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| HgCdTe探测列阵干法技术的刻蚀形貌研究 | |
| 引用本文： | 叶振华,胡晓宁,全知觉,丁瑞军,何力.HgCdTe探测列阵干法技术的刻蚀形貌研究[J].红外与毫米波学报,2006,25(5):325-328. |
| 作者姓名： | 叶振华 胡晓宁 全知觉 丁瑞军 何力 |
| 作者单位： | 1. 中国科学院上海技术物理研究所材料器件中心,上海,200083 2. 中国科学院上海技术物理研究所红外物理国家重点实验室,上海,200083 3. 中国科学院上海技术物理研究所材料器件中心,上海,200083;中国科学院上海技术物理研究所红外物理国家重点实验室,上海,200083 |
| 基金项目： | 国家重点基础研究发展计划(973计划);国家重点实验室基金 |
| 摘 要： | 首次报道了HgCdTe微台面焦平面探测列阵成形工艺的干法刻蚀技术有关刻蚀形貌的一些研究结果.从HgCdTe外延材料的特点出发,详细分析了其干法刻蚀适用的RIE(reactive ion etching)设备和刻蚀原理.采用高等离子体密度、低腔体工作压力、高均匀性和低刻蚀能量的ICP(inductively coupled plasma)增强型RIE技术,研究了不同的工艺气体配比、腔体工作压力、ICP源功率和RF源功率对HgCdTe材料刻蚀形貌的影响,并初步得到了一种稳定的、刻蚀表面清洁、光滑、图形轮廓良好、均匀性较好和刻蚀速率较高的干法刻蚀工艺. |
| 关 键 词： | HgCdTe 微台面列阵 干法刻蚀 反应离子刻蚀 刻蚀形貌 |
| 文章编号： | 1001-9014（2006）05-0325-04 |
| 收稿时间： | 2005-12-10 |
| 修稿时间： | 2006-06-23 |
STUDY ON ETCH PATTERN OF DRY TECHNIQUE FOR HgCdTe IRFPAS |
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| YE Zhen-Hu,HU Xiao-Ning,QUAN Zhi-Jue,DING Rui-Jun,HE Li.STUDY ON ETCH PATTERN OF DRY TECHNIQUE FOR HgCdTe IRFPAS[J].Journal of Infrared and Millimeter Waves,2006,25(5):325-328. | |
| Authors: | YE Zhen-Hu HU Xiao-Ning QUAN Zhi-Jue DING Rui-Jun HE Li |
| Affiliation: | 1. Center of Materials and Devices, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China; 2. National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Science, Shanghai 200083, China |
| Abstract: | The research results of dry technique on the etch pattern of forming micro-mesa arrays for HgCdTe IRFPAs(Infrared Focal Plane Arrays) detector were presented.The available RIE equipments and etch principle were analyzed respectively according to the characteristics of HgCdTe epitaxial material in detail.The influences of etching gas ratio,chamber pressure,ICP(inductively coupled plasma) power and RF(radio frequency) power on HgCdTe etch pattern were investigated by using ICP enhanced RIE(reactive ion etching).Then a stable dry etch technique is obtained with clean and smooth etch surface,good pattern profile,good uniformity and high etch rate. |
| Keywords: | HgCdTe micro-mesa arrays dry etch technique reactive ion etching etch topography |
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