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Photoluminescence origin of nanocrystalline SiC films
作者姓名:LIU  Ji-wen  LI  Juan  LI  Yan-hui  LI  Chang-ling  ZHAO  Yan-ping  ZHAO  Jie  XU  Jing-jun
作者单位:[1]College of Physics Science, Nankai University, Tienjin 300071, China [2]School of Materials Science end Engineering, Tienjin University of Technology, Tienjin 300191, China [3]Institute of Material Physics, Tienjin University of Technology, Tienjin 300191, China
基金项目:The project supported by the National Natural Science Foundation of China(Grant No. 60476003)
摘    要:The nanocrystalline SiC films were prepared on Si then annealed at 800℃ and 1 000℃ for 30 minutes (111) substrates by rf magnetron sputtering and in a vacuum annealing system. The crystal structure and crystallization of as-annealed SiC films were determined by the Fourier transform infrared (FIR) absorption spectra and the X-ray diffraction (XRD) analysis. Measurement of photoluminescence (PL) of the nanocrystalline SiC (nc-SiC) films shows that the blue light with 473 nm and 477 nm wavelengths emitted at room temperature and that the PL peak shifts to shorter wavelength side and the PL intensity becomes stronger as the annealing temperature decreases. The time-resolved spectrum of the PL at 477 nm exhibits a bi-exponential decay process with lifetimes of 600 ps and 5 ns and a characteristic of the direct band gap. The strong blue light emission with short PL lifetimes suggests that the quantum confinement effect of the SiC nanocrystals resulted in the radiative recombination of the direct optical transitions.

关 键 词:光致发光  纳米晶体  碳化硅薄膜  磁电管喷射  X射线
文章编号:1673-1905(2005)02-0096-04
收稿时间:2005-07-18

Photoluminescence origin of nanocrystalline SiC films
LIU Ji-wen LI Juan LI Yan-hui LI Chang-ling ZHAO Yan-ping ZHAO Jie XU Jing-jun.Photoluminescence origin of nanocrystalline SiC films[J].Opto-electronics Letters,2005,1(2):96-99.
Authors:Ji-wen Liu  Juan Li  Yan-hui Li  Chang-ling Li  Yan-ping Zhao  Jie Zhao and Jing-jun Xu
Affiliation:(1) College of Physics Science, Nankai University, 300071 Tianjin, China;(2) School of Materials Science and Engineering, Tianjin University of Technology, 300191 Tianjin, China;(3) Institute of Material Physics, Tianjin University of Technology, 300191 Tianjin, China
Abstract:The nanocrystalline SiC films were prepared on Si (111) substrates by rf magnetron sputtering and then annealed at 800°C and 1000°C for 30 minutes in a vacuum annealing system. The crystal structure and crystallization of as-annealed SiC films were determined by the Fourier transform infrared (FTIR) absorption spectra and the X-ray diffraction (XRD) analysis. Measurement of photoluminescence (PL) of the nanocrystalline SiC (nc-SiC) films shows that the blue light with 473 nm and 477 nm wavelengths emitted at room temperature and that the PL peak shifts to shorter wavelength side and the PL intensity becomes stronger as the annealing temperature decreases. The time-resolved spectrum of the PL at 477 nm exhibits a bi-exponential decay process with lifetimes of 600 ps and 5 ns and a characteristic of the direct band gap. The strong blue light emission with short PL lifetimes suggests that the quantum confinement effect of the SiC nanocrystals resulted in the radiative recombination of the direct optical transitions. The project supported by the National Natural Science Foundation of China (Grant No. 60476003)
Keywords:CLC number" target="_blank">CLC number  TN383
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