张川 严谨 朱永法 杨江荣 刘柯钊 鲜晓斌 |
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| 作者单位： | 1. 清华大学化学系,北京,100084
2. 表面物理与化学国家重点实验室,绵阳,621907 |
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| 基金项目： | 表面物理与化学国家重点实验室基金项目(90000460200503) |
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| 摘 要： | 通过直流磁控溅射法在单晶Si(100)基底上制备了Zr/Nb/Si薄膜材料。X射线衍射(XRD)研究表明Zr薄膜以多晶形式存在,而Nb薄膜则形成了(110)晶面择优生长。薄膜中Zr和Nb晶粒大小分别为14,6 nm。扫描电镜研究表明形成的薄膜表面平整光滑,没有微裂纹存在。扫描俄歇电子能谱及X射线光电子能谱的研究表明,Zr/Nb/Si薄膜样品具有清晰的界面结构。在薄膜表面形成了致密的氧化层物种,而在膜层内部少量氧则以吸附态形式存在。
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| 关 键 词： | Zr/Nb/Si薄膜 磁控溅射法 界面 扫描电镜 X射线衍射 俄歇电子能谱 X射线光电子能谱 |
Growth and Interface Structures of Zr/Nb Films and Si(110)Substrate |
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| Yao Wenqing,Zhang Liwu,Mu Haojie,Zhang Chuan,Yan Jin,Zhu Yongfa,Yang Jiangrong,Liu Kezhao,Xian Xiaobin.Growth and Interface Structures of Zr/Nb Films and Si(110)Substrate[J].JOurnal of Vacuum Science and Technology,2011,31(2):134-137. |
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| Authors: | Yao Wenqing Zhang Liwu Mu Haojie Zhang Chuan Yan Jin Zhu Yongfa Yang Jiangrong Liu Kezhao Xian Xiaobin |
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| Affiliation: | Yao Wenqing1,Zhang Liwu1,Mu Haojie1,Zhang Chuan1,Yan Jin1,Zhu Yongfa1,Yang Jiangrong2,Liu Kezhao2,Xian Xiaobin2(1.Department of Chemistry,Tsinghua University,Beijing 100084,China,2.National Key Laboratory for Surface Physics and Chemistry,Mianyang 621907,China) |
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| Abstract: | The Zr/Nb films were deposited by DC magnetron sputtering on Si(110) substrates.The impacts of the film growth conditions,including the sputtering power,substrate temperature and pressure,etc.,on properties of the Zr/Nb films were studied.Its microstructures and stoichiometries were characterized with X-ray diffraction(XRD),scanning electron microscopy(SEM),and scanning Auger spectroscopy(AES).The results show that the polycrystalline Zr layer grew with(100),(101) and (102) as the preferential orientations,... |
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| Keywords: | Zr/Nb/Si thin film Magnetron sputtering Interface SEM XRD AES XPS |
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