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| 激光烧蚀制备纳米Si晶粒尺寸均匀性与靶衬间距的关系 | |
| 引用本文： | 金成,王文军,冯秀娟,王英龙.激光烧蚀制备纳米Si晶粒尺寸均匀性与靶衬间距的关系[J].华北电力大学学报,2006,33(2):109-111. |
| 作者姓名： | 金成 王文军 冯秀娟 王英龙 |
| 作者单位： | 1. 河北大学,物理科学与技术学院,河北,保定,071002;保定师范专科学校物理系,河北,保定,071000 2. 保定师范专科学校物理系,河北,保定,071000 3. 河北大学,物理科学与技术学院,河北,保定,071002 |
| 摘 要： | 为了对纳米Si薄膜中晶粒尺寸的分布进行定量研究,首次提出“晶粒尺寸均匀度”的概念,并对Lowndes等人采用脉冲激光烧蚀方法制备纳米Si薄膜的实验结果进行了定量分析。结果表明,随着靶衬间距的增大,晶粒尺寸均匀度先减小后增大,也就是说,存在靶衬间距的最佳值,使所制备的纳米Si晶粒的尺寸均匀性最好。MonteCarlo模拟结果对这一结论进行了解释。 |
| 关 键 词： | 纳米Si晶粒 脉冲激光烧蚀沉积 靶衬间距 尺寸分布 |
| 文章编号： | 1007-2691(2006)02-0109-03 |
| 修稿时间： | 2005年12月1日 |
Relation between target-substrate separation and size-uniformity of Si nanoparticles prepared by laser ablation |
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| JIN Cheng,WANG Wen-jun,FENG Xiu-juan,WANG Ying-long.Relation between target-substrate separation and size-uniformity of Si nanoparticles prepared by laser ablation[J].Journal of North China Electric Power University,2006,33(2):109-111. | |
| Authors: | JIN Cheng WANG Wen-jun FENG Xiu-juan WANG Ying-long |
| Abstract: | To quantificationally study the sized distribution of Si nanoparticles in thin films,"uniformity-degree"is used to analyze the experimental results on nanocrystalline Si films prepared by pulsed laser ablation authorized by Lowndes.The results show that while increasing target-substrate separation,"uniformity-degree"of Si nanoparticles decreases.There is an optimization target-substrate separation to induce the most uniform-sized nanoparticles,which is explained by the results of Monte Carlo method. |
| Keywords: | Si nanoparticles pulsed laser ablation target-substrate separation size distribution |
| 本文献已被 CNKI 维普 万方数据 等数据库收录！ | |
