| Design of Rapid Thermal Processing for Large Diameter Wafer |
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| 作者姓名： | YANG Hong-guan WEN Li-qun DAI Da-kang YU Biao |
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| 作者单位： | Department of Applied Physics, Hunan University, Changsha 410082, CHN |
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| 基金项目： | Foundation for Key Youth Teachers from Hunan Province（521105237）; Natural Science Foundation of Hunan University（521101805）. |
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| 摘 要： |
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| 关 键 词： | 大直径晶片 快速热处理 钨卤素灯 退火处理 |
| 文章编号： | 1007-0206（2006）04-0265-05 |
| 收稿时间： | 2006-06-26 |
| 修稿时间： | 2006-06-30 |
Design of Rapid Thermal Processing for Large Diameter Wafer |
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| YANG Hong-guan WEN Li-qun DAI Da-kang YU Biao.Design of Rapid Thermal Processing for Large Diameter Wafer[J].Semiconductor Photonics and Technology,2006,12(4):265-269. |
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| Authors: | YANG Hong-guan WEN Li-qun DAI Da-kang YU Biao |
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| Abstract: | The relationship between the arrangement of tungsten-halogen lamps and the uniformity of irradiance received by the wafer is discussed, and a sort of axial-symmetrical lamps-array is designed to guarantee that the irradiation on the edge is approximately the same as the one on the center of the wafer. The magnitude of temperature on the wafer vs. the power of tungsten-halogen lamps is calculated numerically. |
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| Keywords: | Rapid thermal processing Rapid thermal annealing Tungsten-halogen lamp Large diameter wafer |
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