| 物理气相沉积薄膜应力产生机理的理论分析 |
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| 引用本文： | 房永思,唐武,翁小龙,邓龙江,徐可为.物理气相沉积薄膜应力产生机理的理论分析[J].功能材料,2006,37(12):1959-1961. |
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| 作者姓名： | 房永思 唐武 翁小龙 邓龙江 徐可为 |
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| 作者单位： | 1. 电子科技大学,电子薄膜与集成器件国家重点实验室,四川,成都,610054
2. 西安交通大学,金属材料强度国家重点实验室,陕西,西安,710049 |
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| 基金项目： | 国家重点基础研究发展计划(973计划) |
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| 摘 要： | 在一维线性谐振子模型基础上,应用薛定谔方程分析了晶体中原子的概率分布;将晶体中原子的概率分布定义为原子云,解释了物理气相沉积法制备薄膜时残余应力产生的原因,建立了薄膜残余应力产生机理的理论模型.
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| 关 键 词： | 薛定谔方程 原子云 薄膜 残余应力 |
| 文章编号： | 1001-9731(2006)12-1959-03 |
| 收稿时间： | 2006-06-13 |
| 修稿时间： | 2006-08-22 |
The theory analysis on residual stress mechanism in film prepared by physical vapor deposition |
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| FANG Yong-si,TANG Wu,WENG Xiao-long,DENG Long-jiang,XU Ke-wei.The theory analysis on residual stress mechanism in film prepared by physical vapor deposition[J].Journal of Functional Materials,2006,37(12):1959-1961. |
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| Authors: | FANG Yong-si TANG Wu WENG Xiao-long DENG Long-jiang XU Ke-wei |
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| Abstract: | The atom's probability in crystal was investigated by using the one-dimensional linearity resonance model and the Schrodinger equation.To define the atom cloud which is the atom's probability in crystal,it can explain the reason of residual stress in film prepared by physical vapor deposition.The theory model on residual stress mechanism in film was established. |
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| Keywords: | Schrodinger equation atom cloud film residual stress |
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