氮流量对贫铀表面磁控溅射CrNx薄膜结构与性能的影响

金属铀的化学性质十分活泼, 极易发生氧化腐蚀. 为改善基体的抗腐蚀性能, 采用非平衡磁控溅射技术在金属铀表面制备了不同氮含量的CrN_x薄膜. 采用扫描电子显微镜(SEM)、X射线衍射技术(XRD)、X射线光电子能谱(XPS)、动电位极化曲线, 分别研究了薄膜形貌、物相结构、表面元素化学价态及抗腐蚀性能. 结果表明, 当氮流量为10 sccm时薄膜主要为体心立方的α-Cr, 随氮流量的增大, 薄膜转化为六方Cr₂N和立方CrN结构, 其择优取向由Cr(110)转化为Cr₂N(111)及CrN(200), 金属态Cr的含量逐渐减少, 氮化态Cr的含量增多, Cr2p3/2的结合能峰位逐渐向高结合能方向移动. CrN_x薄膜呈纤维状结构, 当氮流量增大到30 sccm时, 生成了Cr₂N的密排结构, 有效改善了薄膜的致密性. 在金属铀表面制备CrNx薄膜后, 自然腐蚀电位增大, 腐蚀电流密度降低, 当氮流量增大到30 sccm时, 薄膜的自然腐蚀电位提高了近550 mV左右, 腐蚀电流密度降低约两个数量级, 有效改善了贫铀表面的抗腐蚀性能.

Effect of N2Flow on Microstructure and Properties of CrN_x Film Prepared by Unbalanced Magnetron Sputtering on the Surface of Depleted Uranium

The chemical nature of depleted uranium is very active and susceptible to oxidation in nature environment.CrNx films were prepared by unbalanced magnetron sputtering ion plating at different N2 flow on the surface of depleted uranium to improve its corrosion resistance.The surface morphology,phase structure,chemical state and corrosion behavior of CrNx films were characterized by SEM,XRD,XPS,and polarization curves(E/I).The results show that,phase structure of CrNx film prepared at 10 sccm N2 flow is composed primarily of the bcc α-Cr.With the increasing of N2 flow,the phase structures transform to HCP-Cr2N and fcc CrN,which preferred orientation transforms from Cr(110) to Cr2N(111) and CrN(200).When N2 flow increases from 10 sccm to 50 sccm,the Cr2p3/2 XPS peaks move toward high binding energy side,the content of metal Cr decreases and the content of nitride chromium increases.When N2 flow increases to 30 sccm,CrNx film has fine grain and better density,its corrosion potential increases to 550 mV and corrosion current density decreases two orders of magnitude.After deposited CrNx film by unbalanced magnetron sputtering,the corrosion resistance of depleted uranium is effectively improved.