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温度场监控下高功率半导体激光熔敷钴基合金涂层
引用本文:李铸国,黄坚,王亚平,张轲,芮佳宁,张悦.温度场监控下高功率半导体激光熔敷钴基合金涂层[J].红外与激光工程,2010,39(2).
作者姓名:李铸国  黄坚  王亚平  张轲  芮佳宁  张悦
作者单位:1. 上海交通大学,材料科学与工程学院,上海200240
2. 延锋伟世通汽车模具有限公司,上海,201206
基金项目:国家自然科学基金,科技部国际科技合作基金资助项目,上海市国际科技合作基金资助项目 
摘    要:采用3.5 kW半导体激光器在42CrMo4表面熔覆了钴基合金(Stellite 6)涂层,利用光学显微镜和显微硬度仪表征了涂层的微观组织和硬度分布,研究了监控熔覆过程中的熔池温度场对涂层的微观结构和显微硬度的影响.结果表明:基于熔池温度场拍摄并调整激光器输出功率的熔池大小闭环监控的工艺可实现对钴基合金涂层的稀释率以及结构与性能的调控:当送粉量为22.6 g/min、熔覆速率为1 m/min时,基于熔池温度场监控的工艺调整实现了近零稀释率的钴基合金涂层的熔覆,所需激光功率仅为1.5 kW;涂层与基体形成良好的冶金结合,组织致密,主要由平面晶、胞状晶、树枝晶和等轴晶构成,晶粒细小,显微硬度达到HV600.

关 键 词:高功率半导体  激光熔覆  钴基合金  温度场  稀释率

High power diode laser cladding of Co-based alloy coating under temperature field control
LI Zhu-guo,HUANG Jian,WANG Ya-ping,ZHANG Ke,RUI Jia-ning,ZHANG Yue.High power diode laser cladding of Co-based alloy coating under temperature field control[J].Infrared and Laser Engineering,2010,39(2).
Authors:LI Zhu-guo  HUANG Jian  WANG Ya-ping  ZHANG Ke  RUI Jia-ning  ZHANG Yue
Abstract:Co-based alloy (Stellite 6) coatings were prepared on 42CrMo4 plates by using high power diode laser with the nominal output power of 3.5 kW.Optical microscope and micro-hardness tester were used to characterize the morphology,microstructure and the hardness profile of the coatings.The effects of controlling the temperature field of the molten pool on microstructures and micro-hardness of these coatings were investigated.The results reveal that the dilution rate,morphology,microstructure and property of the Co-based alloy coatings can be adjusted under the closed-loop control of molten pool temperate.On the condition that the powder feed rate of 22.6 g/min,laser beam scanning rate of 1 m/min,and laser power of 1.5 kW.a Co-based alloy coating with nearly non-dilution was obtained by properly employing process parameters based on this adjustment approach.The Co-based alloy consisted of planar grains,cellular grains,free dendrite grains and equiaxed grains from the interface to the top of the coating.It had good metallurgical bond with the substrate and its micro-hardness was up to HV600.
Keywords:High power diode  Laser cladding  Co-based alloy  Temperature field  Dilution rate
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