Electrical characteristics of nano-crystal Si particles for nano-floating gate memory |
| |
Authors: | Jin Seok Yang Yong Tae Kim Jung Ho Park |
| |
Affiliation: | a Department of Electronics Engineering, Korea University, Seoul 136-701, Republic of Korea b Semiconductor Materials and Devices Laboratory, Korea Institute of Science and Technology, P.O. Box 131, Cheongryang, Seoul 136-791, Republic of Korea |
| |
Abstract: | In these days, the researches of non-volatile memory device using nano-crystal(NC)-Si are actively progressing to replace flash memory devices. Many kinds of non-volatile memory devices such as phase-change(P)-RAM, resistance(Re)-RAM, polymer(Po)-RAM, and nano-floating gate memory(NFGM) are being studied. In this work, we study NFGM device in which information is memorized by storing electrons in silicon nanocrystal. The NFGM device has shown great promise for ultra-dense high-endurance memory device for low-power applications S. Tiwari, et al., Appl. Phys. Lett. 68 (1996) 1377], and it is able to fabricate 1T-type device. Thus, the NFGM is considered to replace existing flash memory device. Non-volatile memory device has been fabricated by using NC-Si particles. The NC-Si particles have broad size range of 1-5 nm and an average size of 2.7 nm, which are sufficiently small to indicate the quantum effect for silicon. The memory window has been analyzed by C-V characteristic of NC-Si particles. Vd-Id and Vg-Id characteristics of the fabricated device have also been measured. |
| |
Keywords: | Nano-crystal(NC)-Si particles Non-volatile memory device NFGM C-V characteristics I-V characteristics |
本文献已被 ScienceDirect 等数据库收录! |
|