Ir coating prepared on Mo substrate by double glow plasma |
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Authors: | Liangbing Wang Zhaofeng Chen Pingze Zhang Wangping Wu Ying Zhang |
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Affiliation: | (1) College of Material Science & Technology, Nanjing University of Aeronautics and Astronautics, Nanjing, 210016, P.R. China; |
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Abstract: | Dense and adherent Ir coating was obtained on the surface of the Mo substrate by double glow plasma, which had a deposition
chamber and two cathodes. Argon gas was used as the working gas. The bias voltage of Ir target and Mo substrate were −800
and −300 V, respectively. The chamber pressure was 35 Pa. Microstructure of the Ir coating was observed by scanning electron
microscopy. The Ir coating had a polycrystalline structure with preferential growth orientation of (220) crystal plane. The
deposition rate was ~3.5 μm/h. The good adhesion resulted from the buffer layer between the Mo substrate and the Ir coating.
The buffer layer, a combined Ir and Mo, was formed at the beginning of the deposition. The Mo concentration distributed gradiently
along the depth of the buffer layer. |
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Keywords: | |
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