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High‐Speed Spatial Atomic‐Layer Deposition of Aluminum Oxide Layers for Solar Cell Passivation
Authors:Paul Poodt  Adriaan Lankhorst  Fred Roozeboom  Karel Spee  Diederik Maas  Ad Vermeer
Affiliation:1. TNO Science & Industry, PO Box 6235, 5600 HE Eindhoven (The Netherlands);2. Department of Applied Physics, Eindhoven University of Technology, PO Box 513, 5600 MB Eindhoven (The Netherlands);3. Holst Centre, High Tech Campus 31, 5656 AE Eindhoven (The Netherlands)
Abstract:
Keywords:aluminium oxide  gas earing  solar cells  spatial atomic layer deposition  surface passivation
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