| Polycrystalline ZnO Films Deposited on Glass by RF Reactive Sputtering |
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| 作者姓名： | GONG Heng-xiang HE Yun-yao Wang Qi-feng JIN Guo-juan FANG Ze-bo WANG Yin-yue |
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| 作者单位： | 1. Dept.of Phys.，Shaoxing College of Arts and Sciences，Shaoxing 312000，CHN; 2. Dept.of Phys.，Lanzhou University，Lanzhou 730000，CHN |
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| 基金项目： | Research Foundation of Shaoxing City Government (2003141); Research Foundation of Shaoxing College of Arts and Sciences |
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| 摘 要： | Polycrystalline ZnO films were prepared on glass wafer using Zn targets by radio frequency(RF)reactive sputtering technique under different deposition conditions.X-ray diffraction (XRD) and optical transmittance spectrum were employed to analyze the structure and optical character of the films.The strain and stress in films, as well as the packing density are calculated in terms of refractive index of films measured with an elliptic polarization analyzer.It is the deposition conditions that have great effects on the structural and optical properties of ZnO films.Under the optimal conditions,the only evident peak in XRD spectrum was (002) peak with the full width at half maximum (FWHM) of 0.20° showing the grain size of 42.8 nm.The packing density,the stress in (002) plane and the average optical transmittance in the visible region were about 97%,-1.06×10~9 N/m~2 and 92%, respectively.
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| 关 键 词： | ZnO薄膜 射频反应溅射 择优位向 光学透明性 |
| 收稿时间： | 2003/8/1 |
Polycrystalline ZnO Films Deposited on Glass by RF Reactive Sputtering |
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| GONG Heng-xiang,HE Yun-yao,Wang Qi-feng,JIN Guo-juan,FANG Ze-bo,WANG Yin-yue.Polycrystalline ZnO Films Deposited on Glass by RF Reactive Sputtering[J].Semiconductor Photonics and Technology,2004,10(2):97-100. |
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| Authors: | GONG Heng-xiang HE Yun-yao Wang Qi-feng JIN Guo-juan FANG Ze-bo WANG Yin-yue |
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| Abstract: | Polycrystalline ZnO films were prepared on glass wafer using Zn targets by radio frequency(RF)reactive sputtering technique under different deposition conditions.X-ray diffraction (XRD) and optical transmittance spectrum were employed to analyze the structure and optical character of the films.The strain and stress in films, as well as the packing density are calculated in terms of refractive index of films measured with an elliptic polarization analyzer.It is the deposition conditions that have great effects on the structural and optical properties of ZnO films.Under the optimal conditions,the only evident peak in XRD spectrum was (002) peak with the full width at half maximum (FWHM) of 0.20° showing the grain size of 42.8 nm.The packing density,the stress in (002) plane and the average optical transmittance in the visible region were about 97%,-1.06×109 N/m2 and 92%, respectively. |
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| Keywords: | ZnO films RF reactive sputtering Preferred orientation Optical transmittance |
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