| 一种用于增加制程范围的新型FFS液晶显示器件结构 |
| |
| 引用本文： | 毛联波,乔艳冰,戴文君,李佑俊,廖家德,钟德镇,简廷宪.一种用于增加制程范围的新型FFS液晶显示器件结构[J].现代显示,2008,19(4):40-43. |
| |
| 作者姓名： | 毛联波 乔艳冰 戴文君 李佑俊 廖家德 钟德镇 简廷宪 |
| |
| 作者单位： | 昆山龙腾光电有限公司,江苏,215301 |
| |
| 摘 要： | FFS(fringing field switching)技术作为三大主流广视角液晶显示技术之一,与IPS/VA相比有高开口率的优势。然而由于其存储电容易受制程偏移的影响而较容易产生显示不均,因此在制造过程中对设备精度要求十分严格。本文介绍一种新的FFS器件结构,能很大程度上降低由于制程偏移造成的显示不均。
|
| 关 键 词： | 边缘切换 回踢电压 制程偏移 |
| 文章编号： | 1006-6268(2008)04-0040-04 |
| 收稿时间： | 2007/11/1 |
| 修稿时间： | 2007年11月1日 |
A New Structure of FFS TFT-LCD for Process Margin Enlargement |
| |
| MAO Lian-bo,QIAO Yan-bing,DAI Wen-jun,LI You-jun,Peter Liao,DC Chung,TS Jen.A New Structure of FFS TFT-LCD for Process Margin Enlargement[J].Advanced Display,2008,19(4):40-43. |
| |
| Authors: | MAO Lian-bo QIAO Yan-bing DAI Wen-jun LI You-jun Peter Liao DC Chung TS Jen |
| |
| Abstract: | As one of popular wide viewing angle display technology, FFS TFT-LCD had the advantage of high aperture ratio as compared to IPS and VA. But FFS mode always appears the display non-uniformity phenomena when its storage capacitance affected by the process variation, so it has rigid requirement to the manufacturing apparatus. This paper has presented a new FFS structure which could decrease the defects ratio that caused by the process variation. |
| |
| Keywords: | fringe field switching (FFS) kick-back voltage process variation |
| 本文献已被 CNKI 维普 万方数据 等数据库收录！ |
|
